Power semiconductor package

The present invention generally relates to semiconductor devices, more particularly to packaging of semiconductor devices, and more particularly to a package having low electrical resistance and inductance.

Power semiconductor packages have evolved from through hole to surface mounted packages with the evolution of printed circuit board technology. Surface mounted packages generally include a lead frame on which a semiconductor device is mounted. The semiconductor device and a portion of the lead frame are generally encapsulated with a resin material. In a leaded package, lead terminals extend outside the resin body and include bonding pads for providing a wire bond connection from the semiconductor device to the lead terminal.

Major considerations in the packaging of semiconductor devices include high thermal dissipation, low parasitic inductance, low electrical resistance between the semiconductor device and the circuit environment, good reliability in terms of thermal cycling and thermal shock/fatigue, and minimal consumption of circuit board space.

By way of illustration and with reference to FIG. 1 , a conventional semiconductor package generally designated 1 includes a lead frame generally designated 7 having a lead frame pad 10 to which is coupled a die 8 . A portion of the lead frame 7 may be molded in a resin body 2 . In this embodiment, the die 8 embodies a MOSFET device and the lead frame 7 includes a source terminal 18 , a gate terminal 26 , and a drain terminal 11 . Source terminal 18 of the lead frame 7 includes a plurality of separate source lead frame leads 18 a external to the resin body 2 and a plurality of separate internal source bonding areas 16 where bonding wires 6 are bonded. Drain terminal 11 includes a plurality of separate drain lead frame leads 11 a which are connected to the lead frame pad 10 . The gate terminal 26 is connected to an internal gate bonding area 20 which in turn is connected to a gate pad 17 by means of wire 28 .

FIG. 2 illustrates a top view of another conventional semiconductor package generally designated 4 including a lead frame generally designated 9 . In this embodiment, in lieu of a plurality of separate source bonding areas 16 as shown in FIG. 1 , the source bonding areas 16 are joined to form a single source bonding area 30 for bonding wires 6 to die 8 . As with the embodiment of FIG. 1 , the separate source lead frame leads 18 a and the separate lead frame drain leads 11 a are separate narrow metal strips that radiate externally from the resin body 2 and are adapted to be inserted into the same receptacle location on a printed circuit board as the device shown in FIG. 1 .

Similar to the embodiment of FIG. 1 , the lead frame 9 has die 8 disposed thereon and provides a generally narrow border frame around the perimeter of die 8 . Moreover, the bonding area 20 of gate 26 is coupled via wire 28 to gate pad 17 formed at a nearest corner. In the prior art embodiment, the source and gate bonding areas 16 , 30 and 20 respectively share the same left side of the die 8 . Likewise, the source leads 18 a and the gate lead 26 radiate from the same left side.

With reference to FIG. 3 , a cross sectional view of a conventional semiconductor package such as semiconductor package 1 is shown. Die 8 is shown having a top surface 22 to which bonding wire 6 is coupled. Die 8 may be coupled to lead frame pad 10 by means of conventional material 32 . As is conventional in the art, lead frame generally designated 7 has a thickness of about 8 mils requiring that bonding wires 6 be made from gold or copper. Furthermore, source bonding area 16 is conventionally disposed above top surface 22 requiring a relatively long bonding wire 6 . As is well known in the art, long bonding wires 6 generally provide for increased electrical resistance and source inductance, particularly in high frequency applications.

Referring now to FIG. 4 , a top view of a conventional dual-die semiconductor package generally designated 5 having a lead frame generally designated 13 is shown. The dual-die semiconductor package 5 includes a pair of dies 40 a and 40 b mounted on a lead frame pad 42 and molded in a resin body 2 . A first source terminal 48 a includes a first source terminal bonding area 46 a distributed along a left side of the first die 40 a . The first source terminal bonding area 46 a is connected to the first die 40 a via bonding wires 41 a . A first gate terminal 44 a includes a first gate bonding area 43 a that shares the left side of the first die 40 a and is connected to the first die 40 a via bonding wire 45 a . A plurality of first drain terminals 47 a are coupled to lead frame pad 42 .

