LexDanaLexDanabeta
Inventor

Hisashi Ohtani

Inventor
Kanagawa, JP

Overview

434→
Patents
1993–2019
Patent span
Electricity
Primary field (CPC H)

Patents· 434 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices34%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein13%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
H10KOrganic electric solid-state devices3%
G02BOptical elements, systems or apparatus2%
G09GArrangements or circuits for control of indicating devices using static means to present variable information2%
B23KSoldering or unsoldering2%
H05BElectric heating2%
PatentTitleYear
10,229,555Card game machine201910,096,795Display device and method for manufacturing the display device20189,666,458'Heat treatment apparatus and heat treatment method'20179,553,114'Display device and electronic device with a color filter'20179,551,063'Fabrication system and a fabrication method of a light emitting device'20179,508,619'Semiconductor device and method for manufacturing the same'20169,502,440'Display device and electronic device'20169,444,069'Display device and method for manufacturing the display device'20169,412,060'Semiconductor device and method for manufacturing the same'20169,389,477'Semiconductor device and method of manufacturing the same'20169,281,495'Display device and method for manufacturing the display device'20169,245,907'Display device and electronic device'20169,214,493'Light emitting device'20159,070,604'Method of fabricating a semiconductor device'20158,928,081'Semiconductor device having display device'20158,872,331'Semiconductor device and method for manufacturing the same'20148,860,899'Active matrix liquid crystal display device'20148,809,133'Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same'20148,791,629'Light emitting device including pixel the pixel including sub-pixels'20148,723,182'Semiconductor device and method of manufacturing the same'20148,698,160'Method of manufacturing thin film transistor'20148,696,808'Laser irradiation apparatus'20148,632,391'Card game machine'20148,603,870'Semiconductor device and method of manufacturing the same'20138,592,861'Display device and manufacturing method of the display device'20138,576,348'Reflective liquid crystal display panel and device using same'20138,558,370'Semiconductor device with antenna'20138,552,418'Semiconductor device and manufacturing method thereof'20138,536,784'Light-emitting device and method of manufacturing the same, and method of operating manufacturing apparatus'20138,531,619'Active matrix liquid crystal display device with overlapping conductive film and pixel electrode'20138,497,508'Semiconductor device and manufacturing method thereof'20138,497,822'Light emitting device and driving method of the same'20138,482,069'Nonvolatile memory and electronic apparatus'20138,459,561'Semiconductor device and method for manufacturing the same'20138,440,509'Method for producing a semiconductor device by etch back process'20138,405,789'Reflective liquid crystal display panel and device using same'20138,405,090'Method of fabricating a semiconductor device'20138,405,149'Semiconductor device having display device'20138,384,084'Semiconductor thin film and semiconductor device'20138,373,173'Method of manufacturing thin film transistor'20138,368,142'Semiconductor device and method of manufacturing the same'20138,350,466'Display device and manufacturing method thereof'20138,338,931'Semiconductor device and product tracing system utilizing the semiconductor device having top and bottom fibrous sealing layers'20128,334,645'Light emitting device emitting four specific colors'20128,304,350'Method of manufacturing a semiconductor device'2012RE043782'Active matrix display device having wiring layers which are connected over multiple contact parts'20128,248,551'Semiconductor device including capacitor line parallel to source line'20128,237,169'Method of manufacturing thin film transistor'20128,222,696'Semiconductor device having buried oxide film'20128,218,100'Active matrix liquid crystal display device'20128,212,284'Display device and manufacturing method of the display device'2012RE043450'Method for fabricating semiconductor thin film'20128,193,533'Display device having thin film transistors'20128,168,975'Semiconductor device and manufacturing method thereof'20128,154,676'Active matrix liquid crystal display device'20128,143,625'Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same'20128,138,670'Light-emitting device and method of manufacturing the same, and method of operating manufacturing apparatus'20128,129,232'Semiconductor device and method of manufacturing the same'20128,030,658'Method of manufacturing thin film transistor'20118,031,284'Reflective liquid