Inventor

Hongyong Zhang

Inventor
Kanagawa, JP

Overview

453→
Patents
1993–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 453 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices32%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein18%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
G09GArrangements or circuits for control of indicating devices using static means to present variable information6%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation4%
C23CCoating metallic material2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
H04NPictorial communication, e.g. television1%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution1%
PatentTitleYear
11,127,911Display panel and method of manufacturing thereof202111,024,221Pixel arrangement structure, metal mask, and display device202110,335,365Bladder cancer specific ligand peptides201910,100,083Leukemia stem cell targeting ligands and methods of use20189,539,340'Bladder cancer specific ligand peptides'20179,507,213'Electronic device having liquid crystal display device'20169,334,306'Leukemia stem cell targeting ligands and methods of use'20169,316,880'Liquid crystal display device'20168,946,379'Bladder cancer specific ligand peptides'20158,665,411'Liquid crystal display device having particular conductive layer'20148,665,409'Display device with sealing material'20148,643,820'Electronic device having liquid crystal display device'20148,586,985'Display device'20138,564,035'Image sensor and image sensor integrated type active matrix type display device'20138,542,339'Liquid crystal display device having particular conductive layer'20138,536,577'Display device'20138,334,964'Liquid crystal display panel'20128,319,715'Active matrix type liquid crystal display device'20128,283,788'Method of fabricating semiconductor device'20128,278,660'Semiconductor device and method for manufacturing the same'20128,273,613'Semiconductor device and method of manufacture thereof'20128,198,683'Semiconductor device including transistors with silicided impurity regions'20128,194,224'Liquid crystal display device having particular conductive layers'20128,154,136'Method of fabricating semiconductor device'20128,062,935'Semiconductor device and method for manufacturing the same'20118,031,307'Liquid crystal display apparatus containing image sensor and process for producing the same'20118,017,506'Semiconductor device and method for forming the same'20117,998,844'Method for manufacturing a semiconductor device'20117,990,514'Liquid crystal display panel'20117,985,635'Laser process'20117,956,978'Liquid-crystal display device having a particular conductive layer'20117,952,097'Semiconductor device and method of fabricating the same'20117,943,930'Semiconductor device forming method'20117,923,311'Electro-optical device and thin film transistor and method for forming the same'20117,868,984'Electro-optical device and method of manufacturing the same'20117,863,618'Display device'20117,859,621'Integral-type liquid crystal panel with image sensor function'20107,847,355'Semiconductor device including transistors with silicided impurity regions'20107,838,968'Semiconductor device and method of fabricating same'20107,821,011'Insulated gate field effect semiconductor devices and method of manufacturing the same'20107,817,232'Liquid crystal display apparatus containing image sensor and process for producing the same'20107,800,235'Method of fabricating semiconductor device'2010RE041690'Laser processing method'20107,791,117'Image sensor and image sensor integrated type active matrix type display device'20107,786,553'Method of fabricating semiconductor device'20107,781,271'Process for laser processing and apparatus for use in the same'20107,749,819'Method for manufacturing semiconductor device'20107,723,788'Semiconductor device and method for forming the same'20107,687,809'Method for producing a semiconductor integrated circuit including a thin film transistor and a capacitor'20107,683,978'Display device'20107,667,817'Liquid crystal display panel'20107,649,227'Semiconductor device and method of forming the same'20107,646,022'Display device'20107,635,895'Display device'20097,636,136'Liquid crystal display device and method for fabricating thereof'20097,622,335'Method for manufacturing a thin film transistor device'20097,602,020'Semiconductor device and method for forming the same'20097,569,856'Semiconductor device and method for manufacturing the same'20097,569,433'Semiconductor device and method of manufacturing the same'20097,564,057'Semiconductor device having an aluminum nitride film'20097,542,103'Electro-optical