Inventor
Manfred Maul
Inventor
Aalen, DE
Overview
Patents· 67 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
G02BOptical elements, systems or apparatus26%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light4%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them4%
G01BMeasuring length, thickness or similar linear dimensions3%
G01MTesting static or dynamic balance of machines or structures3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G05BControl or regulating systems in general3%
PatentTitleYear
10,444,631Method of operating a microlithographic projection apparatus and illumination system of such an apparatus201910,247,949Method for adjusting a display device201910,146,135Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation201810,088,754Illumination system for microlithography201810,054,786Correction of optical elements by correction light irradiated in a flat manner20189,995,938Spectacle lens for a display device that can be fitted on the head of a user and generates an image20189,964,856Illumination optical unit for projection lithography20189,955,563EUV light source for generating a usable output beam for a projection exposure apparatus20189,897,925'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'20189,766,553'Illumination optical unit for projection lithography'20179,753,375'Illumination optical unit for projection lithography'20179,746,779'Illumination optical unit for projection lithography'20179,720,327'Optical system of a microlithographic projection exposure apparatus'20179,606,441'Illumination system for microlithography'20179,575,414'Illumination system for a microlithographic projection exposure apparatus'20179,366,857'Correction of optical elements by correction light irradiated in a flat manner'20169,280,060'Illumination system for microlithography'20169,239,229'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'20169,217,930'Illumination system for a microlithographic projection exposure apparatus'20159,170,499'Illumination system of a microlithographic projection exposure apparatus comprising a depolarizing element'20159,116,441'Illumination system of a microlithographic projection exposure apparatus'20159,052,606'Microlithographic projection exposure apparatus'20159,019,475'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'20159,013,684'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'20159,001,309'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'20158,928,859'Illumination system of a microlithographic projection exposure apparatus'20158,891,057'Microlithographic projection exposure apparatus'20148,873,023'Illumination system for microlithography'20148,811,568'Correction of optical elements by correction light irradiated in a flat manner'20148,760,744'Correction of optical elements by correction light irradiated in a flat manner'20148,730,455'Illumination system for a microlithographic projection exposure apparatus'20148,724,086'Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation'20148,636,386'Filter device for the compensation of an asymmetric pupil illumination'20148,614,843'Correction of optical elements by correction light irradiated in a flat manner'20138,513,628'EUV illumination system with a system for measuring fluctuations of the light source'20138,480,261'Filter device for the compensation of an asymmetric pupil illumination'20138,395,756'Illumination system for a microlithographic projection exposure apparatus'20138,339,577'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'20128,264,668'Illumination system of a microlithographic projection exposure apparatus'20128,246,211'Filter device for the compensation of an asymmetric pupil illumination'20128,169,594'Illumination system of a microlithographic projection exposure apparatus'20128,068,279'Optical system of an illumination device of a projection exposure apparatus'20118,025,427'Filter device for the compensation of an asymmetric pupil illumination'20118,004,656'Illumination system for a microlithographic projection exposure apparatus'20117,995,280'Projection exposure system, beam delivery system and method of generating a beam of light'20117,911,584'Illumination system for microlithography'20117,875,865'EUV illumination system with a system for measuring fluctuations of the light source'20117,847,920'Illumination system and polarizer for a microlithographic projection exposure apparatus'20107,798,676'Filter device for the compensation of an asymmetric pupil illumination'20107,714,983'Illumination system for a microlithography projection exposure installation'20107,593,095'System for reducing the coherence of laser radiation'20097,570,345'Method of optimizing imaging performance'20097,542,217'Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus'20097,511,886'Optical beam transformation system and illumination system comprising an optical beam transformation system'20097,408,622'Illumination system and polarizer for a microlithographic projection exposure apparatus'20087,382,536'Objective with fluoride crystal lenses'20087,233,386'Method of optimizing imaging performance'20077,180,667'Objective with fluoride crystal lenses'20077,170,585'Projection lens and microlithographic projection exposure apparatus'20077,145,720'Objective with fluoride crystal lenses'20067,126,765'Objective with fluoride crystal lenses'20067,031,069'Microlithographic illumination method and a projection lens for carrying out the method'20066,879,379'Projection lens and microlithographic projection exposure apparatus'20056,728,043'Microlithographic illumination method and a projection lens for carrying out the method'20046,535,273'Microlithographic illumination system with depolarizer'20035,504,620'Device for dividing an optical beam'19965,357,375'Symmetrical prism beam deflector'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–1996Based in Sulzbach, DE· patent location history
2003–2019Based in Aalen, DE· patent location history
2005–2011Patents assigned to ZEISS CARL SMT AG (17)· patent assignee history
2011–2019Patents assigned to ZEISS CARL SMT GMBH (43)· patent assignee history
2011–2015Patents assigned to MAUL MANFRED (16)· patent assignee history
2011–2015Patents assigned to FIOLKA DAMIAN (10)· patent assignee history
2012–2015Patents assigned to DEGUENTHER MARKUS (7)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT GMBH | 43 | 2011–2019 |
| ZEISS CARL SMT AG | 17 | 2005–2011 |
| MAUL MANFREDself | 16 | 2011–2015 |
| FIOLKA DAMIAN | 10 | 2011–2015 |
| DEGUENTHER MARKUS | 7 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Aalen, DE | 65 | 2003–2019 |
| Sulzbach, DE | 2 | 1994–1996 |