Target profile for a physical vapor deposition chamber target
Granted 12 Dec 2023 · 1 office action
Current assignee: Applied Materials South East Asia Pte · originally Applied Materials, Inc.
Law firm: Law firm · Log in to unlock
Attorney: Attorney · Log in to unlock
Inventors: Nuno Yen-Chu Chen, Kirankumar Neelasandra Savandaiah, Jiao Song, Mengxue Wu +3 · Examiner: Calvin E Vansant · AU 2915 · TC 2900
Life of the application
8 dated eventsDescription
1 parts›FIG. 1 is a top perspective view of…
FIG. 1 is a top perspective view of a sputtering target for a physical vapor deposition chamber, according to one embodiment of the novel design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a right side elevation view thereof.
FIG. 5 is a left side elevation view thereof.
FIG. 6 is a front elevation thereof.
FIG. 7 is a back elevation view thereof; and,
FIG. 8 is an enlarged partial right side elevation view showing portions of the design in greater detail.
The dash-dash broken lines in FIGS. 1 - 8 represent unclaimed environment and form no part of the claimed design.
The short dash-dot lines on FIG. 4 and FIG. 8 depict the bounds of the region taken from FIG. 4 to be enlarged on FIG. 8 and form no part of the claimed design.
Claims as granted
1 claimLog in to read the claims of this application.
Log in to unlockClassifications
1 codesClaim changes
SoonSee which claims were amended, added or cancelled during examination, with every added and removed word marked.
The published claims of this application are not paired with the granted ones in what we hold.
File wrapper
See the full prosecution history — every USPTO and applicant action on this file, in order.
Log in to unlockDocuments
Log in to open the documents of this file: the application as filed, every office action and response, the notice of allowance.
Log in to unlockChain of title
See the full assignment history — every owner this patent has passed through, with recordation dates and reel/frame numbers.
Log in to unlock