Lower shield for a substrate processing chamber
Granted 29 Nov 2022 · 1 office action
Current assignee: Applied Materials Israel · originally Applied Materials, Inc.
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Inventors: Junqi Wei, Kang Zhang, Sarath Babu, Yueh Sheng Ow +3 · Examiner: Michael C Stout · AU 2924 · TC 2900
Life of the application
8 dated eventsDescription
1 parts›FIG. 1 is a top isometric view of…
FIG. 1 is a top isometric view of a lower shield for a substrate processing chamber, according to the novel design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a front elevation view thereof.
FIG. 5 is a back elevation view thereof.
FIG. 6 is a right side elevation view thereof.
FIG. 7 is a left side elevation view thereof; and,
FIG. 8 is a cross-sectional view taken along line 8 - 8 in FIG. 2 .
The broken lines show portions of a lower shield for a substrate processing chamber that form no part of the claimed design.
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