USPatent applicationPatented

Target profile for a physical vapor deposition chamber target

Granted 11 Jan 2022 · 1 office action

Application· this page
29/760,578
filed 2 Dec 2020
Publication
Not published
not published
Patent
US D940765
granted 11 Jan 2022

Life of the application

8 dated events
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Description

1 parts
›FIG. 1 is a top perspective view of…

FIG. 1 is a top perspective view of a sputtering target for a physical vapor deposition chamber, according to one embodiment of the novel design.

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a right side elevation view thereof.

FIG. 5 is a left side elevation view thereof.

FIG. 6 is a front elevation thereof.

FIG. 7 is a back elevation view thereof; and,

FIG. 8 is an enlarged partial right side elevation view showing portions of the design in greater detail.

The broken lines in the drawings represent unclaimed environment and form no part of the claimed design.

The long dash sort dash broken lines in FIG. 4 and FIG. 8 represent the region of enlargement taken from FIG. 4 as shown on FIG. 8 and form no part of the claimed design.

the grant prints no section headings; every part label below is ours, taken from that part's own first words

Claims as granted

1 claim

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Classifications

2 codes
USPC · US Patent Classification
D15/138D13/182

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File wrapper

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Pendency
1.1 y
405 days filing → grant
Office actions
0
after a restriction
Examiner
Calvin E Vansant
art unit 2915 · TC 2900
Citations: 127 back · 0 forward

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Chain of title

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