Semiconductor device structure and method for forming the same

The semiconductor integrated circuit (IC) industry has experienced rapid growth. Technological advances in IC materials and design have produced generations of ICs. Each generation has smaller and more complex circuits than the previous generation. However, these advances have increased the complexity of processing and manufacturing ICs.

In the course of IC evolution, functional density (i.e., the number of interconnected devices per chip area) has generally increased while geometric size (i.e., the smallest component (or line) that can be created using a fabrication process) has decreased. This scaling-down process generally provides benefits by increasing production efficiency and lowering associated costs.

However, since feature sizes continue to decrease, fabrication processes continue to become more difficult to perform. Therefore, it is a challenge to form reliable semiconductor devices at smaller and smaller sizes.

Aspects of the present disclosure are best understood from the following detailed description when read with the accompanying figures. It should be noted that, in accordance with standard practice in the industry, various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or reduced for clarity of discussion.

FIGS. 1A-1I are cross-sectional views of various stages of a process for forming a semiconductor device structure, in accordance with some embodiments.

FIG. 1C-1 is a top view of the semiconductor device structure of FIG. 1C , in accordance with some embodiments.

FIG. 1H-1 is a top view of the semiconductor device structure of FIG. 1H , in accordance with some embodiments.

FIG. 1H-2 is a cross-sectional view illustrating the semiconductor device structure along a sectional line II-II′ in FIG. 1H-1 , in accordance with some embodiments.

FIGS. 2A-2D are cross-sectional views of various stages of a process for forming a semiconductor device structure, in accordance with some embodiments.

FIG. 2C-1 is a top view of the semiconductor device structure of FIG. 2C , in accordance with some embodiments.

FIG. 2C-2 is a cross-sectional view illustrating the semiconductor device structure along a sectional line II-II′ in FIG. 2C-1 , in accordance with some embodiments.

FIGS. 3A-3G are cross-sectional views of various stages of a process for forming a semiconductor device structure, in accordance with some embodiments.

FIG. 3D-1 is a top view of the semiconductor device structure of FIG. 3D , in accordance with some embodiments.

FIG. 3F-1 is a top view of the semiconductor device structure of FIG. 3F , in accordance with some embodiments.

FIG. 3F-2 is a cross-sectional view illustrating the semiconductor device structure along a sectional line II-II′ in FIG. 3F-1 , in accordance with some embodiments.

FIGS. 4A-4D are cross-sectional views of various stages of a process for forming a semiconductor device structure, in accordance with some embodiments.

FIG. 4C-1 is a top view of the semiconductor device structure of FIG. 4C , in accordance with some embodiments.

FIG. 4C-2 is a cross-sectional view illustrating the semiconductor device structure along a sectional line II-II′ in FIG. 4C-1 , in accordance with some embodiments.

FIG. 5 is a cross-sectional view of a semiconductor device structure, in accordance with some embodiments.

The following disclosure provides many different embodiments, or examples, for implementing different features of the subject matter provided. Specific examples of components and arrangements are described below to simplify the present disclosure. These are, of course, merely examples and are not intended to be limiting. For example, the formation of a first feature over or on a second feature in the description that follows may include embodiments in which the first and second features are formed in direct contact, and may also include embodiments in which additional features may be formed between the first and second features, such that the first and second features may not be in direct contact. In addition, the present disclosure may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,” “above,” “upper” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. The spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The apparatus may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein may likewise be interpreted accordingly. It should be understood that additional operations can be provided before, during, and after the method, and some of the operations described can be replaced or eliminated for other embodiments of the method.

FIGS. 1A-1I are cross-sectional views of various stages of a process for forming a semiconductor device structure, in accordance with some embodiments. As shown in FIG. 1A , a semiconductor substrate 110 is provided. The semiconductor substrate 110 has a top surface 111 , in accordance with some embodiments. The semiconductor substrate 110 may be a semiconductor wafer (such as a silicon wafer) or a portion of a semiconductor wafer.

In some embodiments, the semiconductor substrate 110 is made of an elementary semiconductor material (e.g., silicon or germanium) or a compound semiconductor (e.g., silicon carbide), an alloy semiconductor (e.g., SiGe, or GaAsP), or combinations thereof.

As shown in FIG. 1A , a mask layer 120 is formed over the top surface 111 , in accordance with some embodiments. The mask layer 120 is also referred to as a hard mask layer, in accordance with some embodiments. The mask layer 120 is made of nitride or another suitable material. The mask layer 120 has openings 122 and 124 , in accordance with some embodiments. The openings 122 and 124 expose a portion of the semiconductor substrate 110 , in accordance with some embodiments.

As shown in FIG. 1B , the portion of the semiconductor substrate 110 exposed by the openings 122 and 124 is removed to form trenches 112 and 114 in the semiconductor substrate 110 , in accordance with some embodiments. The removal process is performed using an etching process, such as a dry etching process (e.g., a plasma etching process), in accordance with some embodiments. The trenches 112 and 114 are formed by a same etching process, in accordance with some embodiments.

FIG. 1C-1 is a top view of the semiconductor device structure of FIG. 1C , in accordance with some embodiments. FIG. 1C is a cross-sectional view illustrating the semiconductor device structure along a sectional line I-I′ in FIG. 1C-1 , in accordance with some embodiments.