A second source terminal 48 b includes a second source terminal bonding area 46 b distributed along a left side of the second die 40 b . The second source terminal bonding area 46 b is connected to the second die 40 b via bonding wires 41 b . A second gate terminal 44 b includes a second gate bonding area 43 b that shares the left side of the second die 40 b and is connected to the second die 40 b via bonding wire 45 b . A plurality of second drain terminals 47 b are coupled to lead frame pad 42 .

With reference to FIG. 5 , a semiconductor package generally designated 50 is shown. Semiconductor package 50 is described in commonly assigned application Ser. No. 10/189,333 which is incorporated herein in its entirety by reference. Semiconductor package 50 includes a lead frame generally designated 51 having an “L” shaped source bonding area 52 . The “L” shaped source bonding area 52 provides for an increase in the number of source bonding wires 53 interconnecting a source lead 54 with a die 55 . Additionally, the distance between bonding wires 53 is not compromised thereby providing lower electrical resistance and inductance.

A prior art leaded package is disclosed in U.S. Pat. No. 6,291,262 entitled “Surface Mount TO-220 Package and Process for the Manufacture Thereof”. The disclosed package includes leads which are bent within the molded housing and formed prior to molding the housing around the lead frame. The bend is located inside the package body to minimize mechanical stresses on the package body. A lead frame is formed of a material having a single gauge.

Another prior art leaded package is disclosed in U.S. Pat. No. 6,211,462 entitled “Low Inductance Power Package for Integrated Circuits”. The package includes a flat lead frame with internal leads formed upward to be in very close proximity to the lead frame pad. The external leads are flat and extend beyond the package edge so that good solder connections to a printed circuit board can be made and inspected.

As can be seen, there remains a need in the art for a semiconductor package that minimizes electrical resistance and inductance. Such a semiconductor package also preferably allows for reduced package height and improved thermal resistance properties.

In accordance with one aspect of the invention, a semiconductor package includes a relatively thick lead frame having a plurality of leads and a first lead frame pad, the first lead frame pad including a die coupled thereto, bonding wires connecting the die to the plurality of leads, the bonding wires being aluminum, and a resin body encapsulating the die, bonding wires and at least a portion of the lead frame.

In accordance with another aspect of the invention, a semiconductor package includes a relatively thick lead frame having a plurality of leads and a pair of lead frame pads, each lead frame pad including a die coupled thereto, bonding wires connecting each die to the plurality of leads, the bonding wires being aluminum, and a resin body encapsulating the die, bonding wires and at least a portion of the lead frame.

In accordance with yet another aspect of the invention, a semiconductor package housing an electronic device includes a relatively thick lead frame having a thickness greater than 8 mils and including a plurality of leads and a lead frame pad, the lead frame pad having the electronic device coupled thereto, bonding wires connecting the electronic device to the plurality of leads, the bonding wires being aluminum wires having a thickness up to 20 mils, and a resin body encapsulating the electronic device, bonding wires and at least a portion of the lead frame.

These and other features, aspects and advantages of the present invention will become better understood with reference to the following drawings, description and claims.

FIG. 1 is top view of a prior art semiconductor package;

FIG. 2 is top view of another prior art semiconductor package;

FIG. 3 is a cross sectional view of a conventional semiconductor package;

FIG. 4 is a top view of a prior art dual-die semiconductor package;

FIG. 5 is a top view of a prior art semiconductor package;

FIG. 6A is a top view of a semiconductor package in accordance with the present invention;

FIG. 6B is a cross sectional view of the semiconductor package of FIG. 6A in accordance with the present invention;

FIG. 6C is a bottom view of the semiconductor package of FIG. 6A in accordance with the present invention;

FIG. 7A is a top view of an alternative embodiment of a semiconductor package in accordance with the present invention;

FIG. 7B is a cross sectional view of the semiconductor package of FIG. 7A in accordance with the present invention;

FIG. 7C is a bottom view of the semiconductor package of FIG. 7A in accordance with the present invention;

FIG. 8A is a top view of an alternative embodiment of a semiconductor package in accordance with the present invention;

FIG. 8B is a cross sectional view of the semiconductor package of FIG. 8A in accordance with the present invention;

FIG. 8C is a bottom view of the semiconductor package of FIG. 8A in accordance with the present invention;

