USPatent applicationPatented

Target profile for a physical vapor deposition chamber target

Granted 12 Dec 2023 · 1 office action

Application· this page
29/782,632
filed 7 May 2021
Publication
Not published
not published
Patent
US D1007449
granted 12 Dec 2023

Life of the application

8 dated events
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Description

1 parts
›FIG. 1 is a top perspective view of…

FIG. 1 is a top perspective view of a sputtering target for a physical vapor deposition chamber, according to one embodiment of the novel design.

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a right side elevation view thereof.

FIG. 5 is a left side elevation view thereof.

FIG. 6 is a front elevation thereof.

FIG. 7 is a back elevation view thereof; and,

FIG. 8 is an enlarged partial right side elevation view showing portions of the design in greater detail.

The dash-dash broken lines in FIGS. 1 - 8 represent unclaimed environment and form no part of the claimed design.

The short dash-dot lines on FIG. 4 and FIG. 8 depict the bounds of the region taken from FIG. 4 to be enlarged on FIG. 8 and form no part of the claimed design.

the grant prints no section headings; every part label below is ours, taken from that part's own first words

Claims as granted

1 claim

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Classifications

1 codes
USPC · US Patent Classification
D13/182

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File wrapper

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Pendency
2.6 y
949 days filing → grant
Office actions
0
after a restriction
Examiner
Calvin E Vansant
art unit 2915 · TC 2900
Citations: 141 back · 10 forward

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Chain of title

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