As shown in FIGS. 1C and 1C-1 , the mask layer 120 is removed, in accordance with some embodiments. As shown in FIGS. 1C and 1C-1 , the trench 114 surrounds the trench 112 , in accordance with some embodiments. The trench 114 communicates with the trench 112 , in accordance with some embodiments.

In some embodiments, a depth D 1 of the trench 112 is substantially equal to a depth D 2 of the trench 114 . The term “substantially equal to” means a ratio of the difference between the depths D 1 and D 2 to the depth D 1 or D 2 ranges from about −5% to about 5%, in accordance with some embodiments. The depth D 1 or D 2 ranges from about 0.15 μm to about 0.45 μm, in accordance with some embodiments. The depth D 1 or D 2 ranges from about 0.2 μm to about 0.4 μm, in accordance with some embodiments.

As shown in FIG. 1D , an isolation structure 130 is formed in the trenches 112 and 114 , in accordance with some embodiments. The trenches 112 and 114 are filled up with the isolation structure 130 , in accordance with some embodiments. The isolation structure 130 is made of a dielectric material, such as silicon oxide, in accordance with some embodiments.

As shown in FIG. 1D , a mask layer 140 is formed over the top surface 111 , in accordance with some embodiments. The mask layer 140 has an opening 142 , in accordance with some embodiments. The opening 142 exposes the semiconductor substrate 110 surrounded by the trench 114 , in accordance with some embodiments.

As shown in FIG. 1D , an ion implantation process is performed to implant first type dopants into the semiconductor substrate 110 surrounded by the trench 114 to form a first type well 116 , in accordance with some embodiments. The first type dopants and the first type well 116 have a first type conductivity, in accordance with some embodiments.

In some embodiments, the first type conductivity is a P-type conductivity, and the first type dopants and the first type well 116 are P-type dopants and a P-type well. The P-type dopants are made of boron (B), aluminum (Al), gallium (Ga), indium (In), and thallium (Tl), in accordance with some embodiments.

In some other embodiments, the first type conductivity is an N-type conductivity, and the first type dopants and the first type well 116 are N-type dopants and N-type well. The N-type dopants are made of nitrogen (N), phosphorus (P), arsenic (As), antimony (Sb), or bismuth (Bi), in accordance with some embodiments.

As shown in FIG. 1D , an ion implantation process is performed to implant second type dopants into the semiconductor substrate 110 , in accordance with some embodiments. The second type lightly doped region 117 is formed in the semiconductor substrate 110 surrounded by the trench 114 , in accordance with some embodiments. The second type dopants and the second type lightly doped regions 117 have a second type conductivity, in accordance with some embodiments.

The second type conductivity is different from the first type conductivity, in accordance with some embodiments. For example, if the first type conductivity is a P-type conductivity, the second type conductivity is an N-type conductivity. If the first type conductivity is an N-type conductivity, the second type conductivity is a P-type conductivity.

In some embodiments, the second type conductivity is an N-type conductivity, and the second type dopants are made of nitrogen (N) or another group VA element. In some other embodiments, the second type conductivity is a P-type conductivity, and the second type dopants are made of boron (B) or another group IIIA element.

As shown in FIG. 1E , the mask layer 140 is removed, in accordance with some embodiments. As shown in FIG. 1E , the isolation structure 130 in the trench 112 is removed, in accordance with some embodiments.

As shown in FIG. 1F , a gate dielectric material layer 150 a is conformally deposited over the top surface 111 of the semiconductor substrate 110 and a bottom surface 112 a and inner walls 112 b of the trench 112 , in accordance with some embodiments. The gate dielectric material layer 150 a is made of silicon oxide or another suitable insulating material.

As shown in FIG. 1F , a gate material layer 160 a is deposited over the gate dielectric material layer 150 a , in accordance with some embodiments. The gate material layer 160 a is made of a conductive material, such as a semiconductor material (e.g., polysilicon), in accordance with some embodiments.

As shown in FIG. 1F , a mask layer 170 is formed over the gate material layer 160 a , in accordance with some embodiments. The mask layer 170 exposes a portion of the gate material layer 160 a , in accordance with some embodiments. In some embodiments, the mask layer 170 includes oxide or nitride, such as silicon oxide, silicon oxynitride, silicon nitride, or the like.

As shown in FIG. 1G , the gate material layer 160 a exposed by the mask layer 170 is removed, and the gate dielectric material layer 150 a under the removed gate material layer 160 a is also removed, in accordance with some embodiments. The gate material layer 160 a and the gate dielectric material layer 150 a remaining under the mask layer 170 form a gate electrode 160 and a gate dielectric layer 150 , in accordance with some embodiments. The gate electrode 160 and the gate dielectric layer 150 together form a gate structure G, in accordance with some embodiments.

As shown in FIG. 1G , the mask layer 170 is removed, in accordance with some embodiments. As shown in FIG. 1G , a spacer layer 180 is deposited over the gate structure G and the semiconductor substrate 110 , in accordance with some embodiments. The spacer layer 180 includes insulating materials, such as silicon oxides or silicon nitrides, in accordance with some embodiments.

