USPatentGranted
B2

Liquid application device, liquid application method, and nanoimprint system

Granted 7 Oct 2014 · 4 office actions

Life of the patent

10 dated events
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Abstract

A liquid application device includes: a liquid discharge head having a structure in which nozzles for performing droplet ejection of a functional liquid onto a substrate are aligned in a row in a predetermined direction, and including liquid chambers connected to the nozzles respectively and piezoelectric elements which are provided correspondingly to the liquid chambers and serve to pressurize the liquid in the liquid chambers; a relative movement unit for causing relative movement between the substrate and the liquid discharge head; and a droplet ejection control unit for operating the piezoelectric elements so as to cause the liquid to land discretely on the substrate, and controlling operation of the piezoelectric elements according to each of groups formed by grouping the nozzles correspondingly to the structure of the liquid discharge head.

Claims

16 · 3 independent · depth 3
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16 granted claims

Classifications

10 codes
IPC · International Patent Classification
Section B — Performing operations; transporting
  • B82Y40/00
  • B41J2/14
  • B82Y10/00
  • B41J2/045
Section G — Physics
  • G03F7/00
USPC · US Patent Classification
347/68347/41347/71347/70347/65

Claim changes

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File wrapper

⤢ drag to zoomJan 2013Apr 2013Jul 2013Oct 2013Jan 2014Apr 2014Jul 2014Oct 2014USPTOApplicantNon-final rejectionApplicant-initiated interviewNon-final rejectionResponse after non-final
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Pendency
1.8 y
648 days filing → grant
Office actions
2
non-final + final
Responses
2
no RCE
Interviews
1
examiner interview summaries
Examiner
Henok Legesse
art unit 2853 · TC 2800
Citations: 30 back · 0 forward

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Term & fees

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Priority chain

1 priority documents
›Priority documents — 1
TypeDocumentDate
related publicationUS 20130113863 A19 May 2013

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Citations

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