FIG. 9A is a top view of an alternative embodiment of a semiconductor package in accordance with the present invention;

FIG. 9B is a cross sectional view of the semiconductor package of FIG. 9A in accordance with the present invention;

FIG. 9C is a bottom view of the semiconductor package of FIG. 9A in accordance with the present invention;

FIG. 10A is a top view of an alternative embodiment of a semiconductor package in accordance with the present invention;

FIG. 10B is a cross sectional view of the semiconductor package of FIG. 10A in accordance with the present invention;

FIG. 10C is a bottom view of the semiconductor package of FIG. 10A in accordance with the present invention;

FIG. 11A is a top view of an alternative embodiment of a semiconductor package in accordance with the present invention;

FIG. 11B is a cross sectional view of the semiconductor package of FIG. 11A in accordance with the present invention;

FIG. 11C is a bottom view of the semiconductor package of FIG. 11A in accordance with the present invention;

FIG. 12A is a top view of an alternative embodiment of a semiconductor package in accordance with the present invention;

FIG. 12B is a cross sectional view of the semiconductor package of FIG. 12A in accordance with the present invention;

FIG. 12C is a bottom view of the semiconductor package of FIG. 12A in accordance with the present invention;

FIG. 13 is a top view of an alternative embodiment of a semiconductor package in accordance with the present invention;

FIG. 14A is a top view of an alternative embodiment of a semiconductor package in accordance with the present invention;

FIG. 14B is a cross sectional view of the semiconductor package of

FIG. 14A in accordance with the present invention;

FIG. 15 is a top view of an alternative embodiment of a semiconductor package in accordance with the present invention;

FIG. 16 is a top view of an alternative embodiment of a semiconductor package in accordance with the present invention;

FIG. 17 is a cross sectional view of an alternative embodiment of a semiconductor package in accordance with the present invention;

FIG. 18 is a cross sectional view of an alternative embodiment of a semiconductor package in accordance with the present invention;

FIG. 19 is a cross sectional view of an alternative embodiment of a semiconductor package in accordance with the present invention;

FIG. 20 is a cross sectional view of an alternative embodiment of a semiconductor package in accordance with the present invention;

FIG. 21A is a cross sectional view of an alternative embodiment of a semiconductor package in accordance with the present invention;

FIG. 21B is a top view of the semiconductor package of FIG. 21A in accordance with the present invention;

FIG. 21C is a cross sectional view of the semiconductor package of FIG. 21A in accordance with the present invention;

FIG. 22A is a top view of an alternative embodiment of a semiconductor package in accordance with the present invention;

FIG. 22B is a cross sectional view of the semiconductor package of FIG. 22A in accordance with the present invention; and

FIG. 22C is a bottom view of the semiconductor package of FIG. 22A in accordance with the present invention.

The following detailed description is of the best modes of carrying out the invention. The description is not to be taken in a limiting sense, but is made merely for the purpose of illustrating the general principles of the invention, since the scope of the invention is best defined by the appended claims.

The present invention generally provides a semiconductor package having a lead frame formed of a single gauge material having a thickness greater than the conventional 8 mils. Advantageously, a thicker lead frame facilitates the bonding of larger diameter aluminum bonding wires. The use of aluminum bonding wires decreases package resistance dramatically over conventional gold wire configurations. Bonding wires may be up to 20 mils in diameter. A thicker lead frame material further provides for improved package thermal behavior by facilitating heat flow laterally out a drain lead. This is so even in a case where a bottom portion of lead frame pad is exposed. Further, a source bonding area and a gate bonding area may be disposed at a substantially same height as a height of a die. In this manner, a short length of bonding wires may be used to thereby reduce electrical resistance and inductance.

