Inventor
Kunihiko Kodama
Inventor
Shizuoka, JP
Overview
Patents· 135 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests24%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
B82YSpecific uses or applications of nanostructures4%
C07CAcyclic or carbocyclic compounds4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
C07DHeterocyclic compounds3%
G11BInformation storage based on relative movement between record carrier and transducer3%
Y10TTechnical subjects covered by former us classification3%
C09DCoating compositions, e.g. paints, varnishes or lacquers2%
PatentTitleYear
10,312,546Non-aqueous liquid electrolyte for secondary battery and secondary battery20199,976,100Lubricant composition20189,941,543Non-aqueous liquid electrolyte for secondary battery and secondary battery20189,905,886'Non-aqueous liquid electrolyte for secondary battery and secondary battery'20189,868,846'Curable composition for imprints, patterning method and pattern'20189,684,233'Curable composition for imprints, patterning method and pattern'20179,663,671'Curable composition for imprints and method of storing the same'20179,507,263'Underlay film composition for imprints and method of forming pattern and pattern formation method using the same'20169,482,950'Curable composition for imprints, pattern-forming method and pattern'20169,441,065'Curable composition for imprints, cured product and method for manufacturing a cured product'20169,335,628'Curable composition for imprints, patterning method and pattern'20169,052,594'Positive photosensitive composition and method of forming pattern using the same'20158,999,221'Curable composition for imprints, patterning method and pattern'20158,980,404'Composition for imprints, pattern and patterning method'20158,933,144'Curable composition for imprint, pattern-forming method and pattern'20158,894,187'Liquid application device, liquid application method, and nanoimprint system'20148,883,065'Curable composition for imprints, patterning method and pattern'20148,877,828'Method for producing curable composition for imprints'20148,859,071'Curable composition for imprint, patterning method and pattern'20148,851,636'Liquid application device, liquid application method, and nanoimprint system'20148,851,624'Maintenance liquid'20148,820,541'Method for producing curable composition for imprints'20148,808,975'Positive resist composition for immersion exposure and pattern-forming method using the same'20148,783,823'Maintenance liquid'20148,753,792'Positive photosensitive composition and pattern forming method using the same'20148,703,892'Curable composition for imprints, patterning method and pattern'20148,685,614'Positive photosensitive composition'20148,530,540'Curable composition for imprints, patterning method and pattern'20138,404,427'Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition'20138,252,508'Positive photosensitive composition and method of forming resist pattern'2012RE043560'Positive photosensitive compositions'20128,206,886'Photosensitive composition and pattern-forming method using the photosensitive composition'20128,158,326'Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition'20128,080,361'Positive photosensitive composition and method of forming pattern using the same'20118,039,200'Photosensitive composition and pattern-forming method using the photosensitive composition'20118,025,833'Curable composition for nanoimprint, and patterning method'20118,012,665'Positive photosensitive composition and pattern forming method using the same'20118,003,294'Photosensitive composition, compound used for photosensitive composition and pattern-forming method using photosensitive composition'20117,960,087'Positive photosensitive composition and pattern-forming method using the same'20117,887,988'Positive resist composition and pattern forming method using the same'20117,867,697'Positive photosensitive composition and method of forming resist pattern'20117,812,194'Positive photosensitive composition'20107,803,511'Positive resist composition for immersion exposure and pattern-forming method using the same'20107,799,505'Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition'20107,776,512'Positive photosensitive composition'20107,773,477'Optical disk driving unit, pickup controller, and laser driver provided in a pickup'20107,749,679'Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition'20107,700,261'Positive photosensitive composition and a pattern-forming method using the same'20107,687,219'Positive resist composition and pattern formation method using the positive resist composition'20107,670,746'Positive photosensitive composition and method of forming resist pattern'20107,632,623'Positive resist composition and pattern formation method using the positive resist composition'20097,625,690'Positive resist composition and pattern forming method using the same'20097,510,822'Stimulation sensitive composition and compound'20097,505,388'Laser controller for a multi-intensity recording laser and an optical disk drive including the same'20097,465,528'Positive-working photosensitive composition and pattern forming method using the same'20087,449,573'Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition'20087,442,490'Positive resist composition and pattern formation method using the positive resist composition'20087,435,526'Positive photosensitive composition'20087,371,505'Photosensitive composition and method for forming pattern using the same'20087,351,515'Positive resist composition and pattern-forming method using the same'20087,341,817'Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition'20087,335,454'Positive resist composition'20087,323,286'Photosensitive composition, compound used in the same, and patterning method