device'20097,528,912'Liquid crystal display apparatus containing image sensor and process for producing the same'20097,525,158'Semiconductor device having pixel electrode and peripheral circuit'20097,525,615'Integral-type liquid crystal panel with image sensor function and pixel electrode overlapping photoelectric conversion element'20097,517,738'Method for producing a semiconductor integrated circuit including a thin film transistor and a capacitor'20097,510,917'Active matrix display device and method of manufacturing the same'20097,507,991'Electro-optical device and thin film transistor and method for forming the same'20097,507,615'Method of manufacturing gate insulated field effect transistors'20097,504,288'Method for laser-processing semiconductor device'20097,474,376'Display device'20097,459,724'Active matrix display and electrooptical device'20087,456,427'Insulated gate field effect semiconductor devices and method of manufacturing the same'20087,435,635'Method for crystallizing semiconductor material'20087,425,999'Electro-optical device and manufacturing method thereof'20087,423,291'Semiconductor device and electronic device'20087,416,907'Semiconductor device and method for forming the same'20087,394,516'Liquid crystal display device having a particular conductive layer'20087,391,051'Semiconductor device forming method'20087,381,599'Semiconductor device and method for manufacturing the same'20087,371,619'Semiconductor device and method of manufacturing the same'20087,368,367'Method for forming a semiconductor'20087,355,202'Thin-film transistor'20087,352,003'Electro-optical device having thin film transistor with LDD region'20087,348,954'Liquid crystal display'20087,335,950'Semiconductor device and method of making thereof'20087,333,169'Electro-optical device and method of manufacturing the same'20087,333,160'Display device including resin film'20087,333,172'Liquid crystal display device having plurality of conductive layers between a substrate and sealing member and insulated by insulating film'20087,329,906'Semiconductor device and method for forming the same'20087,301,211'Method of forming an oxide film'20077,298,447'Liquid crystal display panel'20077,286,173'Image sensor and image sensor integrated type active matrix type display device'20077,265,811'Integral-type liquid crystal panel with image sensor function'20077,259,738'Liquid crystal display device'20077,235,828'Semiconductor device with residual nickel from crystallization of semiconductor film'20077,235,814'Active matrix display device and method of manufacturing the same'20077,215,402'Electronic device having liquid crystal display device'20077,206,053'Electro-optical device'20077,196,749'Liquid crystal display device and method for fabricating thereof'20077,190,420'Display device'20077,183,614'Semiconductor device and method of manufacture thereof'20077,176,495'Optical sensor'20077,169,657'Process for laser processing and apparatus for use in the same'20077,166,503'Method of manufacturing a TFT with laser irradiation'20077,160,792'Laser processing method'20077,158,199'Liquid crystal display apparatus containing image sensor and process for producing the same'20077,148,506'Active matrix display and electrooptical device'20067,148,094'Semiconductor device and method for its preparation'20067,148,542'Semiconductor device and method of forming the same'20067,145,613'Electronic device and method for fabricating the same'20067,142,273'Liquid crystal display panel with a laminating structure containing a semiconductor layer located under the seal'20067,109,108'Method for manufacturing semiconductor device having metal silicide'20067,110,059'Display device'20067,102,164'Semiconductor device having a conductive layer with a light shielding part'20067,095,478'Liquid crystal display device and method for fabricating thereof'20067,071,912'Display panel drive circuit and display panel'20067,057,677'Electro-optical device and manufacturing method thereof'20067,056,775'Semiconductor device and process for fabricating the same'20067,046,282'Image sensor and image sensor integrated type active matrix type display device'20067,046,313'Semiconductor device including a source line formed on interlayer insulating film having flattened surface'20067,042,548'Image sensor having thin film transistor and photoelectric conversion element'20067,026,200'Method for manufacturing a semiconductor device'20067,023,502'Semiconductor device having light-shielded thin film transistor'20067,019,385'Semiconductor device and method of fabricating same'20067,018,874'Method for fabricating thin-film transistor'20067,006,064'Liquid crystal