crystal display panel and device using same'20118,012,529'Light emitting element and manufacturing method thereof'20117,998,844'Method for manufacturing a semiconductor device'20117,993,992'Semiconductor device and method of fabricating the same'20117,974,524'Heat treatment apparatus and heat treatment method'20117,968,427'Manufacturing method of semiconductor device'20117,948,571'Semiconductor device having thin film transistor with particular drain electrode structure'20117,943,930'Semiconductor device forming method'20117,932,589'Semiconductor device and method for manufacturing the same'20117,928,438'Semiconductor thin film and semiconductor device'2011RE042241'Method of fabricating a semiconductor device'20117,906,847'Semiconductor device'20117,898,166'Light emitting device emitting four specific colors'20117,898,605'Active matrix liquid crystal with capacitor below disclination region'20117,892,952'Laser apparatus, laser irradiation method, manufacturing method for semiconductor device, semiconductor device, production system for semiconductor device using the laser apparatus, and electronic equipment'20117,888,702'Display device and manufacturing method of the display device'2011RE042139'Method of fabricating a semiconductor device'2011RE042097'Method of fabricating a semiconductor device'20117,863,622'Semiconductor device and manufacturing method therefor'20117,847,294'Semiconductor device and method of manufacturing the same'20107,837,792'Method for manufacturing semiconductor device'20107,817,170'Display device and method for driving the same'20107,808,098'Semiconductor device and manufacturing method thereof'20107,791,571'Light emitting device and driving method of the same'20107,785,933'Method for manufacturing semiconductor device'20107,776,712'Method of forming a semiconductor device'20107,772,592'Semiconductor thin film and semiconductor device'20107,767,559'Process for fabricating semiconductor device'20107,759,788'Semiconductor device'20107,759,681'Thin film circuit'20107,749,819'Method for manufacturing semiconductor device'20107,736,958'Method for manufacturing semiconductor device'20107,709,837'Semiconductor device and its manufacturing method'20107,700,421'Semiconductor device and method for manufacturing the same'20107,691,692'Substrate processing apparatus and a manufacturing method of a thin film semiconductor device'20107,679,087'Semiconductor active region of TFTs having radial crystal grains through the whole area of the region'20107,675,583'Reflective liquid crystal display panel and device using same'20107,670,935'Manufacturing method of semiconductor device'20107,667,235'Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same'20107,642,598'Method of fabricating a semiconductor device'20107,638,805'Method of fabricating a semiconductor device'20097,635,861'Semiconductor device and method of manufacturing the same'20097,622,740'Semiconductor device and method of fabricating the same'20097,619,253'Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same'20097,612,376'Semiconductor device'20097,576,485'Image display device with narrow frame'20097,573,110'Method of fabricating semiconductor devices'20097,574,280'Automatic material handling system, production system for semiconductor device, and production management method for semiconductor device'20097,553,716'Method for manufacturing a semiconductor thin film'20097,550,325'Method of manufacturing an active matrix display device'20097,510,915'Semiconductor device and method of fabricating thereof'20097,510,920'Manufacturing method for a thin film transistor that uses a pulse oscillation laser crystallize an amorphous semiconductor film'20097,485,898'Method of manufacturing semiconductor devices'20097,485,553'Process for manufacturing a semiconductor device'20097,483,089'Semiconductor device having thin film transistor with particular drain electrode'20097,482,627'Semiconductor device, and method of fabricating the same'20097,476,937'Semiconductor device and method of fabricating the same'20097,476,576'Method of fabricating a semiconductor device'20097,473,971'Method of fabricating a semiconductor device'20097,473,592'Method of fabricating a semiconductor device'20097,473,622'Laser annealing method and manufacturing method of a semiconductor device'20097,470,575'Process for fabricating semiconductor device'20087,462,517'Electro-optical device and semiconductor circuit'20087,456,371'Laser apparatus and laser annealing method'20087,456,056'Semiconductor device and method for fabricating the same'20087,452,794'Manufacturing method of a thin film semiconductor device'20087,453,088'Electro-optical device and manufacturing method thereof'20087,446,340'Method of manufacturing