USPatent applicationPatented

Process tube for manufacturing semiconductor wafers

Granted 17 Feb 2009 · no office action yet

Assignee: Tokyo Electron Limited

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Inventors: Atsushi Endo, Hisashi Inoue · Examiner: Selina Sikder · AU 2912 · TC 2900

Application· this page
29/274,293
filed 11 Apr 2007
Publication
Not published
not published
Patent
US D586768
granted 17 Feb 2009

Life of the application

5 dated events
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Description

1 parts
›FIG. 1 is a front view of the…

FIG. 1 is a front view of the design for a process tube for manufacturing semiconductor wafers in accordance with the invention;

FIG. 2 is a rear view thereof;

FIG. 3 is a right side view thereof;

FIG. 4 is a left side view thereof;

FIG. 5 is a top view thereof;

FIG. 6 is a bottom view thereof;

FIG. 7 is a sectional view thereof along line 7 — 7 of FIG. 5 ;

FIG. 8 is a sectional view thereof along line 8 — 8 of FIG. 5 ;

FIG. 9 is a sectional view thereof along line 9 — 9 of FIG. 1 ; and,

FIG. 10 is a front, perspective view thereof.

In the preferred embodiment, the entire body of the process tube is transparent such that the inside of the tube can be seen. Dash lines show the boundary of the claimed design.

The broken lines define portions of the process tube that form no part of the claimed design.

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Claims as granted

1 claim

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Classifications

1 codes
USPC · US Patent Classification
D13/182

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File wrapper

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Pendency
1.9 y
678 days filing → grant
Office actions
0
none on record
Examiner
Selina Sikder
art unit 2912 · TC 2900
Citations: 10 back · 0 forward

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Documents

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Chain of title

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