FIG. 1H-1 is a top view of the semiconductor device structure of FIG. 1H , in accordance with some embodiments. FIG. 1H is a cross-sectional view illustrating the semiconductor device structure along a sectional line I-I′ in FIG. 1H-1 , in accordance with some embodiments. FIG. 1H-2 is a cross-sectional view illustrating the semiconductor device structure along a sectional line II-II′ in FIG. 1H-1 , in accordance with some embodiments.

As shown in FIG. 1H , an anisotropic etching process (e.g. a dry etching process) is performed to remove a portion of the spacer layer 180 . The remaining spacer layer 180 is over sidewalls 162 and 152 of the gate electrode 160 and the gate dielectric layer 150 . The spacer layer 180 only surrounds the gate structure G over the top surface 111 and does not surround the gate structure G in the semiconductor substrate 110 , in accordance with some embodiments. The spacer layer 180 over the sidewalls 162 and 152 is configured to electrically isolate the gate electrode 160 from other devices and to act as a mask layer in a subsequent ion implantation process.

As shown in FIGS. 1H and 1H-1 , second type heavily doped regions 118 and 119 are formed in the semiconductor substrate 110 by using a suitable process, such as an ion implantation process. The second type heavily doped regions 118 and 119 are a source region and a drain region, respectively, in accordance with some embodiments. The second type heavily doped regions 118 and 119 are located at the two opposite sides of the gate structure G.

The gate structure G, the spacer layer 180 , the first type well 116 , the second type lightly doped regions 117 , and the second type heavily doped regions 118 and 119 together constitute a transistor device 100 , in accordance with some embodiments.

The trench 112 and the gate structure G are between the second type heavily doped regions 118 and 119 , in accordance with some embodiments. The trench 112 and the gate structure G physically and electrically separate the second type heavily doped region 118 from the second type heavily doped region 119 , in accordance with some embodiments. Therefore, the gate structure G extending into the semiconductor substrate 110 improves the breakdown voltage of the transistor device 100 or reduces the gate length Lg when maintaining a required breakdown voltage.

The second type heavily doped regions 118 and 119 are doped with second type dopants, in accordance with some embodiments. The second type dopants and the second type heavily doped regions 118 and 119 have a second type conductivity, in accordance with some embodiments.

The second type conductivity is different from the first type conductivity, in accordance with some embodiments. For example, if the first type conductivity is a P-type conductivity, the second type conductivity is an N-type conductivity. If the first type conductivity is an N-type conductivity, the second type conductivity is a P-type conductivity.

In some embodiments, the second type conductivity is an N-type conductivity, and the second type dopants are made of nitrogen (N) or another group VA element. In some other embodiments, the second type conductivity is a P-type conductivity, and the second type dopants are made of boron (B) or another group IIIA element.

The gate structure G is formed in the trench 112 and extends to the top surface 111 , in accordance with some embodiments. The trench 112 has opposite sides 112 c and 112 d , in accordance with some embodiments. The opposite sides 112 c and 112 d respectively face the second type heavily doped regions 118 and 119 , in accordance with some embodiments. The gate structure G in the trench 112 has opposite sides S 1 and S 2 , in accordance with some embodiments. The opposite sides S 1 and S 2 respectively face the second type heavily doped regions 118 and 119 , in accordance with some embodiments.

In some embodiments, a portion P 1 of the gate structure G over the top surface 111 and on the side 112 c or S 1 has a length L 1 . The depth D 1 of the trench 112 is greater than the length L 1 , in accordance with some embodiments. In some embodiments, a portion P 2 of the gate structure G in the trench 112 has a bottom surface B 1 .

In some embodiments, a distance DT 1 between the bottom surface B 1 and the top surface 111 is greater than the length L 1 . A ratio of the distance DT 1 (or the depth D 1 ) to the length L 1 ranges from about 1.3 to about 1.5, in accordance with some embodiments. In some embodiments, a distance DT 2 between a bottom surface 132 of the isolation structure 130 and the top surface 111 is substantially equal to the distance DT 1 .

In some embodiments, a portion P 0 of the gate structure G over the top surface 111 has a length Lg, the portion P 2 of the gate structure G in the trench 112 has a length L 2 , and the length Lg is greater than the length L 2 . In some embodiments, as shown in FIG. 1H , the gate structure G has a T-shaped cross section.

As shown in FIGS. 1H-1 and 1H-2 , the gate structure G is partially over the isolation structure 130 , in accordance with some embodiments. The isolation structure 130 surrounds the gate structure G in the trench 112 , in accordance with some embodiments. The isolation structure 130 is in direct contact with the gate structure G (or the gate dielectric layer 150 ), in accordance with some embodiments.

The gate structure G has a sidewall SW, in accordance with some embodiments. The isolation structure 130 has a sidewall 134 , in accordance with some embodiments. The sidewalls SW and 134 face to each other, in accordance with some embodiments. The sidewalls SW and 134 are in direct contact with each other, in accordance with some embodiments. As shown in FIG. 1H , the depth D 1 of the trench 112 is greater than the thickness T 1 of the gate structure G over the top surface 111 , in accordance with some embodiments.

As shown in FIG. 1I , a dielectric layer 190 is formed over the semiconductor substrate 110 , the gate structure G, and the spacer layer 180 , in accordance with some embodiments. The dielectric layer 190 is made of silicon oxide, silicon oxynitride, or another suitable dielectric material.

