USPatentGranted
B1

Target for laser produced plasma extreme ultraviolet light source

Granted 18 Feb 2014 · 2 office actions

Current assignee: ASML Netherlands B.V. · originally ASML Holding

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Inventors: Yezheng Tao, Robert J. Rafac · Examiner: Michael Maskell · AU 2881 · TC 2800

Application
13/830,461
filed 14 Mar 2013
Publication
Not published
not published
Patent· this page
US 8,653,492
granted 18 Feb 2014

Life of the patent

2 dated events
⤢ drag to zoomApr 2013Jul 2013Oct 2013Jan 2014Apr 2014Prosecution
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Abstract

Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.

Claims

22 · 2 independent · depth 3
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22 granted claims

Classifications

3 codes
IPC · International Patent Classification
Section H — Electricity
  • H05G2/00
USPC · US Patent Classification
250/504.R378/143

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Pendency
0.9 y
341 days filing → grant
Office actions
1
non-final + final
Responses
1
1 RCE
Examiner
Michael Maskell
art unit 2881 · TC 2800
Citations: 20 back · 0 forward

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