With reference to FIG. 6A , a semiconductor package generally designated 600 may include a lead frame generally designated 630 having a lead frame pad 602 to which may be coupled a die 601 . A portion of the lead frame 630 may be molded in a resin body 608 . The lead frame 630 may include a source lead 616 , a gate lead 612 , and a drain lead 626 . Source lead 616 may be disposed externally of resin body 608 and coupled to an internal source bonding area 618 which in turn may be coupled to a device source (not shown) by means of bonding wires 610 . Source lead 616 may be formed as a single lead to facilitate the use of a maximum number of bonding wires 610 to thereby reduce on-resistance and inductance. Drain lead 626 may be connected to the lead frame pad 602 . Gate lead 612 may be connected to an internal gate bonding area 620 which in turn may be connected to a gate pad 627 by means of wire 606 . A source locking hole 614 and a drain locking hole 624 may be formed in source lead 616 and drain lead 626 respectively. Locking notches 628 may be formed in drain lead 626 .

With reference to FIG. 6B , lead frame 630 may be formed of a single gauge material having a thickness greater than the conventional 8 mils. Advantageously, a thicker lead frame 630 facilitates the bonding of larger diameter aluminum bonding wires 610 and 606 and/or a greater number of bonding wires 610 and 606 . The use of aluminum bonding wires 610 and 606 decreases package inductance and resistance dramatically over conventional gold wire configurations. Bonding wires 610 and 606 may be up to 20 mils in diameter. A thicker lead frame material further provides for improved package thermal behavior by facilitating heat flow laterally out drain lead 626 . This is so even in a case where a bottom portion 650 of lead frame pad 602 is exposed as shown in FIG. 6C .

With continued reference to FIG. 6B , source bonding area 618 and gate bonding area 620 (not shown) may be disposed at a substantially same height as a height of die 601 . In this manner, a short length of bonding wires 610 and 606 may be used to thereby reduce electrical resistance and inductance.

With reference to FIG. 7A , FIG. 7B , and FIG. 7C , a second alternative embodiment of the present invention generally designated 700 is shown. A die 701 may be bonded to a lead frame pad 752 . Source lead 716 and gate lead 712 may be configured in similar fashion to source lead 616 and gate lead 612 as in the embodiment shown in FIG. 6A . A source locking hole 714 may be formed in source lead 716 . A drain lead 756 may be connected to lead frame pad 752 . Locking notches 728 may be formed in drain 756 to secure leadframe 752 to resin body 708 . A notch 760 may be formed along a length of drain lead 756 on a bottom portion 750 of lead frame pad 752 . This embodiment advantageously provides for a means of holding the semiconductor package 700 during solder reflow. Lower inductance and resistance is achieved in the embodiment by straight current flow through drain lead 756 and thick and/or a greater number of bonding wires 710 and 706 . As in the embodiment shown in FIG. 6 , high heat dissipation is achieved by exposed bottom portion 750 .

A third alternative embodiment of the present invention generally designated 800 including a lead frame generally designated 830 is shown in FIG. 8A , FIG. 8B , and FIG. 8C . Semiconductor package 800 may be implemented as an isolated dual die device. A pair of lead frame pads 872 A and 872 B may be provided, each lead frame pad 872 A and 872 B having bonded thereto devices 870 A and 870 B respectively. Leadframe 830 may include a source lead 876 A, a gate lead 812 A, and drain lead 886 A. Leadframe 830 may further include a source lead 876 B, a gate lead 812 B, and drain lead 886 B. Locking holes 814 A and 814 B may be formed in drain lead 886 A and 886 B respectively. As shown in FIG. 8B , semiconductor package 800 may include a lead frame 830 formed of a single gauge material having a thickness greater than the conventional 8 mils. A thicker lead frame 830 advantageously provides for reduced package resistance and inductance as described with reference to semiconductor package 600 . Additionally source bonding pads 878 A and 878 B and gate bonding pads 820 A and 820 B may be disposed at a substantially same height as a height of dice 870 A and 870 B. In this manner, a short length of bonding wires 810 A, 806 A, 810 B, and 806 B may be used to thereby reduce electrical resistance and inductance.

A fourth alternative embodiment of the present invention generally designated 900 is shown in FIG. 9A , FIG. 9B , and FIG. 9C . In contrast to semiconductor package 800 , semiconductor package 900 may include a notch 950 A formed along a length of lead frame pad 992 A on a bottom surface 960 A thereof and a notch 950 B formed along a length of lead frame pad 992 B on a bottom surface 960 B thereof. As noted with reference to semiconductor package 700 , notches 950 A and 950 B may provide for a means of holding the semiconductor package 900 during solder reflow. Lower inductance and resistance is achieved in the embodiment by straight current flow through drain leads 996 A and 996 B.