As shown in FIG. 1I , portions of the dielectric layer 190 are removed to form through holes 192 , 194 , and 196 in the dielectric layer 190 , in accordance with some embodiments. The through holes 192 , 194 , and 196 respectively expose the gate structure G and the second type heavily doped regions 118 and 119 , in accordance with some embodiments.

As shown in FIG. 1I , conductive structures C 1 , C 2 , and C 3 are respectively formed in the through holes 192 , 194 , and 196 , in accordance with some embodiments. The through holes 192 , 194 , and 196 are filled up with the conductive structures C 1 , C 2 , and C 3 , respectively, in accordance with some embodiments. The conductive structures C 1 , C 2 , and C 3 are respectively electrically connected to the gate electrode 160 and the second type heavily doped regions 118 and 119 , in accordance with some embodiments. The conductive structures C 1 , C 2 , and C 3 are made of tungsten, copper, or other suitable conductive materials.

FIGS. 2A-2D are cross-sectional views of various stages of a process for forming a semiconductor device structure, in accordance with some embodiments. As shown in FIG. 2A , after the step of FIG. 1H , a dielectric layer 210 is formed over the top surface 111 and surrounds the gate structure G, in accordance with some embodiments. The dielectric layer 210 is made of silicon oxide, silicon oxynitride, borosilicate glass (BSG), or another suitable dielectric material.

As shown in FIG. 2B , the gate structure G is removed to form an opening 182 in the spacer layer 180 , in accordance with some embodiments. As shown in FIG. 2B , a gate dielectric layer 220 is deposited over the dielectric layer 210 and the spacer layer 180 and in the opening 182 and the trench 112 , in accordance with some embodiments.

The gate dielectric layer 220 conformally covers the inner walls 182 a of the opening 182 , the top surface 111 exposed by the opening 182 , and the bottom surface 112 a and the inner walls 112 b of the trench 112 , in accordance with some embodiments.

As shown in FIG. 2B , a work function metal layer 230 is deposited over the gate dielectric layer 220 , in accordance with some embodiments. The work function metal layer 230 provides a desired work function for transistors to enhance device performance including improved threshold voltage.

In the embodiments of forming a PMOS transistor, the work function metal layer 230 can be a p-type metal capable of providing a work function value suitable for the device, such as equal to or greater than about 4.8 eV. The p-type metal may be made of metal, metal carbide, metal nitride, other suitable materials, or a combination thereof. For example, the p-type metal is made of titanium, titanium nitride, another suitable material, or a combination thereof.

On the other hand, in the embodiments of forming an NMOS transistor, the work function metal layer 230 can be an n-type metal capable of providing a work function value suitable for the device, such as equal to or less than about 4.5 eV. The n-type metal includes metal, metal carbide, metal nitride, or a combination thereof, in accordance with some embodiments. For example, the n-type metal is made of tantalum, tantalum nitride, or a combination thereof. The work function metal layer 230 is made of hafnium, zirconium, or another suitable material.

As shown in FIG. 2B , a gate electrode layer 240 (also called a metal gate electrode layer) is deposited over the work function metal layer 230 to fill the opening 182 and the trench 112 , in accordance with some embodiments. The gate electrode layer 240 includes a suitable metal material, such as aluminum, tungsten, gold, platinum, cobalt, another suitable metal, an alloy thereof, or a combination thereof, in accordance with some embodiments.

FIG. 2C-1 is a top view of the semiconductor device structure of FIG. 2C , in accordance with some embodiments. FIG. 2C is a cross-sectional view illustrating the semiconductor device structure along a sectional line I-I′ in FIG. 2C-1 , in accordance with some embodiments. FIG. 2C-2 is a cross-sectional view illustrating the semiconductor device structure along a sectional line II-II′ in FIG. 2C-1 , in accordance with some embodiments. For the sake of simplicity, FIG. 2C-1 does not show the dielectric layer 210 , in accordance with some embodiments.

As shown in FIGS. 2C, 2C-1, and 2C-2 , a planarization process is performed to remove the gate electrode layer 240 , the work function metal layer 230 , and the gate dielectric layer 220 outside of the opening 182 and the trench 112 , in accordance with some embodiments. In some embodiments, top surfaces 242 , 232 , 222 , 183 , and 212 of the gate electrode layer 240 , the work function metal layer 230 , the gate dielectric layer 220 , the spacer layer 180 , and the dielectric layer 210 are coplanar, in accordance with some embodiments. The planarization process includes a chemical mechanical polishing (CMP) process or the like, in accordance with some embodiments.

The gate electrode layer 240 , the work function metal layer 230 , and the gate dielectric layer 220 in the opening 182 and the trench 112 together form a gate structure G 1 , in accordance with some embodiments.

The gate structure G 1 is formed in the trench 112 and extends to the top surface 111 , in accordance with some embodiments. The gate structure G 1 in the trench 112 has opposite sides S 3 and S 4 , in accordance with some embodiments. The sides S 3 and S 4 respectively face the second type heavily doped regions 118 and 119 , in accordance with some embodiments.

