A lithographic projection apparatus comprising:na substrate table configured to support a substrate on a substrate supporting area;an inlet for a liquid in the substrate table, the inlet surrounding the substrate supporting area;a plurality of heaters positioned adjacent to an edge of the inlet, at least two of the plurality of heaters positioned in a non-parallel way to each other, positioned respectively adjacent different portions of an edge of the substrate supporting area and being independently controllable of one another;a liquid handling system configured to provide the liquid to a localized area of a top surface of the substrate table and/or the substrate; anda projection system to project a radiation beam through the liquid in the localized area onto the substrate.
›2.↳ 1The lithographic apparatus of claim 1, wherein the plurality of heaters are positioned such that as a group they extend substantially around an edge o…d2
The lithographic apparatus of claim 1, wherein the plurality of heaters are positioned such that as a group they extend substantially around an edge of the substrate supporting area.
›3.↳ 1The lithographic apparatus of claim 1, wherein the at least two of the plurality of heaters are, in plan, curved.d2
The lithographic apparatus of claim 1, wherein the at least two of the plurality of heaters are, in plan, curved.
›4.↳ 1The lithographic apparatus of claim 1, wherein at least two of the plurality of heaters are positioned along different segments of the edge of the sub…d2+3
The lithographic apparatus of claim 1, wherein at least two of the plurality of heaters are positioned along different segments of the edge of the substrate supporting area.
›5.↳ 4The lithographic apparatus of claim 4, wherein the different segments are at least three segments.d3
The lithographic apparatus of claim 4, wherein the different segments are at least three segments.
›6.↳ 4The lithographic apparatus of claim 4, wherein at least one of the segments has a length of three times or less than the width of the localized area.d3
The lithographic apparatus of claim 4, wherein at least one of the segments has a length of three times or less than the width of the localized area.
›7.↳ 4The lithographic apparatus of claim 4, further comprising a plurality of temperature sensors, each of the segments being associated with at least one …d3
The lithographic apparatus of claim 4, further comprising a plurality of temperature sensors, each of the segments being associated with at least one of the plurality of temperature sensors.
›8.↳ 1The lithographic apparatus of claim 1, further comprising a plurality of temperature sensors in the substrate table, wherein at least one of the plura…d2
The lithographic apparatus of claim 1, further comprising a plurality of temperature sensors in the substrate table, wherein at least one of the plurality of temperature sensors is embedded in material of the substrate table.
›9.↳ 1The lithographic apparatus of claim 1, further comprising a plurality of temperature sensors in the substrate table, wherein at least one of the plura…d2
The lithographic apparatus of claim 1, further comprising a plurality of temperature sensors in the substrate table, wherein at least one of the plurality of temperature sensors is associated with each of the plurality of heaters.
›10.↳ 1The lithographic apparatus of claim 1, wherein the plurality of heaters are positioned radially outwardly of the inlet.d2
The lithographic apparatus of claim 1, wherein the plurality of heaters are positioned radially outwardly of the inlet.
›11.↳ 1The lithographic apparatus of claim 1, further comprising a temperature sensor, the temperature sensor being positioned within 5 mm of the inlet and/o…d2
The lithographic apparatus of claim 1, further comprising a temperature sensor, the temperature sensor being positioned within 5 mm of the inlet and/or any passage or chamber in fluid communication with the inlet.
›12.↳ 1The lithographic apparatus of claim 1, wherein the plurality of heaters comprise both heaters extending in the vertical direction and heaters extendin…d2
The lithographic apparatus of claim 1, wherein the plurality of heaters comprise both heaters extending in the vertical direction and heaters extending in the horizontal direction.
›13.↳ 1The lithographic apparatus of claim 1, further comprising a controller configured to control power provided to the plurality of heaters based on feedb…d2
The lithographic apparatus of claim 1, further comprising a controller configured to control power provided to the plurality of heaters based on feedback based on a temperature measured by a temperature sensor.
›14.↳ 1The lithographic apparatus of claim 1, further comprising a controller configured to control power provided to the plurality of heaters based on feedf…d2
The lithographic apparatus of claim 1, further comprising a controller configured to control power provided to the plurality of heaters based on feedforward control.
›15.↳ 1The lithographic apparatus of claim 1, further comprising a further heater configured to heat a central section of the substrate supporting area.d2+1
The lithographic apparatus of claim 1, further comprising a further heater configured to heat a central section of the substrate supporting area.
›16.↳ 15The lithographic apparatus of claim 15, wherein the further heater comprises a channel for the flow therethrough of a heat transfer fluid.d3
The lithographic apparatus of claim 15, wherein the further heater comprises a channel for the flow therethrough of a heat transfer fluid.