thin film transistor'20087,439,111'Semiconductor device and manufacturing method thereof'20087,439,667'Light emitting device with specific four color arrangement'20087,439,115'Semiconductor fabricating apparatus'20087,429,751'Method of manufacturing a semiconductor device'20087,427,780'Semiconductor device and method of fabricating same'20087,425,743'Projection television set'20087,420,211'Wiring line and manufacture process thereof, and semiconductor device and manufacturing process thereof'20087,417,253'Semiconductor device and manufacturing method therefor'20087,414,288'Semiconductor device having display device'20087,410,850'Heating treatment device, heating treatment method and fabrication method of semiconductor device'20087,402,471'Semiconductor device and method for manufacturing the same'20087,397,518'Active matrix liquid crystal with capacitor below disclination region'20087,391,054'Semiconductor device and manufacturing method thereof'20087,391,051'Semiconductor device forming method'20087,378,126'Light-emitting device and method of manufacturing the same, and method of operating manufacturing apparatus'20087,374,978'Method of manufacturing semiconductor device'20087,339,235'Semiconductor device having SOI structure and manufacturing method thereof'20087,338,913'Semiconductor device, manufacturing method thereof, and electronic device'20087,326,604'Semiconductor device and method of manufacturing the same'20087,323,717'Semiconductor device'20087,307,007'Semiconductor device'20077,300,826'Manufacturing method of semiconductor and manufacturing method of semiconductor device'20077,297,978'Semiconductor thin film and semiconductor device'20077,294,535'Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same'20077,291,967'Light emitting element including a barrier layer and a manufacturing method thereof'20077,282,398'Crystalline semiconductor thin film, method of fabricating the same, semiconductor device and method of fabricating the same'20077,279,372'Manufacturing method of semiconductor device'20077,271,082'Method of manufacturing a semiconductor device'20077,256,760'Semiconductor device'20077,253,441'Method of manufacturing thin film transistor'20077,244,962'Method of manufacturing semiconductor devices'20077,235,810'Semiconductor device and method of fabricating the same'20077,235,828'Semiconductor device with residual nickel from crystallization of semiconductor film'20077,226,823'Semiconductor device and method of manufacturing the same'20077,223,666'Semiconductor device that includes a silicide region that is not in contact with the lightly doped region'20077,214,574'Heating treatment device, heating treatment method and fabrication method of semiconductor device'20077,202,497'Semiconductor device'20077,195,801'Manufacturing process for storing and transferring evaporation material'20077,192,865'Semiconductor device and process for producing the same'20077,192,813'Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same'20077,186,597'Method of manufacturing transistors'20077,186,601'Method of fabricating a semiconductor device utilizing a catalyst material solution'20077,186,600'Semiconductor device and method of manufacturing the same'20077,179,698'Laser apparatus, laser annealing method, and manufacturing method of a semiconductor device'20077,173,282'Semiconductor device having a crystalline semiconductor film'20077,173,280'Electro-optical device and manufacturing method thereof'20077,166,500'Method of manufacturing a semiconductor device'20077,153,729'Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same'20067,148,094'Semiconductor device and method for its preparation'20067,141,821'Semiconductor device having an impurity gradient in the impurity regions and method of manufacture'20067,141,461'Method for manufacturing a semiconductor device'20067,141,462'Substrate of semiconductor device and fabrication method thereof as well as semiconductor device and fabrication method thereof'20067,138,658'Semiconductor device and method of manufacturing the same'20067,135,707'Semiconductor device having insulated gate electrode'20067,135,741'Method of manufacturing a semiconductor device'20067,122,409'Semiconductor device and a method of manufacturing the same'20067,122,450'Process for manufacturing a semiconductor device'20067,118,780'Heat treatment method'20067,115,452'Method of making semiconductor device'20067,105,048'Laser irradiation apparatus'20067,102,169'Semiconductor device'20067,084,016'Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same'20067,078,727'Semiconductor device and its manufacturing method'20067,071,041'Method of manufacturing a semiconductor device'20067,064,016'Semiconductor device and method of