In some embodiments, a portion P 3 of the gate structure G 1 over the top surface 111 and on the side 112 c or S 3 has a length L 2 . The depth D 1 of the trench 112 is greater than the length L 2 , in accordance with some embodiments. A ratio of the depth D 1 to the length L 2 ranges from about 1.3 to about 1.5, in accordance with some embodiments.

In some embodiments, a portion P 4 of the gate structure G 1 in the trench 112 has a bottom surface B 2 . In some embodiments, a distance DT 3 between the bottom surface B 2 and the top surface 111 is greater than the length L 2 . In some embodiments, the distance DT 2 between the bottom surface 132 of the isolation structure 130 and the top surface 111 is substantially equal to the distance DT 3 .

As shown in FIGS. 2C-1 and 2C-2 , the gate structure G 1 is partially over the isolation structure 130 , in accordance with some embodiments. As shown in FIGS. 2C, 2C-1, and 2C-2 , the isolation structure 130 surrounds the gate structure G 1 in the trench 112 , in accordance with some embodiments. As shown in FIGS. 2C-1 and 2C-2 , the isolation structure 130 is in direct contact with the gate structure G 1 (or the gate dielectric layer 220 ), in accordance with some embodiments.

The gate structure G 1 has a sidewall SW 1 , in accordance with some embodiments. The sidewall SW 1 and the sidewall 134 of the isolation structure 130 face to each other, in accordance with some embodiments. The sidewalls SW 1 and 134 are in direct contact with each other, in accordance with some embodiments. As shown in FIG. 2C , the depth D 1 of the trench 112 is greater than the thickness T 2 of the gate structure G 1 over the top surface 111 , in accordance with some embodiments.

As shown in FIG. 2D , a dielectric layer 250 is formed over the gate structure G 1 , the dielectric layer 210 , and the spacer layer 180 , in accordance with some embodiments. The dielectric layer 250 is made of silicon oxide, silicon oxynitride, or another suitable material.

As shown in FIG. 2D , portions of the dielectric layers 210 and 250 are removed to form through holes 252 , 254 , and 256 in the dielectric layers 210 and 250 , in accordance with some embodiments. The through holes 252 , 254 , and 256 respectively expose the gate structure G 1 and the second type heavily doped regions 118 and 119 , in accordance with some embodiments.

As shown in FIG. 2D , conductive structures 262 , 264 , and 266 are respectively formed in the through holes 252 , 254 , and 256 , in accordance with some embodiments. The through holes 252 , 254 , and 256 are filled up with the conductive structures 262 , 264 , and 266 , respectively, in accordance with some embodiments. The conductive structures 262 , 264 , and 266 are respectively electrically connected to the gate electrode layer 240 and the second type heavily doped regions 118 and 119 , in accordance with some embodiments. The conductive structures 262 , 264 , and 266 are made of, for example, tungsten, copper, or other suitable conductive materials.

FIGS. 3A-3G are cross-sectional views of various stages of a process for forming a semiconductor device structure, in accordance with some embodiments. It should be noted that the embodiment of FIGS. 3A-3G is similar to the embodiment of FIGS. 1A-1I , except that the gate structure of the embodiment of FIGS. 3A-3G has two portions extending into the semiconductor substrate 110 , in accordance with some embodiments. Therefore, the elements in FIGS. 3A-3G , which are named and/or labeled identically to those in FIGS. 1A-1I have materials and structures that are similar thereto. Therefore, detailed descriptions are not repeated herein.

As shown in FIG. 3A , a semiconductor substrate 110 is provided. The semiconductor substrate 110 has a top surface 111 , in accordance with some embodiments. As shown in FIG. 3A , a mask layer 310 is formed over the top surface 111 , in accordance with some embodiments. The mask layer 310 has openings 312 and 314 , in accordance with some embodiments. The openings 312 and 314 expose a portion of the semiconductor substrate 110 , in accordance with some embodiments.

As shown in FIG. 3A , the portion of the semiconductor substrate 110 exposed by the openings 312 and 314 is removed to form trenches 113 and 115 in the semiconductor substrate 110 , in accordance with some embodiments. The removal process is performed using an etching process, such as a dry etching process (e.g., a plasma etching process), in accordance with some embodiments.

As shown in FIG. 3A , a mask layer 320 is formed over the top surface 111 , in accordance with some embodiments. The mask layer 320 has an opening 322 , in accordance with some embodiments. The opening 322 exposes a portion of the semiconductor substrate 110 , in accordance with some embodiments. As shown in FIG. 3A , the portion of the semiconductor substrate 110 exposed by the opening 322 is removed to form a trench 114 in the semiconductor substrate 110 , in accordance with some embodiments.

As shown in FIG. 3C , the mask layer 320 is removed, in accordance with some embodiments. As shown in FIG. 3C , an isolation structure 130 is formed in the trenches 113 , 114 , and 115 , in accordance with some embodiments. The trenches 113 , 114 , and 115 are filled up with the isolation structure 130 , in accordance with some embodiments.

As shown in FIG. 3C , a mask layer 140 is formed over the top surface 111 , in accordance with some embodiments. The mask layer 140 has an opening 142 , in accordance with some embodiments. The opening 142 exposes the semiconductor substrate 110 surrounded by the trench 114 , in accordance with some embodiments.

