Seal for chemical mechanical polishing device
Granted 18 Nov 2025 · 2 office actions
Assignee: Ebara Corporation
Law firm: Law firm · Log in to unlock
Attorney: Attorney · Log in to unlock
Inventors: Manato Furusawa, Makoto Kashiwagi, Kazuhiro Tajima · Examiner: Amber R Stiles · AU 2917 · TC 2900
Life of the application
6 dated eventsDescription
1 parts›1. Seal for chemical mechanical polishing device 1…
1. Seal for chemical mechanical polishing device
1 . 1 : Perspective
1 . 2 : Front
1 . 3 : Back
1 . 4 : Top
1 . 5 : Bottom
1 . 6 : Right
1 . 7 : Left
1 . 8 : Cross sectional
1 . 9 : Enlarged
1 . 10 : Reference view
1 . 11 : Enlarged
The article is a seal for a top ring of a chemical mechanical polishing device. The feature of the design resides in the shape and configuration of the article as shown in the reproductions. Reproduction 1 . 8 is an enlarged cross-sectional view taken along the line 1 . 8 - 1 . 8 in Reproduction 1 . 4 . Reproduction 1 . 9 is an enlarged view of a portion 1 . 9 of the article in Reproduction 1 . 8 . Reproduction 1 . 11 is an enlarged view of the encircled portion in Reproduction 1 . 1 . The dashed broken lines shown in the reproductions illustrate environmental subject matter and form no part of the claimed design. The dot-dash broken lines shown in the reproductions represent boundaries that form no part of the claimed design. The two-dot-dash broken lines shown in the reproductions are for the purpose of encircling enlarged portions and form no part of the claimed design.
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