display'20066,997,985'Semiconductor, semiconductor device, and method for fabricating the same'20066,998,639'Method for manufacturing a semiconductor device'20066,991,975'Laser process'20066,989,811'Liquid crystal display device and driving circuit thereof'20066,987,283'Semiconductor device structure'20066,982,768'Liquid crystal display device'20066,977,392'Semiconductor display device'20056,974,763'Method of forming semiconductor device by crystallizing amorphous silicon and forming crystallization promoting material in the same chamber'20056,964,890'Semiconductor device and method for forming the same'20056,960,812'Method of forming an oxide film'20056,939,749'Method of manufacturing a semiconductor device that includes heating the gate insulating film'20056,937,306'Liquid crystal display apparatus containing image sensor and process for producing the same'20056,924,506'Semiconductor device having channel formation region comprising silicon and containing a group IV element'20056,924,213'Semiconductor device and process for fabricating the same'20056,919,239'Method for forming a semiconductor device'20056,919,933'Display device and method of manufacturing the same'20056,914,260'Electro-optical device'20056,906,383'Semiconductor device and method of manufacture thereof'20056,884,698'Method for manufacturing semiconductor device with crystallization of amorphous silicon'20056,881,615'Method for crystallizing semiconductor material without exposing it to air'20056,875,628'Semiconductor device and fabrication method of the same'20056,872,978'CMOS-type thin film semiconductor device and method of fabricating the same'20056,867,431'Semiconductor device and method for manufacturing the same'20056,864,950'Electronic device with active matrix type display panel and image sensor function'20056,853,364'Liquid crystal display device'20056,847,422'Liquid crystal display device and method of manufacturing the same'20056,847,064'Semiconductor device having a thin film transistor'20056,842,214'Liquid crystal display device and method of manufacturing the same'20056,831,333'Semiconductor device and method of making thereof'20046,815,271'Semiconductor display devices and applications'20046,806,862'Liquid crystal display device'20046,806,125'Method of manufacturing a thin film transistor device'20046,803,261'Photoelectric converter and fabrication method thereof'20046,803,600'Insulated gate field effect semiconductor devices and method of manufacturing the same'20046,800,873'Semiconductor device and electronic device'20046,797,548'Electro-optical device and thin film transistor and method for forming the same'20046,790,749'Method of manufacturing a semiconductor device'20046,787,808'Optical sensor'20046,784,411'Display device with a pixel matrix and a sensor over same substrate'20046,777,711'Semiconductor display device'20046,777,763'Semiconductor device and method for fabricating the same'20046,773,971'Method of manufacturing a semiconductor device having lightly-doped drain (LDD) regions'20046,770,143'Method for annealing a semiconductor'20046,765,229'Method for producing semiconductor device'20046,762,813'Electro-optical device and method of manufacturing the same'20046,757,032'Electronic device and method for fabricating the same'20046,756,258'Method of manufacturing a semiconductor device'20046,756,657'Method of preparing a semiconductor having controlled crystal orientation'20046,740,547'Method for fabricating thin-film transistor'20046,737,674'Semiconductor device and fabrication method thereof'20046,730,549'Semiconductor device and method for its preparation'20046,723,590'Method for laser-processing semiconductor device'20046,713,330'Method of fabricating a thin film transistor'20046,709,907'Method of fabricating a thin film transistor'20046,709,906'Method for producing semiconductor device'20046,696,326'Cleaning method to prevent watermarks'20046,689,651'Laser processing method'20046,680,764'Liquid crystal display apparatus containing image sensor and process for producing the same'20046,660,575'Method for forming a semiconductor device'20036,655,767'Active matrix display device'20036,646,693'Manufacturing method for an active matrix display including a capacitor formed from a short ring electrode'20036,642,073'Semiconductor circuit and method of fabricating the same'20036,639,634'Repairable LCD and its manufacture'20036,635,521'CMOS-type semiconductor device and method of fabricating the same'20036,633,359'Liquid crystal display having signal lines on substrate intermittently extending and its manufacture'20036,627,487'Semiconductor device and manufacturing method