EUV light source optical elements
Granted 13 Jan 2009 · 4 office actions
Assignee: Cymer, Inc.
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Inventors: Alexander I. Ershov, Norbert R. Bowering, Hugh R. Grinolds, Timothy S. Dyer · Examiner: Bernard E Souw · AU 2881 · TC 2800
Life of the patent
3 dated eventsAbstract
Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.
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2 · 2 independent · depth 1Classifications
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- G02B1/00
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1 priority documents›Priority documents — 1
| Type | Document | Date |
|---|---|---|
| related publication | US 20070170378 A1 | 26 Jul 2007 |
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