Target profile for a physical vapor deposition chamber target
Granted 11 Oct 2022 · no office action yet
Current assignee: Applied Materials Israel · originally Applied Materials, Inc.
Law firm: Law firm · Log in to unlock
Attorney: Attorney · Log in to unlock
Inventors: David Gunther, Madan Kumar Shimoga Mylarappa, Kirankumar Neelasandra Savandaiah, Jiao Song · Examiner: Calvin E Vansant · AU 2915 · TC 2900
Life of the patent
2 dated eventsDescription
1 parts›FIG. 1 is a top isometric view of…
FIG. 1 is a top isometric view of a sputter target for a physical vapor deposition chamber, according to our novel design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a right side elevation view thereof.
FIG. 5 is a left side elevation view thereof.
FIG. 6 is a front elevation thereof.
FIG. 7 is a back elevation view thereof; and,
FIG. 8 is an enlarged partial right side elevation view showing portions of the design in greater detail.
The broken lines in the drawings represent unclaimed environment and form no part of the claimed design.
The long dash short dash broken lines in FIGS. 4 and 8 represent the region of enlargement taken from FIG. 4 as shown in FIG. 8 and form no part of the claimed design.
Claims
1 · 1 independent · depth 1Classifications
2 codesClaim changes
SoonSee which claims were amended, added or cancelled during examination, with every added and removed word marked.
The published claims of this patent are not paired with the granted ones in what we hold.
File wrapper
See the full prosecution history — every USPTO and applicant action on this file, in order.
Log in to unlockChain of title
See the full assignment history — every owner this patent has passed through, with recordation dates and reel/frame numbers.
Log in to unlockTerm & fees
See the term timeline — pendency span, in-force span, the maintenance fees paid and both computed expiry dates.
Log in to unlockWorldwide family
4 members · 2 offices›IP5 & PCT — 2 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| US | US-D940765-S | S1 | 11 Jan 2022 | 2 Dec 2020 | granted | Target profile for a physical vapor deposition chamber target |
| USthis patent | US-D966357-S | S1 | 11 Oct 2022 | 31 Dec 2021 | granted | Target profile for a physical vapor deposition chamber target |
›Other offices — 2 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| TW | TW-D232372-S | S | 21 Jul 2024 | 21 May 2021 | published | 用於物理氣相沉積腔室的靶材zh |
| TW | TW-D232578-S | S | 1 Aug 2024 | 21 May 2021 | published | Target profile for a physical vapor deposition chamber target |
Validity challenges
See the validity challenges on record — reexaminations, IPRs and PGRs, with their institution decisions and outcomes.
Log in to unlockCitations
See every patent this one cites and every patent that cites it back — publication, assignee, and how each one was found.
Log in to unlock