thereof'20036,624,450'Semiconductor device and method for forming the same'20036,624,477'Semiconductor device and method for manufacturing the same'20036,617,612'Semiconductor device and a semiconductor integrated circuit'20036,614,052'Semiconductor display devices and applications'20036,610,142'Process for fabricating semiconductor and process for fabricating semiconductor device'20036,608,325'Transistor and semiconductor device having columnar crystals'20036,607,947'Method of manufacturing a semiconductor device with fluorinated layer for blocking alkali ions'20036,603,160'MOS capacitor, liquid crystal display, integrated circuit and method of manufacture thereof'20036,603,455'Display panel drive circuit and display panel'20036,586,346'Method of forming an oxide film'20036,577,372'Electronic device having liquid crystal display device'20036,573,589'Semiconductor device and process for fabricating the same'20036,566,711'Semiconductor device having interlayer insulating film'20036,566,175'Method of manufacturing gate insulated field effect transistors'20036,562,672'Semiconductor material and method for forming the same and thin film transistor'20036,541,313'Transistor and process for fabricating the same'20036,538,708'Liquid crystal display with static discharge circuit'20036,528,360'Semiconductor device and process for manufacturing the same, and electronic device'2003RE037993'Laser processing method'20036,509,212'Method for laser-processing semiconductor device'20036,507,069'Semiconductor device and method of manufacture thereof'20036,501,097'Electro-optical device'20026,498,060'Semiconductor device and method for making same'20026,496,240'Liquid crystal display apparatus containing image sensor and process for producing the same'20026,494,162'Method for annealing a semiconductor'20026,495,858'Active matrix display device having thin film transistors'20026,486,495'Method for manufacturing a semiconductor device'20026,476,447'Active matrix display device including a transistor'20026,475,837'Electro-optical device'20026,475,839'Manufacturing of TFT device by backside laser irradiation'20026,462,806'Electronic device having an active matrix display panel'20026,459,124'Semiconductor device and process for manufacturing the same, and electronic device'20026,458,200'Method for fabricating thin-film transistor'20026,455,401'METHODOLOGY FOR PRODUCING THIN FILM SEMICONDUCTOR DEVICES BY CRYSTALLIZING AN AMORPHOUS FILM WITH CRYSTALLIZATION PROMOTING MATERIAL, PATTERNING THE CRYSTALLIZED FILM, AND THEN INCREASING THE CRYSTALLINITY WITH AN IRRADIATION'20026,455,875'Thin film transistor having enhanced field mobility'20026,451,638'Semiconductor and process for fabricating the same'20026,448,577'Semiconductor device with grain boundaries'20026,440,785'Method of manufacturing a semiconductor device utilizing a laser annealing process'20026,433,361'Semiconductor integrated circuit and method for forming the same'20026,429,843'Electro-optical device'20026,423,586'Method for crystallizing semiconductor material without exposing it to air'20026,423,569'Photoelectric converter and fabrication method thereof'20026,421,101'Display device including a transparent electrode pattern covering and extending along gate & source lines'20026,413,805'Semiconductor device forming method'20026,413,842'Semiconductor device and method of fabricating the same'20026,411,351'Active matrix type display device comprising a discharge pattern or a short ring and method of manufacturing the same'20026,404,479'ACTIVE MATRIX LCD COMPRISING A SEALING LAYER WITH A REGION OVERLAPPING AN INSULATING FILM FORMED OVER ANOTHER INSULATING FILM, AND A REGION WHERE SAID INSULATING FILM IS NOT FORMED OVER SAID ANOTHER INSULATING FILM'20026,399,933'Active matrix display device and method of manufacturing the same'20026,396,470'Liquid crystal display apparatus'20026,391,694'Manufacturing method of semiconductor integrated circuit'20026,388,291'Semiconductor integrated circuit and method for forming the same'20026,383,852'Semiconductor device and fabrication method thereof'20026,380,562'Liquid crystal electro-optical device'20026,365,935'TFT having hydrogen containing buffer and substrate regions'20026,358,784'Process for laser processing and apparatus for use in the same'20026,338,991'Semiconductor device and method for manufacturing the same'20026,337,231'Method for producing semiconductor device'20026,335,213'Electro-optical device and thin film transistor and method for forming the same'20026,335,541'Semiconductor thin film transistor with crystal orientation'20026,335,540'Semiconductor device and process for