Inventor
Hideomi Suzawa
Inventor
Kanagawa, JP
Overview
Patents· 287 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices34%
H01LSemiconductor devices14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein10%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
H10KOrganic electric solid-state devices4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
H10BElectronic memory devices3%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation2%
G11CStatic stores2%
PatentTitleYear
11,107,929Semiconductor device202111,049,974Semiconductor device and method for manufacturing the same202110,944,014Semiconductor device202110,923,580Semiconductor device and method for fabricating the same202110,854,636Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same202010,720,532Semiconductor device202010,672,913Semiconductor device and method for manufacturing the same202010,522,397Manufacturing method of semiconductor device201910,468,506Semiconductor device and method for fabricating the same201910,411,136Semiconductor device201910,403,762Semiconductor device201910,403,646Semiconductor device and method for manufacturing the same201910,388,797Semiconductor device201910,374,097Semiconductor device201910,374,094Semiconductor device201910,290,720Semiconductor device and method for manufacturing the same201910,256,348Semiconductor device and method for manufacturing semiconductor device201910,236,389Manufacturing method of semiconductor device201910,224,433Method for manufacturing semiconductor device201910,217,870Semiconductor device and manufacturing method of semiconductor device201910,211,240Method for manufacturing semiconductor device201910,199,508Semiconductor device and method for manufacturing the same201910,134,879Semiconductor device and method for fabricating the same201810,128,384Semiconductor device201810,103,271Semiconductor device201810,014,413Semiconductor device201810,008,587Semiconductor device and manufacturing method thereof20189,991,397Semiconductor device20189,954,111Semiconductor device20189,917,107'Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same'20189,917,209'Manufacturing method of semiconductor device including step of forming trench over semiconductor'20189,905,657'Semiconductor device and method for manufacturing semiconductor device'20189,899,535'Semiconductor device'20189,893,194'Method for manufacturing semiconductor device'20189,887,295'Thin film transistor with multiple oxide semiconductor layers'20189,882,059'Semiconductor device'20189,859,444'Semiconductor device, display device, input/output device, and electronic device'20189,853,069Method for manufacturing semiconductor device20179,852,904Method for manufacturing semiconductor device20179,837,552Semiconductor device20179,812,467'Semiconductor device comprising an oxide semiconductor'20179,806,198'Semiconductor device and method for manufacturing the same'20179,780,229'Method for manufacturing semiconductor device'20179,768,318'Semiconductor device and method for manufacturing the same'20179,768,320'Semiconductor device'20179,761,736'Semiconductor device and method for manufacturing semiconductor device'20179,755,081'Semiconductor device'20179,711,610'Semiconductor device having oxide semiconductor layer'20179,711,656'Semiconductor device'20179,691,789'Method for manufacturing semiconductor device'20179,680,024'Semiconductor device'20179,673,223'Electroluminescence display device'20179,666,724'Semiconductor device'20179,660,098'Semiconductor device and method for manufacturing the same'20179,660,097'Semiconductor device'20179,647,095'Semiconductor device and method for manufacturing the same'20179,634,150'Semiconductor device, display device, input/output device, and electronic device'20179,627,545'Semiconductor device'20179,608,123'Method for manufacturing semiconductor device'20179,601,515'Semiconductor device and manufacturing method thereof'20179,601,632'Semiconductor device and method for fabricating the same'20179,576,981'Semiconductor device having a gate insulting film with thick portions aligned with a tapered gate electrode'20179,496,405'Method for manufacturing semiconductor device including step of adding cation to oxide semiconductor layer'20169,472,678'Semiconductor device'20169,455,349'Oxide semiconductor thin film transistor with reduced impurity diffusion'20169,450,080'Method for manufacturing semiconductor device'20169,449,853'Method for manufacturing semiconductor device comprising electron trap layer'20169,431,547'Semiconductor device'20169,412,877'Semiconductor device'20169,401,247'Negative electrode for power storage device and power storage device'20169,391,096'Semiconductor device and method for manufacturing the same'20169,373,525'Method for manufacturing semiconductor device'20169,373,711'Semiconductor device'20169,368,607'Semiconductor device'20169,343,581'Semiconductor device'20169,343,579'Semiconductor device'20169,330,940'Semiconductor device and manufacturing method thereof'20169,330,909'Semiconductor device'20169,312,349'Semiconductor device and method for manufacturing semiconductor device'20169,306,079'Semiconductor device and method for