With reference to FIG. 10A , FIG. 10B , and FIG. 10C , a fifth alternative embodiment of the present invention generally designated 1000 is shown. Semiconductor package 1000 may include a lead frame generally designated 1030 having a lead frame pad 1098 to which may be coupled a die 1001 . A portion of the lead frame 1030 may be molded in a resin body 1008 . The lead frame 1030 may include a source lead 1016 , a gate lead 1012 , and a drain lead 1099 . Source lead 1016 may be disposed externally of resin body 1008 and coupled to an internal source bonding area 1018 which in turn may be coupled to a device source (not shown) by means of bonding wires 1010 . Drain lead 1099 may be connected to the lead frame pad 1098 . Gate lead 1012 may be connected to an internal gate bonding area 1020 which in turn may be connected to a gate pad 1027 by means of wire 1006 . A source locking hole 1024 and a drain locking hole 1026 may be formed in source lead 1016 and drain lead 1099 respectively. Locking notches 1028 may be formed in drain lead 1099 . With particular reference to FIG. 10B and FIG. 10C , a bottom portion 1009 of lead frame pad 1098 may be encapsulated in resin body 1008 by resin portion 1011 .

Lead frame 1030 may be formed of a single gauge material having a thickness greater than the conventional 8 mils. A thicker lead frame 1030 advantageously provides for reduced package resistance and inductance as described with reference to semiconductor package 600 . Additionally source bonding area 1018 and gate bonding area 1020 may be disposed at a substantially same height as a height of die 1001 . In this manner, a short length of bonding wires 1010 and 1006 may be used to thereby reduce electrical resistance and inductance.

A sixth alternative embodiment of the present invention generally designated 1100 is shown in FIG. 11A , FIG. 11B , and FIG. 11C . Semiconductor package 1100 may include a lead frame generally designated 1150 . Lead frame 1150 may include a lead frame pad 1108 having a die 1101 coupled thereto. A portion of lead frame 1150 may be molded in resin body 1109 . The lead frame 1150 may include a pair of source leads 1116 A and 1116 B, a gate lead 1112 , and a drain lead comprising the lead frame pad 1108 . Source leads 1116 A and 116 B may be disposed opposite one another and externally of resin body 1109 and coupled to internal source bonding areas 1118 A and 1118 B which in turn may be coupled to a device source (not shown) by means of bonding wires 1110 A and 1110 B. Gate lead 1112 may be connected to internal gate bonding area 1120 which in turn may be connected to a gate pad 1127 by means of bonding wire 1106 . A source locking hole 1124 A may be formed in source lead 1116 A and source locking holes 1124 B may be formed in source lead 1116 B.

Lead frame 1150 may be formed of a single gauge material having a thickness greater than the conventional 8 mils. A thicker lead frame 1150 advantageously provides for reduced package resistance and inductance as described with reference to semiconductor package 600 . Additionally source bonding areas 1118 A and 1118 B and gate bonding area 1120 may be disposed at a substantially same height as a height of die 1101 . In this manner, a short length of bonding wires 111 A, 1110 B, and 1106 may be used to thereby reduce electrical resistance and inductance. Further, a greater number of source bonding wires 1110 A and 1110 B reduces electrical resistance and inductance.

With reference to FIG. 12A , FIG. 12B , and FIG. 12C , a seventh embodiment of the present invention generally designated 1200 is shown. Semiconductor package 1200 may include a lead frame generally designated 1250 . Lead frame 1250 may include a lead frame pad 1208 having a die 1201 coupled thereto. A portion of lead frame 1250 may be molded in resin body 1209 . The lead frame 1250 may include a pair of source leads 1216 A and 1216 B, a gate lead 1212 , and a drain lead comprising the lead frame pad 1208 . Source leads 1216 A and 1216 B may be disposed opposite one another and externally of resin body 1209 and stitch bonded to internal source bonding areas 1218 A and 1218 B which in turn may be stitch bonded to a device source (not shown) by means of bonding wires 1210 . Gate lead 1212 may be connected to internal gate bonding area 1220 which in turn may be connected to a gate pad 1227 by means of bonding wire 1206 . A source locking hole 1224 A may be formed in source lead 1216 A and source locking holes 1224 B may be formed in source lead 1216 B. This embodiment advantageously provides for reduced electrical resistance by reducing metal spreading resistance at a die surface 1260 and providing uniform current distribution.

