Inventor
Robert J. Rafac
Inventor
Encinitas, CA, US
Overview
Patents· 45 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H05Gprimary
H05GX-ray technique29%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light22%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light13%
G21KHandling of particles or ionising radiation not otherwise provided for10%
G02BOptical elements, systems or apparatus5%
B23KSoldering or unsoldering1%
G01BMeasuring length, thickness or similar linear dimensions1%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein1%
PatentTitleYear
11,096,266Target expansion rate control in an extreme ultraviolet light source202110,904,993Reducing the effect of plasma on an object in an extreme ultraviolet light source202110,674,591Target expansion rate control in an extreme ultraviolet light source202010,667,377Extreme ultraviolet light source202010,663,866Wavelength-based optical filtering202010,401,704Compensating for a physical effect in an optical system201910,349,509Reducing the effect of plasma on an object in an extreme ultraviolet light source201910,314,153Target expansion rate control in an extreme ultraviolet light source20199,980,359Systems and methods for controlling EUV energy generation using pulse intensity20189,832,852EUV LPP source with dose control and laser stabilization using variable width laser pulses20179,832,854Systems and methods for stabilization of droplet-plasma interaction via laser energy modulation20179,820,368'Target expansion rate control in an extreme ultraviolet light source'20179,713,240'Stabilizing EUV light power in an extreme ultraviolet light source'20179,709,897'Polarization control of pulsed light beam'20179,516,729'Variable radius mirror dichroic beam splitter module for extreme ultraviolet source'20169,462,668'Target for extreme ultraviolet light source'20169,426,872'System and method for controlling source laser firing in an LPP EUV light source'2016RE045957'Regenerative ring resonator'20169,239,269'Calibration of photoelectromagnetic sensor in a laser source'20169,239,268'Calibration of photoelectromagnetic sensor in a laser source'20169,232,623'Extreme ultraviolet light source'20169,232,624'Target for laser produced plasma extreme ultraviolet light source'20169,155,179'Target for extreme ultraviolet light source'20159,107,279'Target for laser produced plasma extreme ultraviolet light source'20159,000,403'System and method for adjusting seed laser pulse width to control EUV output energy'20158,927,952'Target for laser produced plasma extreme ultraviolet light source'20158,912,514'Target for extreme ultraviolet light source'20148,872,143'Target for laser produced plasma extreme ultraviolet light source'20148,866,110'Extreme ultraviolet light source'20148,853,657'Intracavity loss element for power amplifier'20148,791,440'Target for extreme ultraviolet light source'20148,680,495'Extreme ultraviolet light source'20148,653,492'Target for laser produced plasma extreme ultraviolet light source'20148,624,209'Controlling spatial properties in an excimer ring amplifier'20148,563,956'Intracavity loss element for power amplifier'20138,520,186'Active spectral control of optical source'20138,014,432'Regenerative ring resonator'20117,733,494'Bandwidth measuring device for high pulse repetition rate pulsed laser'20107,684,046'Method and apparatus for bandwidth measurement and bandwidth parameter calculation for laser light'20107,639,364'Methods and apparatus for bandwidth measurement and bandwidth parameter calculation for laser light'20097,411,686'Methods and apparatus for aligning an etalon with a photodiode array'20087,317,536'Spectral bandwidth metrology for high repetition rate gas discharge lasers'20087,304,748'Method and apparatus for bandwidth measurement and bandwidth parameter calculation for laser light'20077,256,893'Method and apparatus for measuring bandwidth of an optical spectrum output of a very small wavelength very narrow bandwidth high power laser'20077,088,758'Relax gas discharge laser lithography light source'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2015Patents assigned to CYMER INC (14)· patent assignee history
2006–2010Based in Carlsbad, CA, US· patent location history
2008–2021Based in Encinitas, CA, US· patent location history
2013–2017Patents assigned to Cymer LLC (8)· patent assignee history
2013–2014Patents assigned to RAFAC ROBERT J (2)· patent assignee history
2013Patents assigned to BENDIK JOSEPH J (1)· patent assignee history
2014–2021Patents assigned to ASML NETHERLANDS BV (28)· patent assignee history
2016Based in San Diego, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 28 | 2014–2021 |
| CYMER INC | 14 | 2006–2015 |
| Cymer LLC | 8 | 2013–2017 |
| RAFAC ROBERT Jself | 2 | 2013–2014 |
| BENDIK JOSEPH J | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Encinitas, California, US | 37 | 2008–2021 |
| Carlsbad, California, US | 7 | 2006–2010 |
| San Diego, California, US | 1 | 2016 |