Inventor
Satoshi Wakamatsu
Inventor
Kanagawa, JP
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B29Cprimary
B29CShaping or joining of plastics10%
B82YSpecific uses or applications of nanostructures10%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices10%
A61MDevices for introducing media into, or onto, the body9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
B29LIndexing scheme associated with subclass b29c, relating to particular articles7%
G11BInformation storage based on relative movement between record carrier and transducer7%
A61KPreparations for medical, dental or toiletry purposes6%
F16DCouplings for transmitting rotation6%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts4%
PatentTitleYear
11,065,427Method for manufacturing transdermal absorption sheet202110,814,118Transdermal absorption sheet202010,596,361Transdermal absorption sheet and method of producing the same202010,456,569Method of producing transdermal absorption sheet for medical use201910,441,532Method of producing transdermal absorption sheet201910,180,623Nanoimprinting method, and method for producing a droplet arrangement pattern20199,968,766Transdermal absorption sheet and method of manufacturing transdermal absorption sheet20189,505,165'Nanoimprinting mold, method for producing the nanoimprinting mold, nanoimprinting method using the nanoimprinting mold, and method for producing patterned substrates'20169,201,990'Simulation method, simulation program, recording medium having the simulation program stored therein, method for producing droplet arrangement patterns utilizing the simulation method, nanoimprinting method, method for producing patterned substrates, and ink jet apparatus'20159,028,022'Liquid ejection apparatus, nanoimprint system, and liquid ejection method'20159,005,512'Method for forming patterns and method for producing patterned substrates'20158,894,187'Liquid application device, liquid application method, and nanoimprint system'20148,851,636'Liquid application device, liquid application method, and nanoimprint system'20148,789,666'Friction couple'20148,679,357'Nanoimprinting method and method for producing substrates utilizing the nanoimprinting method'20148,492,466'Friction material and production method of friction material'20138,469,161'Friction couple'20138,377,322'Pattern forming method, substrate processing method and mold structure replication method'20138,247,472'Friction material and production method of friction material'20128,052,414'Mold structure used to produce discrete track medium, imprinting method, method for producing discrete track medium, and discrete track medium'20117,663,827'Method of initializing perpendicular magnetic recording medium, perpendicular magnetic recording medium and magnetic recording apparatus'20107,532,420'Master disk for magnetic transfer, magnetic recording medium and magnetic recording apparatus'20097,440,207'Magnetic-transfer method, magnetic recording medium, and magnetic recording device'20085,202,158'Apparatus for and method of producing high density fiber reinforced composite material'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2021Patents assigned to FUJIFILM CORP (18)· patent assignee history
2008–2015Based in Odawara, JP· patent location history
2011–2021Based in Kanagawa, JP· patent location history
2012–2014Patents assigned to WAKAMATSU SATOSHI (5)· patent assignee history
2012–2014Patents assigned to ABE KENJI (4)· patent assignee history
2012–2014Patents assigned to FUJIKAWA HIROYUKI (4)· patent assignee history
2012–2014Patents assigned to ISONO HIROSHI (4)· patent assignee history
2012–2014Based in Nagoya, JP· patent location history
2014–2015Based in Shizuoka, JP· patent location history
2020Based in Ashigarakami-gun, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIFILM CORP | 18 | 2008–2021 |
| WAKAMATSU SATOSHIself | 5 | 2012–2014 |
| ABE KENJI | 4 | 2012–2014 |
| FUJIKAWA HIROYUKI | 4 | 2012–2014 |
| ISONO HIROSHI | 4 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 8 | 2011–2021 |
| Odawara, JP | 5 | 2008–2015 |
| Nagoya, JP | 4 | 2012–2014 |
| Shizuoka, JP | 3 | 2014–2015 |
| Ashigarakami-gun, JP | 2 | 2020 |