Inventor
Yezheng Tao
Inventor
San Diego, CA, US
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H05Gprimary
H05GX-ray technique31%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light21%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
G21KHandling of particles or ionising radiation not otherwise provided for16%
G02BOptical elements, systems or apparatus5%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution5%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein3%
PatentTitleYear
10,663,866Wavelength-based optical filtering202010,645,789Optical isolation module202010,064,261Extreme ultraviolet light source20189,832,855Optical isolation module20179,826,616'Extreme ultraviolet light source utilizing a target of finite extent'20179,462,668'Target for extreme ultraviolet light source'20169,380,691'Adaptive laser system for an extreme ultraviolet light source'20169,357,625'Extreme ultraviolet light source'20169,338,870'Extreme ultraviolet light source'20169,232,624'Target for laser produced plasma extreme ultraviolet light source'20169,155,179'Target for extreme ultraviolet light source'20159,107,279'Target for laser produced plasma extreme ultraviolet light source'20158,927,952'Target for laser produced plasma extreme ultraviolet light source'20158,912,514'Target for extreme ultraviolet light source'20148,872,143'Target for laser produced plasma extreme ultraviolet light source'20148,866,110'Extreme ultraviolet light source'20148,791,440'Target for extreme ultraviolet light source'20148,680,495'Extreme ultraviolet light source'20148,653,492'Target for laser produced plasma extreme ultraviolet light source'20148,536,549'Light source employing laser-produced plasma'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013Patents assigned to TAO YEZHENG (1)· patent assignee history
2013Patents assigned to TILLACK MARK S (1)· patent assignee history
2013–2020Based in San Diego, CA, US· patent location history
2014–2020Patents assigned to ASML NETHERLANDS BV (17)· patent assignee history
2014Patents assigned to CYMER INC (2)· patent assignee history
2014–2015Patents assigned to Cymer LLC (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 17 | 2014–2020 |
| CYMER INC | 2 | 2014 |
| Cymer LLC | 2 | 2014–2015 |
| TAO YEZHENGself | 1 | 2013 |
| TILLACK MARK S | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Diego, California, US | 20 | 2013–2020 |