USPatentGranted
S1

Target profile for a physical vapor deposition chamber target

Granted 12 Dec 2023 · no office action yet

Application
29/782,632
filed 7 May 2021
Publication
Not published
not published
Patent· this page
US D1007449
granted 12 Dec 2023

Life of the patent

2 dated events
⤢ drag to zoomApr 2021Jul 2021Oct 2021Jan 2022Apr 2022Jul 2022Oct 2022Jan 2023Apr 2023Jul 2023Oct 2023Jan 2024Prosecution
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Description

1 parts
›FIG. 1 is a top perspective view of…

FIG. 1 is a top perspective view of a sputtering target for a physical vapor deposition chamber, according to one embodiment of the novel design.

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a right side elevation view thereof.

FIG. 5 is a left side elevation view thereof.

FIG. 6 is a front elevation thereof.

FIG. 7 is a back elevation view thereof; and,

FIG. 8 is an enlarged partial right side elevation view showing portions of the design in greater detail.

The dash-dash broken lines in FIGS. 1 - 8 represent unclaimed environment and form no part of the claimed design.

The short dash-dot lines on FIG. 4 and FIG. 8 depict the bounds of the region taken from FIG. 4 to be enlarged on FIG. 8 and form no part of the claimed design.

the grant prints no section headings; every part label below is ours, taken from that part's own first words

Claims

1 · 1 independent · depth 1
1 granted claims

Classifications

1 codes
USPC · US Patent Classification
D13/182

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File wrapper

Pendency
2.6 y
949 days filing → grant
Office actions
0
after a restriction
Examiner
Calvin E Vansant
art unit 2915 · TC 2900
Citations: 141 back · 10 forward

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Chain of title

⤢ drag to zoom20222024202620282030203220342036203820402042Owner 3
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Worldwide family

5 members · 3 offices
US1JP2TW2
this patentIP5 & PCTother officessolid = grantedhover for detail · click to open
Members
5
DOCDB simple family 82164379
Offices
3
US · JP
Granted
3 of 5
grant date present
Non-English titles
3
shown as filed, never translated
›IP5 & PCT — 3 members
OfficePublicationKindPublishedFiledStatusTitle
USthis patentUS-D1007449-SS112 Dec 20237 May 2021grantedTarget profile for a physical vapor deposition chamber target
JPJP-1718363-SS28 Jun 20228 Nov 2021granted物理的気相堆積チャンバターゲットのためのターゲットプロファイルja
JPJP-1730204-SS18 Nov 20228 Nov 2021granted物理的気相堆積チャンバターゲットのためのターゲットプロファイルja
›Other offices — 2 members
OfficePublicationKindPublishedFiledStatusTitle
TWTW-D226530-SS21 Jul 20231 Nov 2021published用於物理氣相沉積腔室的靶材zh
TWTW-D237732-SS21 Apr 20251 Nov 2021publishedTarget for a physical vapor deposition chamber

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Citations

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