Inventor
Shinichi Kanna
Inventor
Shizuoka, JP
Overview
Patents· 87 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices32%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests16%
G02BOptical elements, systems or apparatus6%
C09BOrganic dyes or closely-related compounds for producing dyes, e.g. pigments5%
G06FElectric digital data processing4%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form4%
C07DHeterocyclic compounds4%
C09DCoating compositions, e.g. paints, varnishes or lacquers3%
Y10TTechnical subjects covered by former us classification3%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein3%
PatentTitleYear
10,795,515Transfer film, electrode protective film for electrostatic capacitance-type input device, laminate, method for manufacturing laminate, and electrostatic capacitance-type input device202010,688,763Decorative film and decorative molded body202010,507,630Transfer film, transparent laminate, method for producing transfer film, method for producing transparent laminate, capacitive input device, and image display device201910,471,689Transfer film, transparent laminate, method for producing transfer film, method for producing transparent laminate, capacitive input device, and image display device201910,336,043Transfer film, transparent laminate, method for producing transparent laminate, capacitive input device, and image display device201910,207,481Transfer film, method for manufacturing laminate, laminate, electrostatic capacitance-type input device, and image display device201910,209,839Method for producing laminated material, laminated material, method for producing transparent laminate, transparent laminate, capacitance-type input device, and image display device201910,192,651Transfer material, method of manufacturing transfer material, laminated body, method of manufacturing laminated body, method of manufacturing capacitance-type input device, and method of manufacturing image display device201910,157,695Transfer material, method of manufacturing transfer material, laminated body, method of manufacturing laminated body, method of manufacturing capacitance-type input device, and method of manufacturing image display device201810,031,631Transfer film, method for producing transfer film, transparent laminate, method for producing transparent laminate, capacitance-type input device, and image display device20189,835,945Positive resist composition and method of pattern formation with the same20179,710,117'Transfer material, manufacturing method of electrostatic capacitance type input device, electrostatic capacitance type input device, and image display device including the same'20179,709,891'Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition'20179,632,640'Transparent laminate, capacitance type input device, and image display device'20179,632,639'Transparent laminate, capacitance type input device, and image display device'20179,541,831'Positive resist composition and method of pattern formation with the same'20179,465,298'Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method'20169,389,347'Colored composition, inkjet ink, color filter and method of producing the same, solid-state image sensor and display device'20169,354,514'Photosensitive transparent composition for color filter of solid-state imaging device, and production method of color filter of solid-state imaging device, color filter of solid-state imaging device, and solid-state imaging device, each using the same'20169,291,904'Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method'20169,250,530'Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method'20169,116,426'Dye compound, method of producing dipyrromethene metal complex compound, method of producing dye multimer, substituted pyrrole compound, colored curable composition, color filter, method of producing color filter, solid-state image sensor and liquid crystal display device'20159,081,279'Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition'20159,057,952'Positive resist composition and method of pattern formation with the same'20159,023,576'Positive resist composition for immersion exposure and pattern-forming method using the same'20158,968,973'Color filter and production method thereof, and solid-state image sensor using the same'20158,951,718'Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method'20158,908,293'Dispersion composition, photosensitive resin composition, and solid-state image pick-up element'20148,900,789'Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition'20148,883,378'Colored curable composition, color filter and method of producing color filter, solid-state image sensor and liquid crystal display device'20148,877,421'Positive resist composition and pattern-forming method'20148,815,478'Colored curable composition, resist liquid, ink for inkjet printing, color filter, method of producing color filter, solid-state image sensor, liquid crystal display, organic EL display, image display device and colorant compound'20148,778,235'Colorant multimer, colored curable composition, color filter and method for producing the same, and solid-state image sensor, image display device, liquid crystal display device and organic EL display with the color