Gas nozzle for substrate processing apparatus
Granted 7 Jul 2020 · no office action yet
Current assignee: Hitachi Kokusai Electric Inc. · originally Kokusai Electric Co. Ltd.
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Attorney: Attorney · Log in to unlock
Inventors: Shinya Ebata, Hiroaki Hiramatsu, Yusaku Okajima, Toru Kagaya · Examiner: Derrick E Holland · AU 2917 · TC 2900
Life of the patent
6 dated eventsDescription
1 parts›FIG. 1 is a front, bottom and left…
FIG. 1 is a front, bottom and left side perspective view of an gas nozzle for substrate processing apparatus showing our new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a left side elevational view thereof;
FIG. 5 is a right side elevational view thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom plan view thereof;
FIG. 8 is an enlarged front view take along line 8 - 8 in FIG. 2 thereof;
FIG. 9 is a cross-sectional view take along line 9 - 9 in FIG. 8 ; and,
FIG. 10 is a cross-sectional view take along line 10 - 10 in FIG. 9 .
The broken lines in FIG. 2 designating the enlarged view form no part of the claimed design.
Claims
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3 members · 3 offices›IP5 & PCT — 2 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| USthis patent | US-D889596-S | S1 | 7 Jul 2020 | 25 May 2018 | granted | Gas nozzle for substrate processing apparatus |
| JP | JP-1605945-S | S | 4 Jun 2018 | 27 Dec 2017 | granted | no title held |
›Other offices — 1 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| TW | TW-D198926-S | S | 1 Aug 2019 | 27 Apr 2018 | published | 基板處理裝置用氣體供給噴嘴zh |
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