USPatentGranted
S1

Ion shield plate for semiconductor manufacturing apparatus

Granted 3 Nov 2020 · no office action yet

Application
29/677,753
filed 23 Jan 2019
Publication
Not published
not published
Patent· this page
US D900760
granted 3 Nov 2020

Life of the patent

2 dated events
⤢ drag to zoomJan 2019Apr 2019Jul 2019Oct 2019Jan 2020Apr 2020Jul 2020Oct 2020Jan 2021Prosecution
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Description

1 parts
›FIG. 1 is a front, bottom and right…

FIG. 1 is a front, bottom and right side perspective view of an ion shield plate for semiconductor manufacturing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a rear elevational view thereof; and,

FIG. 8 is a cross-sectional view taken along line 8 - 8 of FIG. 2 .

the grant prints no section headings; every part label below is ours, taken from that part's own first words

Claims

1 · 1 independent · depth 1
1 granted claims

Classifications

4 codes
USPC · US Patent Classification
D13/184D23/261D15/126D26/138

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File wrapper

Pendency
1.8 y
650 days filing → grant
Office actions
0
none on record
Examiner
Janice Hallmark
art unit 2916 · TC 2900
Citations: 58 back · 0 forward

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Chain of title

⤢ drag to zoom2020202220242026202820302032203420362038Owner 2
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Worldwide family

3 members · 3 offices
US1JP1TW1
this patentIP5 & PCTother officessolid = grantedhover for detail · click to open
Members
3
DOCDB simple family 65359165
Offices
3
US · JP
Granted
2 of 3
grant date present
Non-English titles
1
shown as filed, never translated
›IP5 & PCT — 2 members
OfficePublicationKindPublishedFiledStatusTitle
USthis patentUS-D900760-SS13 Nov 202023 Jan 2019grantedIon shield plate for semiconductor manufacturing apparatus
JPJP-1624794-SS18 Feb 201924 Jul 2018grantedno title held
›Other offices — 1 members
OfficePublicationKindPublishedFiledStatusTitle
TWTW-D199478-SS1 Sep 201924 Jan 2019published半導體製造裝置用離子遮蔽板zh

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