filter'20148,741,508'Colored curable composition, color resist, ink-jet ink, color filter and method for producing the same, solid-state image pickup device, image display device, liquid crystal display, organic el display, and colorant compound and tautomer thereof'20148,728,688'Colored curable composition, color filter and method of producing the same, and dipyrromethene metal complex compound and tautomer thereof'20148,697,329'Positive resist composition and pattern forming method using the same'20148,679,724'Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition'20148,637,229'Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method'20148,637,215'Colored curable composition, color filter and method of producing color filter, solid-state image sensor and liquid crystal display device'20148,618,217'Topcoat composition, alkali developer-soluble topcoat film using the composition and pattern forming method using the same'20138,603,708'Dye-containing negative curable composition, color filter using same, method of producing color filter, and solid-state imaging device'20138,529,803'Curable coloring composition, color filter and method for producing same, and quinophthalone dye'20138,530,148'Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method'20138,507,193'Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method'20138,507,194'Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method'20138,389,200'Pattern forming method'20138,354,208'Colored curable composition, method for producing color filter, color filter, solid-state image pickup device, and liquid crystal display device'20138,343,708'Positive resist composition and pattern forming method'20138,338,062'Colored curable composition, method for producing color filter, color filter, solid-state image pickup device, and liquid crystal display device'20128,334,085'Colored curable composition, color filter and method of producing the same, and dipyrromethene metal complex compound and tautomer thereof'20128,227,183'Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method'20128,062,826'Positive resist composition and pattern-forming method'20118,034,537'Positive resist composition and pattern forming method'20117,906,268'Positive resist composition for immersion exposure and pattern-forming method using the same'20117,892,722'Pattern forming method'20117,842,452'Pattern forming method'20107,790,351'Positive resist composition and pattern making method using the same'20107,771,912'Positive resist composition and pattern forming method using the same'20107,700,260'Pattern forming method'20107,674,567'Positive resist composition and pattern forming method using the same'20107,666,574'Positive resist composition and pattern forming method'20107,635,554'Positive resist composition and pattern forming method'20097,611,820'Positive resist composition and pattern-forming method using the same'20097,504,194'Positive resist composition and pattern making method using the same'20097,482,112'Pattern forming method'20097,368,220'Positive resist composition and pattern forming method using the same'20087,335,454'Positive resist composition'20087,214,467'Photosensitive resin composition'20077,202,015'Positive photoresist composition and pattern making method using the same'20077,198,880'Positive resist composition'20077,195,856'Positive resist composition and pattern formation method using the same'20077,163,776'Positive-working resist composition'20077,160,666'Photosensitive resin composition'20077,138,217'Positive resist composition'20067,108,951'Photosensitive resin composition'20066,939,662'Positive-working resist composition'20056,878,502'Positive resist composition'20056,852,467'Positive resist composition'20056,830,871'Chemical amplification type resist composition'20046,811,947'Positive resist composition'20046,806,023'Positive radiation-sensitive composition'20046,756,179'Positive resist composition'20046,743,565'Positive resist composition with (bis-tri fluoromethyl) methyl substituted styrene'20046,727,036'Positive-working radiation-sensitive composition'20046,605,409'Positive resist composition'20036,485,883'Positive photoresist composition'20026,376,152'Positive photoresist composition'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2007Patents assigned to FUJI PHOTO FILM CO LTD (17)· patent assignee history
2002–2020Based in Shizuoka, JP· patent location history
2007–2020Patents assigned to FUJIFILM CORP (65)· patent assignee history
2010–2014Based in Haibara-gun, JP· patent location history
2011–2016Patents assigned to KANNA SHINICHI (27)· patent assignee history
2012–2016Patents assigned to FUJIE YOSHIHIKO (7)· patent assignee history
2012–2014Patents assigned to ITO JUNICHI (7)· patent assignee history
2014Based in Kanagawa, JP· patent location history
2017–2020Based in Fujinomiya, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIFILM CORP | 65 | 2007–2020 |
| KANNA SHINICHIself | 27 | 2011–2016 |
| FUJI PHOTO FILM CO LTD | 17 | 2002–2007 |
| FUJIE YOSHIHIKO | 7 | 2012–2016 |
| ITO JUNICHI | 7 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shizuoka, JP | 68 | 2002–2020 |
| Fujinomiya, JP | 10 | 2017–2020 |
| Haibara-gun, JP | 8 | 2010–2014 |
| Kanagawa, JP | 1 | 2014 |