LexDanaLexDanabeta
Inventor

Joost Jeroen Ottens

Inventor
Veldhoven, NL

Overview

112→
Patents
2005–2021
Patent span
Physics
Primary field (CPC G)

Patents· 112 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices59%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them4%
B01DSeparation2%
Y10TTechnical subjects covered by former us classification2%
H01LSemiconductor devices1%
A62CFire-fighting1%
B05BSpraying apparatus1%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form1%
B82YSpecific uses or applications of nanostructures1%
PatentTitleYear
10,996,570Metrology method, patterning device, apparatus and computer program202110,866,501Lithographic apparatus and device manufacturing method202010,838,310Lithographic apparatus and device manufacturing method involving a heater202010,768,536Lithographic apparatus and device manufacturing method202010,761,433Lithographic apparatus and device manufacturing method202010,705,439Lithographic apparatus and device manufacturing method202010,678,139Lithographic apparatus and device manufacturing method202010,649,346Substrate table, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus202010,551,752Lithographic apparatus and method202010,254,663Lithographic apparatus and device manufacturing method involving a heater201910,222,711Lithographic apparatus and device manufacturing method201910,203,612Substrate table, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus201910,180,629Lithographic apparatus and device manufacturing method201910,126,664Lithographic apparatus and device manufacturing method201810,018,925Lithographic apparatus, drying device, metrology apparatus and device manufacturing method20189,904,185'Lithographic apparatus and device manufacturing method'20189,851,644Lithographic apparatus and device manufacturing method20179,696,638'Lithographic apparatus'20179,632,435'Lithographic apparatus and method'20179,618,853'Lithographic apparatus and device manufacturing method'20179,606,429'Lithographic apparatus, drying device, metrology apparatus and device manufacturing method'20179,581,916'Lithographic apparatus and device manufacturing method'20179,541,843'Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid'20179,507,278'Lithographic apparatus and device manufacturing method'20169,488,919'Substrate table, a lithographic apparatus and a method involving an encoder plate'20169,436,096'Lithographic apparatus and device manufacturing method'20169,268,242'Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor'20169,268,236'Lithographic apparatus and device manufacturing method having heat pipe with fluid to cool substrate and/or substrate holder'20169,235,113'Lithographic apparatus and device manufacturing method'20169,229,340'Lithographic apparatus'20169,188,880'Lithographic apparatus and device manufacturing method involving a heater'20159,188,882'Lithographic apparatus and device manufacturing method'20159,152,058'Lithographic apparatus and device manufacturing method involving a member and a fluid opening'20159,140,996'Lithographic apparatus and device manufacturing method'20159,097,992'Lithographic apparatus and device manufacturing method'20159,081,299'Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap'20159,052,613'Displacement device, lithographic apparatus and positioning method'20159,052,612'Support structure, lithographic apparatus and method'20159,013,682'Clamping device and object loading method'20158,994,917'Temperature stabilization system to stabilize a temperature of an article'20158,953,142'Lithographic apparatus, drying device, metrology apparatus and device manufacturing method'20158,947,631'Lithographic apparatus and device manufacturing method'20158,941,810'Lithographic apparatus and device manufacturing method'20158,913,228'Lithographic apparatus and device manufacturing method'20148,902,399'Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus'20148,786,823'Lithographic apparatus and device manufacturing method'20148,743,339'Lithographic apparatus and device manufacturing method'20148,705,009'Heat pipe, lithographic apparatus and device manufacturing method'20148,570,492'Lithographic apparatus'20138,564,763'Lithographic apparatus and method'20138,514,365'Lithographic apparatus and device manufacturing method'20138,482,845'Lithographic apparatus and device manufacturing method'20138,476,167'Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus'20138,446,563'Lithographic apparatus and device manufacturing method'20138,421,996'Lithographic apparatus'20138,416,395'Lithographic apparatus and method'20138,384,881'Lithographic apparatus, stage apparatus and device manufacturing method'20138,269,949'Lithographic apparatus and device manufacturing method'20128,232,540'Lithographic apparatus and substrate edge