manufacturing the same'20169,293,598'Semiconductor device having an oxide semiconductor layer'20169,287,117'Semiconductor device comprising an oxide semiconductor'20169,281,405'Semiconductor device and method for manufacturing the same'20169,281,408'Semiconductor device'20169,269,822'Semiconductor device and method for manufacturing semiconductor device'20169,263,259'Semiconductor device comprising an oxide semiconductor'20169,263,503'Display device and method of fabricating the display device'20169,231,111'Semiconductor device'20169,209,307'Semiconductor device'20159,202,929'Thin film transistor and method for manufacturing the same'20159,202,925'Semiconductor device'20159,190,527'Semiconductor device and manufacturing method of semiconductor device'20159,166,021'Semiconductor device and method for manufacturing the same'20159,166,060'Semiconductor device'20159,153,352'Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same'20159,153,436'Method for manufacturing semiconductor device'20159,142,574'Semiconductor device and fabrication method thereof'20159,142,596'Display device and method of fabricating the display device'20159,123,751'Method for manufacturing semiconductor device'20159,064,967'Semiconductor element, semiconductor device, and method for manufacturing the same'20159,048,323'Semiconductor device'20159,045,831'Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method'20159,040,998'Light-emitting device'20159,023,684'Semiconductor device and manufacturing method thereof'20159,006,732'Manufacturing method of semiconductor device'20158,980,685'Method for manufacturing thin film transistor using multi-tone mask'20158,969,144'Method for manufacturing semiconductor device'20158,957,424'Electroluminescence display device'20158,956,929'Method for manufacturing semiconductor device'20158,921,169'Semiconductor device and fabrication method thereof'20148,912,040'Method for manufacturing semiconductor device'20148,834,989'Semiconductor device and manufacturing method thereof'20148,823,074'Semiconductor element, semiconductor device, and method for manufacturing the same'20148,809,992'Semiconductor device and manufacturing method thereof'20148,791,513'Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same'20148,790,961'Semiconductor device and method for manufacturing the same'20148,778,729'Manufacturing method of semiconductor device'20148,772,778'Semiconductor device and manufacturing method thereof'20148,741,702'Method for manufacturing semiconductor device'20148,735,889'Semiconductor device and manufacturing method thereof'20148,729,546'Method for manufacturing semiconductor device'20148,729,557'Electroluminescence display device'20148,723,768'Display device'20148,686,417'Oxide semiconductor device formed by using multi-tone mask'20148,674,366'Display device and manufacturing method of display device'20148,653,513'Semiconductor device with sidewall insulating layer'20148,624,248'Semiconductor device and manufacturing method thereof'20148,624,400'Semiconductor device and method for manufacturing the same'20148,618,732'Display device and method of fabricating the display device'20138,592,879'Method for manufacturing semiconductor device'20138,593,603'Display device and electronic device'20138,569,767'Electroluminescence display device'20138,501,564'Semiconductor element, semiconductor device, and method for manufacturing the same'20138,492,840'Semiconductor device having an oxide semiconductor layer'20138,470,647'Semiconductor device and manufacturing method thereof'20138,461,596'Semiconductor device including semiconductor film with outer end having tapered shape'20138,440,484'Semiconductor device and fabrication method thereof'20138,436,403'Semiconductor device including transistor provided with sidewall and electronic appliance'20138,431,449'Manufacturing method of semiconductor device'20138,421,352'Light emitting device'20138,420,546'Manufacturing method of semiconductor device'20138,383,487'Method for manufacturing SOI substrate'20138,273,613'Semiconductor device and method of manufacture thereof'20128,242,494'Method for manufacturing thin film transistor using multi-tone mask'20128,236,635'Method for manufacturing semiconductor device'20128,207,025'Manufacturing method of semiconductor device'20128,207,026'Manufacturing method of thin film transistor and manufacturing method of display device'20128,207,536'Semiconductor device and fabrication method thereof'20128,198,683'Semiconductor device including transistors with silicided impurity regions'20128,173,478'Method of manufacturing metal wiring and method of manufacturing semiconductor device'20128,124,973'Electronic appliance including transistor having LDD region'20128,120,039'Semiconductor device'20128,093,591'Semiconductor device and manufacturing method thereof'20128,067,772'Semiconductor device and manufacturing method thereof'20118,053,339'Semiconductor device and manufacturing method thereof'20118,053,781'Semiconductor device having thin film transistor'20118,044,588'Display device and method of fabricating the display device'20118,003,483'Method for manufacturing SOI substrate'20117,968,886'Semiconductor