Process tube for manufacturing semiconductor wafers
Granted 17 Feb 2009 · no office action yet
Assignee: Tokyo Electron Limited
Law firm: Law firm · Log in to unlock
Attorney: Attorney · Log in to unlock
Inventors: Atsushi Endo, Hisashi Inoue · Examiner: Selina Sikder · AU 2912 · TC 2900
Life of the patent
5 dated eventsDescription
1 parts›FIG. 1 is a front view of the…
FIG. 1 is a front view of the design for a process tube for manufacturing semiconductor wafers in accordance with the invention;
FIG. 2 is a rear view thereof;
FIG. 3 is a right side view thereof;
FIG. 4 is a left side view thereof;
FIG. 5 is a top view thereof;
FIG. 6 is a bottom view thereof;
FIG. 7 is a sectional view thereof along line 7 — 7 of FIG. 5 ;
FIG. 8 is a sectional view thereof along line 8 — 8 of FIG. 5 ;
FIG. 9 is a sectional view thereof along line 9 — 9 of FIG. 1 ; and,
FIG. 10 is a front, perspective view thereof.
In the preferred embodiment, the entire body of the process tube is transparent such that the inside of the tube can be seen. Dash lines show the boundary of the claimed design.
The broken lines define portions of the process tube that form no part of the claimed design.
Claims
1 · 1 independent · depth 1Classifications
1 codesClaim changes
SoonSee which claims were amended, added or cancelled during examination, with every added and removed word marked.
The published claims of this patent are not paired with the granted ones in what we hold.
File wrapper
See the full prosecution history — every USPTO and applicant action on this file, in order.
Log in to unlockChain of title
See the full assignment history — every owner this patent has passed through, with recordation dates and reel/frame numbers.
Log in to unlockTerm & fees
See the term timeline — pendency span, in-force span, the maintenance fees paid and both computed expiry dates.
Log in to unlockWorldwide family
2 members · 2 offices›IP5 & PCT — 1 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| USthis patent | US-D586768-S | S1 | 17 Feb 2009 | 11 Apr 2007 | granted | Process tube for manufacturing semiconductor wafers |
›Other offices — 1 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| TW | TW-D125600-S1 | S1 | 21 Oct 2008 | 10 Apr 2007 | published | 半導體製造用加工處理管zh |
Validity challenges
See the validity challenges on record — reexaminations, IPRs and PGRs, with their institution decisions and outcomes.
Log in to unlockCitations
See every patent this one cites and every patent that cites it back — publication, assignee, and how each one was found.
Log in to unlock