Lead frame 1250 may be formed of a single gauge material having a thickness greater than the conventional 8 mils. A thicker lead frame 1250 advantageously provides for reduced package resistance and inductance as described with reference to semiconductor package 600 . Additionally source bonding areas 1218 A and 1218 B and gate bonding area 1220 may be disposed at a substantially same height as a height of die 1201 . In this manner, a short length of bonding wires 1210 and 1206 may be used to thereby reduce electrical resistance and inductance.

With reference to FIG. 13 an eighth alternative embodiment of the present invention generally designated 1300 is shown. Semiconductor package 1300 may be implemented as a common drain dual die device. Semiconductor package 1300 may include a lead frame generally designated 1360 . Lead frame 1360 may include a lead frame pad 1368 having a pair of devices 1330 A and 1330 B bonded thereto. Device 1330 A may include a source lead 1316 A, a gate lead 1312 A, and shared drain lead comprising lead frame pad 1368 . Device 1330 B may include a source lead 1316 B, a gate lead 1312 B, and shared drain lead. Source locking holes 1340 A and 1340 B may be formed in source leads 1316 A and 1316 B respectively.

Lead frame 1350 may be formed of a single gauge material having a thickness greater than the conventional 8 mils. A thicker lead frame 1350 advantageously provides for reduced package resistance and inductance as described with reference to semiconductor package 600 . Additionally source bonding areas 1318 A and 1318 B and gate bonding areas 1320 A and 1320 B may be disposed at a substantially same height as a height of dice 1330 A and 1330 B. In this manner, a short length of bonding wires 1310 A, 1310 B, 1306 A and 1306 B may be used to thereby reduce electrical resistance and inductance. Further a greater number of bonding wires 1310 A and 1310 B may be used to further reduce electrical resistance and inductance.

A ninth alternative embodiment of the present invention generally designated 1400 is shown in FIG. 14A and FIG. 14B . Semiconductor package 1400 may be implemented as a dual die device. Semiconductor package 1400 may include a lead frame generally designated 1460 . Lead frame 1460 may include lead frame pads 1408 A and 1408 B having devices 1430 A and 1430 B bonded respectively thereto. Leadframe 1460 may include a source lead 1416 A, a gate lead 1412 A, and a drain lead comprising lead frame pad 1408 A. Leadframe 1460 may further include a source lead 1416 B, a gate lead 1412 B, and a drain lead comprising lead frame pad 1408 B. Source locking holes 1440 A and 1440 B may be formed in source leads 1416 A and 1416 B respectively.

Lead frame 1460 may be formed of a single gauge material having a thickness greater than the conventional 8 mils. A thicker lead frame 1460 advantageously provides for reduced package resistance and inductance as described with reference to semiconductor package 600 . Additionally source bonding areas 1418 A and 1418 B and gate bonding areas 1420 A and 1420 B may be disposed at a substantially same height as a height of dice 1430 A and 1430 B. In this manner, a short length of bonding wires 1410 A, 1410 B, 1406 A and 1406 B may be used to thereby reduce electrical resistance and inductance. Further a greater number of bonding wires 1410 A and 1410 B may be used to further reduce electrical resistance and inductance.

