USPatent applicationPatented

Gas nozzle for substrate processing apparatus

Granted 7 Jul 2020 · no office action yet

Current assignee: Hitachi Kokusai Electric Inc. · originally Kokusai Electric Co. Ltd.

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Inventors: Shinya Ebata, Hiroaki Hiramatsu, Yusaku Okajima, Toru Kagaya · Examiner: Derrick E Holland · AU 2917 · TC 2900

Application· this page
29/649,036
filed 25 May 2018
Publication
Not published
not published
Patent
US D889596
granted 7 Jul 2020

Life of the application

6 dated events
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Description

1 parts
›FIG. 1 is a front, bottom and left…

FIG. 1 is a front, bottom and left side perspective view of an gas nozzle for substrate processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is an enlarged front view take along line 8 - 8 in FIG. 2 thereof;

FIG. 9 is a cross-sectional view take along line 9 - 9 in FIG. 8 ; and,

FIG. 10 is a cross-sectional view take along line 10 - 10 in FIG. 9 .

The broken lines in FIG. 2 designating the enlarged view form no part of the claimed design.

the grant prints no section headings; every part label below is ours, taken from that part's own first words

Claims as granted

1 claim

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Classifications

1 codes
USPC · US Patent Classification
D23/213

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File wrapper

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Pendency
2.1 y
774 days filing → grant
Office actions
0
none on record
Examiner
Derrick E Holland
art unit 2917 · TC 2900
Citations: 13 back · 0 forward

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Documents

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Chain of title

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