Inventor
Cheng-Hsiung Matthew TSAI
Inventor
US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H01LSemiconductor devices15%
LOC1515%
C23CCoating metallic material8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
LOC148%
PatentTitleYear
D1071886Substrate support for a substrate processing chamber202512,014,906High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) for PVD chamber202411,939,666Methods and apparatus for precleaning and treating wafer surfaces202411,887,878Detachable biasable electrostatic chuck for high temperature applications2024D0960216Base plate for a processing chamber substrate support2022D0947914Base plate for a processing chamber substrate support2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to APPLIED MATERIALS INC (6)· patent assignee history
2022–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 6 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 6 | 2022–2025 |