With reference to FIG. 15 , a tenth alternative embodiment of the present invention generally designated 1500 is shown. Semiconductor package 1500 may include a large package occupying the footprint of an SO14 to SO20 package. Semiconductor package 1500 may include a lead frame generally designated 1530 . Lead frame 1530 may include lead frame pads 1502 A and 1502 B having devices 1501 A and 1501 B bonded respectively thereto. Leadframe 1530 may include a source lead 1516 A, a gate lead 1512 A, and a drain lead 1526 A. Leadframe 1530 may further include a source lead 1516 B, a gate lead 1512 B, and a drain lead 1526 B. Source lead 1516 A and gate lead 1512 A may be disposed on a same first side 1560 of semiconductor package 1500 as source lead 1516 B and gate lead 1512 B. Drain lead 1526 A and drain lead 1526 B may be disposed on a second side 1570 of semiconductor package 1500 . Source locking holes 1540 A and 1540 B may be formed in source leads 1516 A and 1516 B respectively. Drain locking holes 1550 A and 1550 B may be formed in drain leads 1526 A and 1526 B respectively. Locking notches 1528 A and 1528 B may be formed in drain leads 1526 A and 1526 B respectively. Lead frame 1530 may be formed of a single gauge material having a thickness greater than the conventional 8 mils. A thicker lead frame 1530 advantageously provides for reduced package resistance and inductance as described with reference to semiconductor package 600 . Additionally source bonding areas 1518 A and 1518 B and gate bonding areas 1520 A and 1520 B may be disposed at a substantially same height as a height of dice 1501 A and 1501 B. In this manner, a short length of bonding wires 1510 A, 1510 B, 1506 A and 1506 B may be used to thereby reduce electrical resistance and inductance.

An eleventh alternative embodiment of the present invention generally designated 1600 is shown in FIG. 16 . Semiconductor package 1600 may include a large package occupying the footprint of an SO14 to SO20 package. Semiconductor package 1600 may include a lead frame generally designated 1630 . Lead frame 1630 may include lead frame pads 1602 A and 1602 B having devices 1601 A and 1601 B bonded respectively thereto. Leadframe 1630 may include a source lead 1616 A, a gate lead 1612 A, and a drain lead 1626 A. Leadframe 1630 may further include a source lead 1616 B, a gate lead 1612 B, and a drain lead 1626 B. Source lead 1616 A and gate lead 1612 A may bed is posed on an opposite side of semiconductor package 1600 from source lead 1616 B and gate lead 1612 B. Drain lead 1626 A may be disposed on an opposite side of semiconductor package 1600 from drain lead 1626 B. Source locking holes 1640 A and 1640 B may be formed in source leads 1616 A and 1616 B respectively. Drain locking holes 1650 A and 1650 B may be formed in drain leads 1626 A and 1626 B respectively. Locking notches 1660 A and 1660 B may be formed in drain leads 1626 A and 1626 B respectively. Lead frame 1630 may be formed of a single gauge material having a thickness greater than the conventional 8 mils. A thicker lead frame 1630 advantageously provides for reduced package resistance and inductance as described with reference to semiconductor package 600 . Additionally source bonding areas 1618 A and 1618 B and gate bonding areas 1620 A and 1620 B may be disposed at a substantially same height as a height of dice 1601 A and 1601 B. In this manner, a short length of bonding wires 1610 A, 1610 B, 1606 A and 1606 B may be used to thereby reduce electrical resistance and inductance.

With reference to FIG. 17 , a twelfth alternative embodiment of the present invention generally designated 1700 is shown. Semiconductor package 1700 is similar to semiconductor package 1100 ( FIG. 11A , FIG. 11B , and FIG. 11C ) except that a bottom portion 1720 of lead frame pad 1708 is encapsulated in resin body 1709 .

A thirteenth alternative embodiment of the present invention generally designated 1800 is shown in FIG. 18 . Semiconductor package 1800 may include a lead frame pad 1858 having mounted thereon a semiconductor device 1851 . A resin body 1808 may encapsulate a portion of a lead frame (not shown). A plurality of contact regions 1872 may be used to connect a lead portion 1868 of lead frame to a device region. Contact regions 1872 may include solder, brazing, Au bump, Ag epoxy, Cu bump or other means of connection. The device region may be a source region in the case of a vertical device and a drain region in the case of a lateral device. A lead 1866 may be coupled to lead portion 1868 . A lead 1816 may be coupled to a lead bonding area 1818 which may in turn be coupled to a device region by means of bonding wire 1818 . The lead frame may be formed of a single gauge material having a thickness greater than the conventional 8 mils. A thicker lead frame advantageously provides for reduced package resistance and inductance as described with reference to semiconductor package 600 . Additionally lead bonding area 1818 may be disposed at a substantially same height as a height of device 1851 . In this manner, a short length of bonding wire 1810 may be used to thereby reduce electrical resistance and inductance.