seal'20128,154,708'Lithographic apparatus and device manufacturing method'20128,027,019'Lithographic apparatus and device manufacturing method'20118,003,968'Lithographic apparatus and substrate edge seal'20117,978,306'Lithographic apparatus and device manufacturing method'20117,864,292'Lithographic apparatus and device manufacturing method'20117,804,577'Lithographic apparatus'20107,804,575'Lithographic apparatus and device manufacturing method having liquid evaporation control'20107,804,582'Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method'20107,791,709'Substrate support and lithographic process'20107,751,027'Lithographic apparatus and device manufacturing method'20107,746,447'Lithographic apparatus, device manufacturing method and method of calibrating a lithographic apparatus'20107,656,501'Lithographic apparatus'20107,639,345'Lithographic apparatus'20097,630,060'Device manufacturing method, lithographic apparatus and device manufactured thereby'20097,602,470'Lithographic apparatus and device manufacturing method'20097,595,496'Optimized correction of wafer thermal deformations in a lithographic process'20097,593,096'Lithographic apparatus and device manufacturing method'20097,564,536'Lithographic apparatus and device manufacturing method'20097,532,310'Apparatus, method for supporting and/or thermally conditioning a substrate, a support table, and a chuck'20097,528,935'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20097,453,063'Calibration substrate and method for calibrating a lithographic apparatus'20087,420,194'Lithographic apparatus and substrate edge seal'20087,411,657'Lithographic apparatus and device manufacturing method'20087,385,670'Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus'20087,327,439'Lithographic apparatus and device manufacturing method'20087,327,438'Lithographic apparatus and method of a manufacturing device'20087,307,696'Lithographic apparatus and device manufacturing method'20077,304,715'Lithographic apparatus and device manufacturing method'20077,250,237'Optimized correction of wafer thermal deformations in a lithographic process'20077,245,357'Lithographic apparatus and device manufacturing method'20077,239,368'Using unflatness information of the substrate table or mask table for decreasing overlay'20077,227,619'Lithographic apparatus and device manufacturing method'20077,224,438'Method of manufacturing a device, device manufactured thereby, computer program and lithographic apparatus'20077,213,963'Lithographic apparatus and device manufacturing method'20077,196,768'Lithographic apparatus and device manufacturing method'20077,187,433'Electrostatic clamp assembly for a lithographic apparatus'20077,161,662'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20077,133,120'Lithographic apparatus, article support member, and method'20067,119,884'Lithographic apparatus and device manufacturing method'20067,119,885'Lithographic apparatus and device manufacturing method'20067,110,091'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20067,110,085'Lithographic apparatus, substrate holder and method of manufacturing'20067,105,836'Method and apparatus for cooling a reticle during lithographic exposure'20067,106,416'Lithographic apparatus and device manufacturing method'20067,092,231'Chuck, lithographic apparatus and device manufacturing method'20067,088,431'Lithographic apparatus and device manufacturing method'20067,064,808'Substrate carrier and method for making a substrate carrier'20067,041,989'Lithographic apparatus and device manufacturing method'20067,030,967'Lithographic apparatus, device manufacturing method and substrate holder'20067,027,132'Lithographic apparatus and device manufacturing method'20067,019,820'Lithographic apparatus and device manufacturing method'20067,019,816'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20066,897,945'Lithographic apparatus and device manufacturing method'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2021Patents assigned to ASML NETHERLANDS BV (109)· patent assignee history
2005–2021Based in Veldhoven, NL· patent location history
2006Based in Vedlhoven, NL· patent location history
2012–2020Patents assigned to OTTENS JOOST JEROEN (36)· patent assignee history
2012–2020Patents assigned to JACOBS JOHANNES HENRICUS WILHELMUS (13)· patent assignee history
2012–2016Patents assigned to LEENDERS MARTINUS HENDRIKUS ANTONIUS (10)· patent assignee history
2012–2020Patents assigned to DONDERS SJOERD NICOLAAS LAMBERTUS (9)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV1092005–2021
OTTENS JOOST JEROENself362012–2020
JACOBS JOHANNES HENRICUS WILHELMUS132012–2020
LEENDERS MARTINUS HENDRIKUS ANTONIUS102012–2016
DONDERS SJOERD NICOLAAS LAMBERTUS92012–2020
Locations
LocationPatentsSpan
Veldhoven, NL1102005–2021
Vedlhoven, NL22006