As shown in FIG. 3C , an ion implantation process is performed to implant first type dopants into the semiconductor substrate 110 to form a first type well 116 , in accordance with some embodiments. The first type well 116 is formed in the semiconductor substrate 110 surrounded by the trench 114 , in accordance with some embodiments. The first type dopants and the first type well 116 have a first type conductivity, in accordance with some embodiments. The first type conductivity may be a P-type conductivity or an N-type conductivity.

As shown in FIG. 3C , an ion implantation process is performed to implant second type dopants into the semiconductor substrate 110 surrounded by the trench 114 to form second type lightly doped regions 117 , in accordance with some embodiments.

The second type dopants and the second type lightly doped regions 117 have a second type conductivity, in accordance with some embodiments. The second type conductivity may be an N-type conductivity or a P-type conductivity. The second type conductivity is different from the first type conductivity, in accordance with some embodiments.

FIG. 3D-1 is a top view of the semiconductor device structure of FIG. 3D , in accordance with some embodiments. FIG. 3D is a cross-sectional view illustrating the semiconductor device structure along a sectional line I-I′ in FIG. 3D-1 , in accordance with some embodiments.

As shown in FIG. 3D , the mask layer 140 is removed, in accordance with some embodiments. As shown in FIG. 3D , the isolation structure 130 in the trenches 113 and 115 is removed, in accordance with some embodiments. As shown in FIGS. 3D and 3D-1 , the trench 114 and the isolation structure 130 surround the trenches 113 and 115 , in accordance with some embodiments. The trench 114 communicates with the trenches 113 and 115 , in accordance with some embodiments.

In some embodiments, a depth D 3 of the trench 113 is substantially equal to a depth D 4 of the trench 115 . The term “substantially equal to” means a ratio of the difference between the depths D 3 and D 4 to the depth D 3 or D 4 ranges from about −5% to about 5%, in accordance with some embodiments.

The depth D 3 or D 4 ranges from about 0.05 μm to about 0.15 μm, in accordance with some embodiments. The depth D 2 of the trench 114 is greater than the depth D 3 or D 4 , in accordance with some embodiments.

As shown in FIG. 3E , a gate dielectric material layer 150 a is conformally deposited over the top surface 111 , bottom surfaces 113 c and 115 a and inner walls 113 d and 115 b of the trenches 113 and 115 , in accordance with some embodiments.

As shown in FIG. 3E , a gate dielectric material layer 150 a is conformally deposited over the top surface 111 , bottom surfaces 113 a and 115 a and inner walls 113 b and 115 b of the trenches 113 and 115 , in accordance with some embodiments.

As shown in FIG. 3E , a gate material layer 160 a is deposited over the gate dielectric material layer 150 a , in accordance with some embodiments. As shown in FIG. 3E , a mask layer 170 is formed over the gate material layer 160 a , in accordance with some embodiments. The mask layer 170 exposes a portion of the gate material layer 160 a , in accordance with some embodiments.

As shown in FIG. 3F , the gate material layer 160 a exposed by the mask layer 170 is removed, and the gate dielectric material layer 150 a under the removed gate material layer 160 a is also removed, in accordance with some embodiments. The gate material layer 160 a and the gate dielectric material layer 150 a remaining under the mask layer 170 form a gate electrode 160 and a gate dielectric layer 150 , in accordance with some embodiments. The gate electrode 160 and the gate dielectric layer 150 together form a gate structure G 2 , in accordance with some embodiments.

FIG. 3F-1 is a top view of the semiconductor device structure of FIG. 3F , in accordance with some embodiments. FIG. 3F is a cross-sectional view illustrating the semiconductor device structure along a sectional line I-I′ in FIG. 3F-1 , in accordance with some embodiments. FIG. 3F-2 is a cross-sectional view illustrating the semiconductor device structure along a sectional line II-II′ in FIG. 3F-1 , in accordance with some embodiments.

As shown in FIG. 3F , the mask layer 170 is removed, in accordance with some embodiments. As shown in FIG. 3F , a spacer layer 180 is formed over sidewalls 162 and 152 of the gate electrode 160 and the gate dielectric layer 150 , in accordance with some embodiments. As shown in FIGS. 3F and 3F-1 , the spacer layer 180 only surrounds the gate structure G 2 over the top surface 111 and does not surround the gate structure G 2 in the semiconductor substrate 110 , in accordance with some embodiments.

As shown in FIGS. 3F and 3F-1 , second type heavily doped regions 118 and 119 are formed in the semiconductor substrate 110 by using a suitable process, such as an ion implantation process. The second type heavily doped regions 118 and 119 are a source region and a drain region, respectively, in accordance with some embodiments. The second type heavily doped regions 118 and 119 are located at the two opposite sides of the gate structure G 2 .

The trenches 113 and 115 and the gate structure G 2 are between the second type heavily doped regions 118 and 119 , in accordance with some embodiments. The trenches 113 and 115 and the gate structure G 2 separate the second type heavily doped region 118 from the second type heavily doped region 119 , in accordance with some embodiments.

The second type heavily doped regions 118 and 119 are doped with second type dopants, in accordance with some embodiments. The second type dopants and the second type heavily doped regions 118 and 119 have a second type conductivity, in accordance with some embodiments. The second type conductivity is different from the first type conductivity, in accordance with some embodiments. The second type conductivity may be an N-type conductivity or a P-type conductivity, in accordance with some embodiments.