integrated circuit and method of fabricating same'20117,968,890'Semiconductor device and manufacturing method thereof'20117,968,884'Semiconductor device and manufacturing method thereof'20117,952,152'Semiconductor device and fabrication method thereof'20117,915,075'Method for manufacturing semiconductor device'20117,884,369'Wiring and method of manufacturing the same, and wiring board and method of manufacturing the same'20117,875,886'Semiconductor device having a thin film transistor'20117,847,355'Semiconductor device including transistors with silicided impurity regions'20107,838,347'Display device and manufacturing method of display device'20107,804,142'Semiconductor device and fabrication method thereof'20107,776,712'Method of forming a semiconductor device'20107,763,981'Semiconductor device and method for manufacturing the same'20107,750,476'Semiconductor device having a reliable contact'20107,737,441'Semiconductor device and manufacturing method thereof'20107,714,329'Semiconductor device having thin film transistor'20107,709,895'Semiconductor device having insulating stripe patterns'20107,705,357'Thin film transistor with channel region in recess'20107,666,718'Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method'20107,635,895'Display device'20097,635,865'Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method'20097,633,085'Semiconductor device and manufacturing method thereof'20097,615,825'Semiconductor device having tapered gate insulating film'20097,601,572'Semiconductor device and manufacturing method thereof'20097,589,382'Semiconductor device and method for manufacturing the same'20097,569,856'Semiconductor device and method for manufacturing the same'20097,560,734'Semiconductor device and manufacturing method thereof'20097,537,972'Semiconductor device and method of manufacturing the same'20097,528,406'Semiconductor integrated circuit and method of fabricating same'20097,525,158'Semiconductor device having pixel electrode and peripheral circuit'20097,514,868'Display device and method of fabricating the display device'20097,486,344'Semiconductor display device and manufacturing method thereof'20097,482,274'Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same'20097,479,657'Semiconductor device including active matrix circuit'20097,470,580'Fabrication method of a semiconductor device'20087,459,849'Display device and method of fabricating the display device'20087,422,934'Method of fabricating a light emitting device'20087,420,209'Semiconductor device'20087,405,115'Semiconductor device and manufacturing method thereof'20087,381,599'Semiconductor device and method for manufacturing the same'20087,365,750'User identity authentication system and user identity authentication method and mobile telephonic device'20087,365,386'Semiconductor device and method of manufacturing the semiconductor device'20087,335,911'Semiconductor device and manufacturing method thereof'20087,335,597'Semiconductor device and method of manufacturing the same'20087,294,887'Semiconductor device comprising thin film transistor'20077,238,600'Semiconductor device and fabrication method thereof'20077,235,810'Semiconductor device and method of fabricating the same'20077,224,028'Semiconductor device that includes a gate insulating layer with three different thicknesses'20077,218,361'Semiconductor display device and manufacturing method thereof'20077,183,614'Semiconductor device and method of manufacture thereof'20077,169,710'Wiring and method of manufacturing the same, and wiring board and method of manufacturing the same'20077,166,863'Semiconductor element, semiconductor device, electronic device, TV set and digital camera'20077,164,171'Semiconductor device and fabrication method thereof'20077,163,854'Fabrication method of a semiconductor device'20077,161,177'Semiconductor device and manufacturing method thereof'20077,161,178'Display device having a pixel electrode through a second interlayer contact hole in a wider first contact hole formed over an active region of display switch'20077,151,015'Semiconductor device and manufacturing method thereof'20067,122,833'Semiconductor integrated circuit and method of fabricating same'20067,119,022'Manufacturing method of semiconductor device'20067,112,817'Electronic appliance including transistor having LDD region'20067,095,047'Semiconductor device and method of manufacturing the same'20067,094,635'Method of fabricating a light emitting device'20067,071,037'Semiconductor device and manufacturing method thereof'20067,068,254'User identity authentication system and user identity authentication method and mobile telephonic device'20067,033,953'Manufacturing method of semiconductor device'20067,026,194'Method of forming thin film transistors having tapered gate electrode and curved insulating film'20067,008,828'Method of manufacturing semiconductor device'20067,001,801'Method of manufacturing semiconductor device having first and second insulating films'20066,995,511'Display device and method of fabricating the display device'20066,992,328'Semiconductor device and manufacturing method thereof'20066,984,550'Semiconductor