fabricating thereof'20067,058,468'Automatic material handling system, production system for semiconductor device, and production management method for semiconductor device'20067,050,878'Semiconductror fabricating apparatus'20067,037,809'Method of manufacturing semiconductor device using a laser irradiation process'20067,037,765'Semiconductor device and method of manufacturing the same'20067,026,193'Method of manufacturing a semiconductor device having TFTs with uniform characteristics'20067,026,197'Method of fabricating semiconductor device'20067,023,052'Semiconductor device having crystalline semiconductor layer'20067,022,590'Method for forming a semiconductor device using crystals of crystal growth'20067,011,995'Electro-optical device and semiconductor circuit'20066,998,639'Method for manufacturing a semiconductor device'20066,991,976'Method for manufacturing a semiconductor thin film'20066,987,283'Semiconductor device structure'20066,979,632'Fabrication method for thin-film semiconductor'20056,979,841'Semiconductor integrated circuit and fabrication method thereof'20056,979,605'Manufacturing method for a semiconductor device using a marker on an amorphous semiconductor film to selectively crystallize a region with a laser light'20056,977,394'Semiconductor device and manufacturing method therefor'20056,977,393'Electro-optical device and manufacturing method thereof'20056,974,763'Method of forming semiconductor device by crystallizing amorphous silicon and forming crystallization promoting material in the same chamber'20056,974,731'Laser apparatus, laser annealing method, and manufacturing method of a semiconductor device'20056,974,732'Semiconductor device method of manufacturing'20056,972,435'Camera having display device utilizing TFT'20056,967,696'Reflective liquid crystal display panel and device using same'20056,962,860'Method of manufacturing a semiconductor device'20056,955,954'Semiconductor device and method for manufacturing the same'20056,949,418'Method of manufacturing semiconductor device'20056,939,755'Semiconductor device method of manufacturing the same'20056,919,237'Process for fabricating thin film transistors'20056,914,302'Semiconductor device and manufacturing method thereof'20056,911,698'Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same'20056,893,503'Method of manufacturing a semiconductor device'20056,890,805'Method of manufacturing semiconductor device including thin film transistor over thermal oxidation film over a glass substrate having distortion point of not lower than 750° C'20056,884,698'Method for manufacturing semiconductor device with crystallization of amorphous silicon'20056,882,018'Semiconductor device that include silicide layers'20056,876,038'Projection TV'20056,867,085'Insulated gate semiconductor device and method of manufacturing the same'20056,864,127'Semiconductor device and method of fabricating the same'20056,861,670'Semiconductor device having multi-layer wiring'20056,855,956'Semiconductor thin film and semiconductor device'20056,853,004'Thin film transistor formed on a resin substrate'20056,835,586'Semiconductor device and manufacturing method thereof'20046,830,617'Method for manufacturing semiconductor device'20046,830,616'Manufacturing method of semiconductor and manufacturing method of semiconductor device'20046,825,072'Method of manufacturing a semiconductor device'20046,822,262'Semiconductor thin film and semiconductor device'20046,821,710'Method of manufacturing semiconductor device'20046,815,273'Method of manufacturing semiconductor devices'20046,809,021'Wiring line and manufacture process thereof and semiconductor device and manufacturing process thereof'20046,803,264'Method of fabricating a semiconductor device'20046,798,023'Semiconductor device comprising first insulating film, second insulating film comprising organic resin on the first insulating film, and pixel electrode over the second insulating film'20046,794,681'Substrate of semiconductor device and fabrication method thereof as well as semiconductor device and fabrication method thereof'20046,791,112'Electro-optical device and manufacturing method thereof'20046,784,037'Semiconductor device and manufacturing method therefor'20046,764,886'Manufacturing method of semiconductor device'20046,764,928'Method of manufacturing an El display device'20046,756,657'Method of preparing a semiconductor having controlled crystal orientation'20046,753,212'Laser apparatus, laser annealing method, and manufacturing method of a semiconductor device'20046,753,213'Laser processing method'20046,746,901'Semiconductor device and method of fabricating thereof'20046,744,008'Laser apparatus and laser annealing method'20046,744,069'Semiconductor device and