The gate structure G 2 , the spacer layer 180 , the first type well 116 , the second type lightly doped regions 117 , and the second type heavily doped regions 118 and 119 together constitute a transistor device 300 , in accordance with some embodiments.

As shown in FIGS. 3F, 3F-1, and 3F-2 , the gate structure G 2 is formed in the trenches 113 and 115 and extends to the top surface 111 , in accordance with some embodiments. The trench 113 has opposite sides 113 a and 113 b , in accordance with some embodiments. The opposite sides 113 a and 113 b respectively face the second type heavily doped regions 118 and 119 , in accordance with some embodiments. The gate structure G 2 in the trench 113 has opposite sides S 1 and S 2 , in accordance with some embodiments. The opposite sides S 1 and S 2 respectively face the second type heavily doped regions 118 and 119 , in accordance with some embodiments.

In some embodiments, a portion P 1 of the gate structure G 2 over the top surface 111 and on the side 113 a or S 1 has a length L 1 . The depth D 1 of the trench 113 or 115 is greater than the length L 1 , in accordance with some embodiments. In some embodiments, a portion P 2 of the gate structure G 2 in the trench 113 has a bottom surface B 1 . In some embodiments, a distance DT 1 between the bottom surface B 1 and the top surface 111 is greater than the length L 1 . In some embodiments, a distance DT 2 between a bottom surface 132 of the isolation structure 130 and the top surface 111 is greater than the distance DT 1 .

In some embodiments, a portion P 0 of the gate structure G 2 over the top surface 111 has a length Lg, a portion P 2 of the gate structure G 2 in the trench 113 has a length L 2 , a portion P 5 of the gate structure G 2 in the trench 115 has a length L 3 , and the length Lg is greater than a sum of the lengths L 2 and L 3 .

As shown in FIGS. 3F-1 and 3F-2 , the gate structure G 2 is partially over the isolation structure 130 , in accordance with some embodiments. As shown in FIGS. 3F, 3F-1, and 3F-2 , the isolation structure 130 surrounds the gate structure G 2 in the trenches 113 and 115 , in accordance with some embodiments. As shown in FIGS. 3F-1 and 3 F- 2 , the isolation structure 130 is in direct contact with the gate structure G 2 (or the gate dielectric layer 150 ), in accordance with some embodiments.

The gate structure G 2 has a sidewall SW, in accordance with some embodiments. The isolation structure 130 has a sidewall 134 , in accordance with some embodiments. The sidewalls SW and 134 face to each other, in accordance with some embodiments. The sidewalls SW and 134 are in direct contact with each other, in accordance with some embodiments. As shown in FIG. 3F , the depth D 1 of the trench 113 is greater than the thickness T 1 of the gate structure G 2 over the top surface 111 , in accordance with some embodiments.

As shown in FIG. 3G , a dielectric layer 190 is formed over the semiconductor substrate 110 , the gate structure G 2 , and the spacer layer 180 , in accordance with some embodiments. As shown in FIG. 3G , portions of the dielectric layer 190 are removed to form through holes 192 , 194 , and 196 in the dielectric layer 190 , in accordance with some embodiments. The through holes 192 , 194 , and 196 respectively expose the gate structure G 2 and the second type heavily doped regions 118 and 119 , in accordance with some embodiments.

As shown in FIG. 3G , conductive structures C 1 , C 2 , and C 3 are respectively formed in the through holes 192 , 194 , and 196 , in accordance with some embodiments. The conductive structures C 1 , C 2 , and C 3 are respectively electrically connected to the gate electrode 160 and the second type heavily doped regions 118 and 119 , in accordance with some embodiments.

The distance DT 5 between the gate structure G 2 in the trench 113 and the gate structure G 2 in the trench 115 is adjustable, and therefore the gate length Lg is adjustable as well, in accordance with some embodiments.

FIGS. 4A-4D are cross-sectional views of various stages of a process for forming a semiconductor device structure, in accordance with some embodiments. As shown in FIG. 4A , after the step of FIG. 3F , a dielectric layer 210 is formed over the top surface 111 and surrounds the gate structure G 2 , in accordance with some embodiments.

As shown in FIG. 4B , the gate structure G 2 is removed to form an opening 182 in the spacer layer 180 , in accordance with some embodiments. As shown in FIG. 4B , a gate dielectric layer 220 is deposited over the dielectric layer 210 and the spacer layer 180 and in the opening 182 and the trenches 113 and 115 , in accordance with some embodiments.

The gate dielectric layer 220 conformally covers the inner walls 182 a of the opening 182 , the top surface 111 exposed by the opening 182 , and the bottom surface 113 c and 115 a and the inner walls 113 d and 115 b of the trenches 113 and 115 , in accordance with some embodiments.

As shown in FIG. 4B , a work function metal layer 230 is deposited over the gate dielectric layer 220 , in accordance with some embodiments. As shown in FIG. 4B , a gate electrode layer 240 (also called a metal gate electrode layer) is deposited over the work function metal layer 230 to fill the opening 182 and the trenches 113 and 115 , in accordance with some embodiments. The gate electrode layer 240 includes a suitable metal material, such as aluminum, tungsten, gold, platinum, cobalt, another suitable metal, an alloy thereof, or a combination thereof, in accordance with some embodiments.