device and manufacturing method thereof'20066,982,768'Liquid crystal display device'20066,933,184'Method of manufacturing semiconductor device'20056,930,047'Dry etching apparatus, etching method, and method of forming a wiring'20056,906,383'Semiconductor device and method of manufacture thereof'20056,900,462'Semiconductor device and manufacturing method thereof'20056,900,460'Semiconductor device and method of manufacturing the same'20056,872,604'Method of fabricating a light emitting device'20056,867,431'Semiconductor device and method for manufacturing the same'20056,847,050'Semiconductor element and semiconductor device comprising the same'20056,825,071'Semiconductor device and method of manufacturing the same'20046,809,339'Semiconductor device and method for manufacturing same'20046,773,996'Semiconductor device and method for manufacturing same'20046,773,971'Method of manufacturing a semiconductor device having lightly-doped drain (LDD) regions'20046,774,397'Semiconductor device'20046,759,678'Semiconductor device'20046,746,965'Manufacturing method of semiconductor device'20046,747,289'Semiconductor device and method of fabricating thereof'20046,743,649'Semiconductor device and manufacturing method thereof'20046,739,931'Display device and method of fabricating the display device'20046,686,228'Semiconductor device and manufacturing method thereof'20046,664,145'Semiconductor device and manufacturing method thereof'20036,657,260'Thin film transistors having source wiring and terminal portion made of the same material as the gate electrodes'20036,646,287'Semiconductor device with tapered gate and insulating film'20036,642,089'Semiconductor device and fabrication method thereof'20036,639,265'Semiconductor device and method of manufacturing the semiconductor device'20036,596,571'Method of manufacturing semiconductor device'20036,583,471'Semiconductor device having first and second insulating films'20036,566,684'Active matrix circuit having a TFT with pixel electrode as auxiliary capacitor'20036,562,669'Semiconductor device and method of manufacturing the same'20036,559,478'Semiconductor integrated circuit and method of fabricating same'20036,541,294'Semiconductor device and manufacturing method thereof'20036,515,336'Thin film transistors having tapered gate electrode and taped insulating film'20036,507,069'Semiconductor device and method of manufacture thereof'20036,475,836'Semiconductor device and manufacturing method thereof'20026,468,843'MIS semiconductor device having an LDD structure and a manufacturing method therefor'20026,436,827'Fabrication method of a semiconductor device'20026,433,361'Semiconductor integrated circuit and method for forming the same'20026,414,345'Semiconductor device including active matrix circuit'20026,388,291'Semiconductor integrated circuit and method for forming the same'20026,372,523'Etching method and etching device'20026,284,577'MIS semiconductor device having an LDD structure and a manufacturing method therefor'20016,225,218'Semiconductor device and its manufacturing method'20016,211,535'Method of manufacturing a semiconductor device'20016,198,517'Liquid crystal display device'20016,171,961'Fabrication method of a semiconductor device'20016,121,652'Semiconductor device including active matrix circuit'20006,104,051'Semiconductor device including active matrix circuit'20006,049,092'Semiconductor device and method for manufacturing the same'20005,998,841'Semiconductor device including active matrix circuit'19995,929,948'Black matrix coupled to common electrode through a transparent conductive film'19995,914,498'Semiconductor integrated circuit and method of fabricating same'19995,898,188'Semiconductor device and method for its fabrication'19995,861,103'Etching method and apparatus'19995,856,689'Semiconductor device including active matrix circuit'19995,851,861'MIS semiconductor device having an LDD structure and a manufacturing method therefor'19985,728,259'Process for fabricating thin-film semiconductor device without plasma induced damage'19985,719,068'Method for anisotropic etching conductive film'19985,712,495'Semiconductor device including active matrix circuit'19985,641,380'Method for fabricating a semiconductor device'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–2021Patents assigned to SEMICONDUCTOR ENERGY LAB (280)· patent assignee history
1997–2021Based in Kanagawa, JP· patent location history
2003–2021Based in Atsugi, JP· patent location history
2005–2010Based in Tochigi, JP· patent location history
2011–2016Patents assigned to SUZAWA HIDEOMI (47)· patent assignee history
2011–2016Patents assigned to SASAGAWA SHINYA (24)· patent assignee history
2011–2016Patents assigned to YAMAZAKI SHUNPEI (18)· patent assignee history
2012–2015Patents assigned to ONO KOJI (12)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEMICONDUCTOR ENERGY LAB | 280 | 1997–2021 |
| SUZAWA HIDEOMIself | 47 | 2011–2016 |
| SASAGAWA SHINYA | 24 | 2011–2016 |
| YAMAZAKI SHUNPEI | 18 | 2011–2016 |
| ONO KOJI | 12 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 193 | 1997–2021 |
| Atsugi, JP | 92 | 2003–2021 |
| Tochigi, JP | 2 | 2005–2010 |