its manufacturing method'20046,733,584'Method of forming crystalline silicon film'20046,730,550'Laser apparatus, laser annealing method, and manufacturing method of a semiconductor device'20046,730,932'Semiconductor device and method of manufacturing the same'20046,730,549'Semiconductor device and method for its preparation'20046,720,575'Semiconductor device with a semiconductor layer over a surface having a recess pitch no smaller than 0.3 microns'20046,700,133'Method for producing semiconductor device'20046,700,096'LASER APPARATUS, LASER IRRADIATION METHOD, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, PRODUCTION SYSTEM FOR SEMICONDUCTOR DEVICE USING THE LASER APPARATUS, AND ELECTRONIC EQUIPMENT'20046,693,299'Semiconductor device and method of manufacturing the same'20046,693,300'Semiconductor thin film and semiconductor device'20046,690,031'Semiconductor device and method of manufacturing the same'20046,677,611'Thin film circuit'20046,674,136'Semiconductor device having driver circuit and pixel section provided over same substrate'20046,664,144'Method of forming a semiconductor device using a group XV element for gettering by means of infrared light'20036,657,228'Semiconductor integrated circuit and fabrication method thereof'20036,653,657'Semiconductor device and a method of manufacturing the same'20036,635,929'Uniform thin film semiconductor device'2003RE038266'Method for fabricating semiconductor thin film'20036,630,687'Active matrix display device having wiring layers which are connected over multiple contact parts'20036,627,486'Method for manufacturing semiconductor and method for manufacturing semiconductor device'20036,624,445'Semiconductor device and method of manufacturing the same'20036,624,051'Semiconductor thin film and semiconductor device'20036,620,660'Active matrix type display device and method of manufacturing the same'20036,617,648'Projection TV'20036,613,614'Semiconductor device and method of manufacturing the semiconductor device'20036,608,325'Transistor and semiconductor device having columnar crystals'20036,608,324'Display device having thin film transistors'20036,605,497'Method of manufacturing semiconductor device over glass substrate having heat resistance'20036,599,788'Semiconductor device and method of fabricating the same'20036,590,230'Semiconductor device and manufacturing method thereof'20036,589,824'Process for fabricating semiconductor device'20036,576,504'Method of fabricating a liquid crystal display device having an improved storage capacitance'20036,558,993'Semiconductor device and method of manufacturing the same'20036,559,036'Semiconductor device and method of manufacturing the same'20036,555,875'EL display device with a TFT'20036,552,362'Semiconductor device and process for producing the same'20036,551,907'Metal-gettering method used in the manufacture of crystalline-Si TFT'20036,548,370'Method of crystallizing a semiconductor layer by applying laser irradiation that vary in energy to its top and bottom surfaces'20036,545,359'Wiring line and manufacture process thereof, and semiconductor device and manufacturing process thereof'20036,544,823'Method of manufacturing semiconductor device'20036,545,320'Electro-optical device and semiconductor device'20036,544,826'Method for producing semiconductor device'20036,541,795'Thin film semiconductor device and production method for the same'20036,542,205'Display device'20036,528,820'Semiconductor device and method of fabricating same'20036,528,358'Semiconductor device and method for fabricating the same'20036,524,896'Semiconductor device and method of fabricating the same'20036,524,877'Semiconductor device, and method of fabricating the same'20036,518,594'Semiconductor devices'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–2019Patents assigned to SEMICONDUCTOR ENERGY LAB (423)· patent assignee history
1993–2017Based in Kanagawa, JP· patent location history
1996–2012Based in Isehara, JP· patent location history
2003–2013Based in Atsugi, JP· patent location history
2004–2019Based in Tochigi, JP· patent location history
2012–2017Patents assigned to OHTANI HISASHI (42)· patent assignee history
2012–2017Patents assigned to YAMAZAKI SHUNPEI (25)· patent assignee history
2012–2014Patents assigned to KOYAMA JUN (8)· patent assignee history
2012–2014Patents assigned to OGATA YASUSHI (8)· patent assignee history
2014Based in Kawagawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SEMICONDUCTOR ENERGY LAB4231993–2019
OHTANI HISASHIself422012–2017
YAMAZAKI SHUNPEI252012–2017
KOYAMA JUN82012–2014
OGATA YASUSHI82012–2014
Locations
LocationPatentsSpan
Kanagawa, JP3041993–2017
Tochigi, JP742004–2019
Atsugi, JP412003–2013
Isehara, JP131996–2012
Kawagawa, JP12014