FIG. 4C-1 is a top view of the semiconductor device structure of FIG. 4C , in accordance with some embodiments. For the sake of simplicity, FIG. 4C-1 does not show the dielectric layer 210 , in accordance with some embodiments. FIG. 4C is a cross-sectional view illustrating the semiconductor device structure along a sectional line I-I′ in FIG. 4C-1 , in accordance with some embodiments. FIG. 4C-2 is a cross-sectional view illustrating the semiconductor device structure along a sectional line II-II′ in FIG. 4C-1 , in accordance with some embodiments.

As shown in FIGS. 4C, 4C-1, and 4C-2 , a planarization process is performed to remove the gate electrode layer 240 , the work function metal layer 230 , and the gate dielectric layer 220 outside of the opening 182 and the trenches 113 and 115 , in accordance with some embodiments. In some embodiments, top surfaces 242 , 232 , 222 , 183 , and 212 of the gate electrode layer 240 , the work function metal layer 230 , the gate dielectric layer 220 , the spacer layer 180 , and the dielectric layer 210 are coplanar, in accordance with some embodiments.

The gate electrode layer 240 , the work function metal layer 230 , and the gate dielectric layer 220 in the opening 182 and the trenches 113 and 115 together form a gate structure G 3 (i.e., a metal gate stack), in accordance with some embodiments.

The gate structure G 3 is partially over the isolation structure 130 , in accordance with some embodiments. The isolation structure 130 surrounds the gate structure G 3 in the trenches 113 and 115 , in accordance with some embodiments. The isolation structure 130 is in direct contact with the gate structure G 3 (or the gate dielectric layer 220 ), in accordance with some embodiments. As shown in FIG. 4C , the depth D 1 of the trench 113 is greater than the thickness T 2 of the gate structure G 3 over the top surface 111 , in accordance with some embodiments.

As shown in FIG. 4D , a dielectric layer 250 is formed over the gate structure G 3 , the dielectric layer 210 , and the spacer layer 180 , in accordance with some embodiments. As shown in FIG. 4D , portions of the dielectric layers 210 and 250 are removed to form through holes 252 , 254 , and 256 in the dielectric layers 210 and 250 , in accordance with some embodiments. The through holes 252 , 254 , and 256 respectively expose the gate structure G 3 and the second type heavily doped regions 118 and 119 .

As shown in FIG. 4D , conductive structures 262 , 264 , and 266 may be respectively formed in the through holes 252 , 254 , and 256 . The conductive structures 262 , 264 , and 266 are respectively electrically connected to the gate electrode layer 240 and the second type heavily doped regions 118 and 119 .

FIG. 5 is a cross-sectional view of a semiconductor device structure 500 , in accordance with some embodiments. As shown in FIG. 5 , the semiconductor device structure 500 is similar to the semiconductor device structure 100 of FIG. 1H , except that the semiconductor device structure 500 has an asymmetric structure. The semiconductor device structure 500 does not have the portion P 1 of the gate structure G of the semiconductor device structure 100 of FIG. 1H , in accordance with some embodiments.

In accordance with some embodiments, semiconductor device structures and methods for forming the same are provided. The methods (for forming the semiconductor device structure) form a gate structure penetrating into a semiconductor substrate to separate a source region from a drain region in the semiconductor substrate. Therefore, the gate length is reduced and the break down voltage and the threshold voltage are maintained.

In accordance with some embodiments, a semiconductor device structure is provided. The semiconductor device structure includes a semiconductor substrate having a top surface, a source region, and a drain region. The semiconductor device structure includes a gate structure over the top surface and extending into the semiconductor substrate. The gate structure in the semiconductor substrate is between the source region and the drain region and separates the source region from the drain region. The semiconductor device structure includes an isolation structure in the semiconductor substrate and surrounding the source region, the drain region, and the gate structure in the semiconductor substrate.

In accordance with some embodiments, a semiconductor device structure is provided. The semiconductor device structure includes a semiconductor substrate having a top surface, a source region, and a drain region. The semiconductor device structure includes a gate structure over the top surface and extending into the semiconductor substrate. The gate structure has a first portion and a second portion. The first portion and the second portion extend into the semiconductor substrate. The first portion and the second portion are between the source region and the drain region and separate the source region from the drain region. The semiconductor device structure includes an isolation structure in the semiconductor substrate and surrounding the source region, the drain region, the first portion, and the second portion.

In accordance with some embodiments, a method for forming a semiconductor device structure is provided. The method includes forming a first trench in a semiconductor substrate. The semiconductor substrate has a top surface. The method includes forming a first gate structure over the top surface and in the first trench. The method includes forming a source region and a drain region in the semiconductor substrate. The first trench is between the source region and the drain region and separates the source region from the drain region.

The foregoing outlines features of several embodiments so that those skilled in the art may better understand the aspects of the present disclosure. Those skilled in the art should appreciate that they may readily use the present disclosure as a basis for designing or modifying other processes and structures for carrying out the same purposes and/or achieving the same advantages of the embodiments introduced herein. Those skilled in the art should also realize that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they may make various changes, substitutions, and alterations herein without departing from the spirit and scope of the present disclosure.