Substrate support for a substrate processing chamber
Granted 22 Apr 2025 · no office action yet
Current assignee: Applied Materials Israel · originally Applied Materials, Inc.
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Inventors: Cheng-Hsiung Matthew Tsai, Jiang Lu, Zubin Huang, Michael Sterling Jackson +2 · Examiner: Brett Miller · AU 2925 · TC 2900
Life of the patent
4 dated eventsDescription
1 parts›FIG. 1 is a top isometric view of…
FIG. 1 is a top isometric view of a substrate support for a substrate processing chamber, showing our new design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a front elevation view thereof.
FIG. 5 is a back elevation view thereof.
FIG. 6 is a left elevation view thereof.
FIG. 7 is a right elevation view thereof; and,
FIG. 8 is an enlarged cross-sectional view taken along line 8 - 8 in FIG. 2 .
The dashed lines in FIGS. 1 - 8 illustrate portions of the article that form no part of the claimed design.
Claims
1 · 1 independent · depth 1Classifications
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5 members · 3 offices›IP5 & PCT — 3 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| USthis patent | US-D1071886-S | S1 | 22 Apr 2025 | 20 Jan 2022 | granted | Substrate support for a substrate processing chamber |
| JP | JP-1733479-S | S | 28 Dec 2022 | 4 Jul 2022 | granted | 基板処理チャンバ用基板支持体ja |
| JP | JP-1733480-S | S | 28 Dec 2022 | 4 Jul 2022 | granted | 基板処理チャンバ用基板支持体ja |
›Other offices — 2 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| TW | TW-D227251-S | S | 1 Sep 2023 | 5 Jul 2022 | published | 基板處理腔室用的基板支撐件zh |
| TW | TW-D227252-S | S | 1 Sep 2023 | 5 Jul 2022 | published | 基板處理腔室用的基板支撐件zh |
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