using the same'20087,273,690'Positive resist composition for immersion exposure and method of pattern formation with the same'20077,245,568'Disk recording and reproducing device'20077,214,465'Positive photosensitive composition'20077,202,014'Stimulus-sensitive composition, compound and pattern formation method using the stimulation-sensitive composition'20077,192,685'Positive resist composition and method of forming resist pattern using the same.'20077,189,492'Photosensitive composition and pattern forming method using the same'20077,122,589'Positive resist composition and pattern formation method using the same'20067,094,515'Stimulus sensitive compound and stimulus sensitive composition containing the same'20067,090,960'Negative resist composition'20067,074,544'Image recording material'20067,033,727'Photosensitive composition and acid generator'20067,022,459'Photosensitive composition'20066,992,963'Semiconductor integrated circuit, optical disk recording/playback apparatus using the same, and optical disk recording method'20066,960,667'Fluorescent maleimides and uses thereof'20056,927,009'Positive photosensitive composition'20056,858,370'Positive photosensitive composition'20056,844,132'Positive photosensitive compositions'20056,830,867'Positive photosensitive composition'20046,818,377'Positive photosensitive composition'20046,808,862'Positive photosensitive composition'20046,806,023'Positive radiation-sensitive composition'20046,803,173'Positive resist composition'20046,794,108'Positive photoresist composition for far ultraviolet exposure'20046,795,385'Optical disk recording and reproducing apparatus and method for recording and controlling optical disk'20046,787,283'Positive photoresist composition for far ultraviolet exposure'20046,777,160'Positive-working resist composition'20046,756,179'Positive resist composition'20046,749,987'Positive photosensitive composition'20046,733,951'Positive radiation-sensitive composition'20046,727,036'Positive-working radiation-sensitive composition'20046,699,635'Positive photosensitive composition'20046,692,884'Positive photoresist composition'20046,670,095'Positive-working resist composition'20036,660,446'Heat-sensitive composition and planographic printing plate'20036,605,409'Positive resist composition'20036,602,646'Positive-working resist composition'20036,596,458'Positive-working photoresist composition'20036,576,392'Positive photoresist composition'20036,562,981'Benzo (4,5) imidazo (2,1-a) isoindol-11-ones'20036,544,715'Positive photoresist composition for far ultraviolet ray exposure'20036,517,991'Positive photosensitive composition'20036,508,957'Fluorescent maleimides and uses thereof'20036,506,535'Positive working photoresist composition'20036,505,319'Signal processing circuit and information recording apparatus'20036,492,091'Positive photosensitive composition'20026,489,080'Positive resist composition'20026,485,883'Positive photoresist composition'20026,479,211'Positive photoresist composition for far ultraviolet exposure'20026,430,723'Error correcting device and data reproducing apparatus provided therewith'20026,420,082'Positive resist fluid and positive resist composition'20026,413,655'Fluorescent materials and their use'20026,410,204'Positive photoresist composition'20026,291,130'Positive photosensitive composition'20016,274,065'Process for the preparation of fluorescent compositions, fluorescent compositions and their use'20016,265,135'Positive-working electron beam or X-ray resist composition'20016,258,954'Fluorescent maleimides and uses thereof'20016,205,568'Data transmission system and error correcting method applicable to the same'20016,200,729'Positive photosensitive composition'20016,150,068'Photosensitive resin composition for far-ultraviolet exposure'20006,138,263'Error correcting method and apparatus for information data having error correcting product code block'20006,060,213'Positive-working photosensitive composition'20006,010,820'Positive photosensitive composition'20005,981,140'Positive photosensitive composition'19995,945,250'Positive photosensitive composition'19995,891,603'Positive working photosensitive composition'19995,853,949'Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound'19985,837,420'Positive working photosensitive composition'19985,667,932'Positive photoresist composition'19975,629,128'Positive photoresist composition'19975,553,041'Disc data reproducing apparatus and signal processing unit for preventing underflow and overflow'19965,296,088'Compound semiconductor crystal growing method'19945,270,247'Atomic layer epitaxy of compound semiconductor'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–2003Based in Takarazuka, JP· patent location history
1996–2010Patents assigned to TOSHIBA KK (10)· patent assignee history
1996–2019Based in Kanagawa, JP· patent location history
1997–2007Patents assigned to FUJI PHOTO FILM CO LTD (53)· patent assignee history
1997–2015Based in Shizuoka, JP· patent location history
2000–2010Based in Yokohama, JP· patent location history
2001–2005Patents assigned to CIBA SC HOLDING AG (6)· patent assignee history
2007–2019Patents assigned to FUJIFILM CORP (62)· patent assignee history
2008–2018Based in Haibara-gun, JP· patent location history
2011–2017Patents assigned to KODAMA KUNIHIKO (20)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIFILM CORP | 62 | 2007–2019 |
| FUJI PHOTO FILM CO LTD | 53 | 1997–2007 |
| KODAMA KUNIHIKOself | 20 | 2011–2017 |
| TOSHIBA KK | 10 | 1996–2010 |
| CIBA SC HOLDING AG | 6 | 2001–2005 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shizuoka, JP | 91 | 1997–2015 |
| Haibara-gun, JP | 21 | 2008–2018 |
| Kanagawa, JP | 8 | 1996–2019 |
| Yokohama, JP | 6 | 2000–2010 |
| Takarazuka, JP | 5 | 1993–2003 |