With reference to FIG. 19 , a fourteenth alternative embodiment of the present invention generally designated 1900 is shown. A lead portion 1918 may be connected to a device region (such as a source or drain region) of device 1951 by means of contact regions 1972 . Advantageously, package 1900 provides for improved thermal dissipation through leads 1916 .

With reference to FIG. 20 , a fifteenth alternative embodiment of the present invention generally designated 2000 is shown. A first lead portion 2068 A may be connected to a device region (such as a source or drain region) of device 2051 by means of contact regions 2072 A. A second lead portion 2068 B may be connected to a device region of device 2051 by means of contact regions 2072 B.

A sixteenth alternative embodiment of the present invention generally designated 2100 is shown in FIG. 21A , FIG. 21B , and FIG. 21C . Semiconductor package 2100 may include a lead frame generally designated 2130 . A resin body 2152 may encapsulate a portion of lead frame 2130 . Lead frame 2130 may include a source lead 2116 , a gate lead 2112 , and a drain lead 2126 . Drain lead 2126 may include a pair of opposing drain lead portions 2150 . Drain lead portions 2150 may be exposed through resin body 2152 by cutouts 2156 to provide for locking of package 2100 .

A seventeenth alternative embodiment of the invention generally designated 2200 is shown in FIG. 22A , FIG. 22B , and FIG. 22C . Semiconductor package 2200 may include a lead frame generally designated 2230 having a lead frame pad 2202 to which may be coupled a die 2201 . A portion of the lead frame 2230 may be molded in a resin body 2208 . The lead frame 2230 may include a source lead 2216 , a gate lead 2212 , and a drain lead 2226 . Source lead 2216 may be disposed externally of resin body 2208 and coupled to an internal source bonding area 2218 which in turn may be coupled to a device source by means of bonding wires 2210 . Source lead 2216 may be formed as a single lead to facilitate the use of a maximum number of bonding wires 2210 to thereby reduce on-resistance and inductance. Drain lead 2226 may be connected to the lead frame pad 2202 . Gate lead 2212 may be connected to an internal gate bonding area 2220 which in turn may be connected to a gate pad 2227 by means of bonding wire 2206 . Locking notches 2228 may be formed in source lead 2216 .

With particular reference to FIG. 22B , lead frame 2230 may be formed of a single gauge material having a thickness greater than the conventional 8 mils. Advantageously, a thicker lead frame 2230 facilitates the bonding of larger diameter aluminum bonding wires 2210 and 2206 and/or a greater number of bonding wires 2210 and 2206 . The use of aluminum bonding wires 2210 and 2206 decreases package inductance and resistance dramatically over conventional gold wire configurations. Bonding wires 2210 and 2206 may be up to 20 mils in diameter. A thicker lead frame material further provides for improved package thermal behavior by facilitating heat flow laterally out drain lead 2226 . This is so even in a case where a bottom portion 2250 of lead frame pad 2202 is exposed as shown in FIG. 22C .

With continued reference to FIG. 22B , source bonding area 2218 and gate bonding area 2220 (not shown) may be disposed at a substantially same height as a height of die 2201 . In this manner, a short length of bonding wires 2210 and 2206 may be used to thereby reduce electrical resistance and inductance.

As will be appreciated by those skilled in the art, the present invention generally provides a semiconductor package having a lead frame formed of a single gauge material having a thickness greater than the conventional 8 mils. Advantageously, a thicker lead frame facilitates the bonding of larger diameter aluminum bonding wires. The use of aluminum bonding wires decreases package resistance dramatically over conventional gold wire configurations. Bonding wires may be up to 20 mils in diameter. A thicker lead frame material further provides for improved package thermal behavior by facilitating heat flow laterally out a drain lead. This is so even in a case where a bottom portion of lead frame pad is exposed. Further, a source bonding area and a gate bonding area may be disposed at a substantially same height as a height of a die. In this manner, a short length of bonding wires may be used to thereby reduce electrical resistance and inductance.

It should be understood, of course, that the foregoing relates to preferred embodiments of the invention and that modifications may be made without departing from the spirit and scope of the invention as set forth in the following claims.