Target profile for a physical vapor deposition chamber target
Granted 11 Oct 2022 · 1 office action
Current assignee: Applied Materials Israel · originally Applied Materials, Inc.
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Inventors: David Gunther, Madan Kumar Shimoga Mylarappa, Kirankumar Neelasandra Savandaiah, Jiao Song · Examiner: Calvin E Vansant · AU 2915 · TC 2900
Life of the application
8 dated eventsDescription
1 parts›FIG. 1 is a top isometric view of…
FIG. 1 is a top isometric view of a sputter target for a physical vapor deposition chamber, according to our novel design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a right side elevation view thereof.
FIG. 5 is a left side elevation view thereof.
FIG. 6 is a front elevation thereof.
FIG. 7 is a back elevation view thereof; and,
FIG. 8 is an enlarged partial right side elevation view showing portions of the design in greater detail.
The broken lines in the drawings represent unclaimed environment and form no part of the claimed design.
The long dash short dash broken lines in FIGS. 4 and 8 represent the region of enlargement taken from FIG. 4 as shown in FIG. 8 and form no part of the claimed design.
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