Inventor
Atsushi Endo
Inventor
Nirasaki, JP
Overview
Patents· 57 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
H01LSemiconductor devices6%
Y10TTechnical subjects covered by former us classification6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
G06FElectric digital data processing5%
G11BInformation storage based on relative movement between record carrier and transducer5%
H05KPrinted circuits5%
LOC134%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
PatentTitleYear
11,067,946Removably mountable unit and image forming apparatus202111,062,904Method of forming polysilicon film and film forming apparatus202110,935,928Cartridge202110,915,056Drum cartridge and method for manufacturing drum cartridge202110,592,349Storage control device and storage apparatus202010,458,016Method for forming a protective film201910,170,300Protective film forming method20199,824,919'Recess filling method and processing apparatus'20179,777,366'Thin film forming method'20179,750,128'Unit device'20179,727,279'Storage control apparatus controlling issuable number of requests and storage control method thereof'20179,620,435'Evaporator, cooling device, and electronic device'20179,343,113'Control apparatus and control method'20169,279,183'Film forming apparatus and method of operating the same'20169,145,604'Thin film forming method and film forming apparatus'20158,993,456'Film forming apparatus and method of operating the same'2015D0725053'Outer tube for process tube for manufacturing semiconductor wafers'2015D0724551'Inner tube for process tube for manufacturing semiconductor wafers'2015D0720308'Inner tube for process tube for manufacturing semiconductor wafers'2014D0720309'Inner tube for process tube for manufacturing semiconductor wafers'20148,900,780'Photosensitive resin composition for color filter and color filter using the same'20148,518,834'Method and apparatus for forming oxide film on carbon film'20138,002,895'Heat processing apparatus for semiconductor process'20117,604,010'Film formation apparatus and method of using the same'20097,575,431'Vertical heat processing apparatus and method for using the same'20097,559,992'Semiconductor processing apparatus and method'20097,494,542'Method of preparing a pigment composition'2009D0586768'Process tube for manufacturing semiconductor wafers'20097,470,637'Film formation apparatus and method of using the same'20087,368,384'Film formation apparatus and method of using the same'20087,156,923'Silicon nitride film forming method, silicon nitride film forming system and silicon nitride film forming system precleaning method'20077,049,013'Magnetic recording medium and method of producing the same, and magnetic storage apparatus'20066,844,273'Precleaning method of precleaning a silicon nitride film forming system'20056,839,102'Liquid crystal display device having light guide with refractive surface'20056,830,807'Thermally stable low noise magnetic recording media'20046,829,918'Method of and apparatus for measuring mercury contained in hydrocarbon'20046,682,834'Magnetic storage medium having a high recording density'20046,665,038'Liquid crystal display device'20036,528,889'Electronic circuit device having adhesion-reinforcing pattern on a circuit board for flip-chip mounting an IC chip'20036,519,701'Information processing apparatus, information processing method, and transmission medium'20036,493,769'Stream information processing and method and providing medium'20026,341,319'System and method for transmitting/receiving signal level data'20026,224,698'Method of manufacturing an inorganic board'20016,103,896'Process for the production of metal phthalocyanine'20005,984,256'Mold and method for manufacturing an inorganic board'19995,910,585'Process for the production of copper phthalocyanine'19995,903,553'Enhanced signal collision detection method in wireless communication system'19995,635,552'Method for dispersing pigment and water-based pigment dispersion'19975,476,544'Water-based pigment dispersion'19955,420,187'Pigment dispersing agent and its use'19955,183,533'Method for etching chromium film formed on substrate'19935,173,844'Integrated circuit device having a metal substrate'19925,081,562'Circuit board with high heat dissipations characteristic'19925,007,984'Method for etching chromium film formed on substrate'19914,993,148'Method of manufacturing a circuit board'19914,687,388'Drill bit'19874,645,734'Composite having conductive layer on resin layer and method of manufacturing'1987Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1987–1993Patents assigned to MITSUBISHI ELECTRIC CORP (6)· patent assignee history
1991–1993Based in Hyogo, JP· patent location history
1995–2009Patents assigned to TOYO INK MFG CO (6)· patent assignee history
1995–2009Based in Tokyo, JP· patent location history
2003–2021Based in Chiba, JP· patent location history
2004–2020Patents assigned to FUJITSU LTD (8)· patent assignee history
2005–2021Patents assigned to TOKYO ELECTRON LTD (22)· patent assignee history
2005–2021Based in Nirasaki, JP· patent location history
2013–2015Patents assigned to ENDO ATSUSHI (6)· patent assignee history
2016–2020Based in Kawasaki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 22 | 2005–2021 |
| FUJITSU LTD | 8 | 2004–2020 |
| ENDO ATSUSHIself | 6 | 2013–2015 |
| MITSUBISHI ELECTRIC CORP | 6 | 1987–1993 |
| TOYO INK MFG CO | 6 | 1995–2009 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nirasaki, JP | 15 | 2005–2021 |
| Tokyo, JP | 12 | 1995–2009 |
| Kawasaki, JP | 5 | 2016–2020 |
| Hyogo, JP | 5 | 1991–1993 |
| Chiba, JP | 4 | 2003–2021 |