Inventor
Wouterus Johannes Petrus Maria Maas
Inventor
Boxtel, NL
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
8,564,763'Lithographic apparatus and method'20138,462,314'Lithographic apparatus and device manufacturing method'20138,416,395'Lithographic apparatus and method'20137,595,496'Optimized correction of wafer thermal deformations in a lithographic process'20097,250,237'Optimized correction of wafer thermal deformations in a lithographic process'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2013Patents assigned to ASML NETHERLANDS BV (4)· patent assignee history
2007–2013Based in Boxtel, NL· patent location history
2013Patents assigned to MAAS WOUTERUS JOHANNES PETRUS MARIA (2)· patent assignee history
2013Patents assigned to BECKERS MARCEL (1)· patent assignee history
2013Patents assigned to BRUIJSTENS JEROEN PETER JOHANNES (1)· patent assignee history
2013Patents assigned to JACOBS JOHANNES HENRICUS WILHELMUS (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 4 | 2007–2013 |
| MAAS WOUTERUS JOHANNES PETRUS MARIAself | 2 | 2013 |
| BECKERS MARCEL | 1 | 2013 |
| BRUIJSTENS JEROEN PETER JOHANNES | 1 | 2013 |
| JACOBS JOHANNES HENRICUS WILHELMUS | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Boxtel, NL | 5 | 2007–2013 |