fabricating the same'20026,331,723'Active matrix display device having at least two transistors having LDD region in one pixel'20016,323,071'Method for forming a semiconductor device'20016,323,932'Liquid crystal display device and method for fabricating thereof'20016,320,636'TFT-LCD having pixel electrode overlapping scan and data lines except at the intersection of lines'20016,320,224'Method for producing a semiconductor integrated circuit including a thin film transistor and a capacitor'20016,319,761'Method of fabricating a thin film transistor'20016,300,176'Laser processing method'20016,300,659'Thin-film transistor and fabrication method for same'20016,297,518'Active matrix display and electrooptical device'20016,288,764'Display device or electronic device having liquid crystal display panel'20016,288,388'Photoelectric converter wherein the lower electrode has bends'20016,285,042'Active Matry Display'20016,274,861'Active matrix display device having a common substrate and method of manufacturing the same'20016,271,066'Semiconductor material and method for forming the same and thin film transistor'20016,261,877'Method of manufacturing gate insulated field effect transistors'20016,261,875'Transistor and process for fabricating the same'20016,259,120'Semiconductor device and method for fabricating the same'20016,259,117'Active matrix display having storage capacitor associated with each pixel transistor'20016,255,705'Producing devices having both active matrix display circuits and peripheral circuits on a same substrate'20016,249,333'Liquid crystal display panel'20016,246,453'Electro-optical device'20016,243,155'Electronic display device having an active matrix display panel'20016,239,850'Liquid crystal electro-optical device and process of fabricating same provided with discharge accelerating patterns for minimizing dielectric breakdown'20016,235,122'Cleaning method and cleaning apparatus of silicon'20016,232,621'Semiconductor device and method of fabricating the same'20016,225,645'Semiconductor device and method of manufacturing the same'20016,222,595'TFT-LCD having pixel electrode overlapping scan and data lines except at the intersection of lines'20016,219,118'LCD with shield film formed at overlapping portion of bus lines and pixel electrode'20016,218,678'Semiconductor device'20016,211,536'Semiconductor device having improved crystal orientation'20016,204,154'Semiconductor device and fabrication method thereof'20016,198,517'Liquid crystal display device'20016,194,740'Optical sensor'20016,180,982'Semiconductor device and method of making thereof'20016,181,389'TFT LCD device with gate/data lines in interrupting patterns'20016,177,302'Method of manufacturing a thin film transistor using multiple sputtering chambers'20016,174,757'Method for producing semiconductor device'20016,174,374'Method for annealing a semiconductor'20016,175,348'Electro-optical device'20016,172,671'Active matrix type display device and fabrication method of the same'20016,168,980'Semiconductor device and method for forming the same'20016,166,397'Display device with inverted type transistors in the peripheral and pixel portions'20006,166,399'Active matrix device including thin film transistors'20006,160,279'Method for producing a semiconductor device including doping with a catalyst that is a group IV element'20006,159,777'Method of forming a TFT semiconductor device'20006,156,627'Method of promoting crystallization of an amorphous semiconductor film using organic metal CVD'20006,147,375'Active matrix display device'20006,143,661'Method of processing semiconductor device with laser'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–2016Patents assigned to SEMICONDUCTOR ENERGY LAB (416)· patent assignee history
1993–2014Based in Kanagawa, JP· patent location history
1994–2016Patents assigned to ZHANG HONGYONG (17)· patent assignee history
1996–2008Patents assigned to SHARP KK (14)· patent assignee history
1997–2016Based in Yamato, JP· patent location history
2002–2008Based in Kawasaki, JP· patent location history
2003–2006Patents assigned to FUJITSU DISPLAY TECH (12)· patent assignee history
2004–2016Based in Atsugi, JP· patent location history
2012–2014Patents assigned to TERAMOTO SATOSHI (5)· patent assignee history
2015–2019Based in Davis, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SEMICONDUCTOR ENERGY LAB4161993–2016
ZHANG HONGYONGself171994–2016
SHARP KK141996–2008
FUJITSU DISPLAY TECH122003–2006
TERAMOTO SATOSHI52012–2014
Locations
LocationPatentsSpan
Kanagawa, JP3621993–2014
Yamato, JP471997–2016
Atsugi, JP162004–2016
Kawasaki, JP162002–2008
Davis, California, US52015–2019