A system, comprising:nan optical arrangement configured to image light to an image field of the optical arrangement; anda device, comprising:na correction light source configured to provide correction light, the correction light having a wavelength which is different from a wavelength of the light imaged by the optical arrangement; anda mirror arrangement configured to deflect the correction light from the correction light source to an optical element of the optical arrangement such that a first part of a surface of the optical element of the optical arrangement is irradiated with the correction light in a locally variable fashion and/or temporally variable fashion,wherein:nthe light imaged to the image field of the optical arrangement strikes a second part of the surface of the optical element of the optical arrangement;the correction light imaged to the image field of the optical arrangement strikes the first part at an angle such that an obtuse angle between an optical axis of the optical arrangement at the location of the optical element and the correction light beam is less than or equal to 105°;the correction light beam strikes the first part of the surface of the optical element of the optical arrangement to heat the optical element for a period of time in which the optical element is unevenly heated by the light imaged to the image field;the first part of the surface of the optical element is different from the second part of the surface of the optical element; andthe system is a projection exposure system for microlithography.
›11.↳ 10The system in accordance with claim 10, wherein the mirror arrangement comprises a plurality of mirror elements arranged side by side, and the plurali…d2
The system in accordance with claim 10, wherein the mirror arrangement comprises a plurality of mirror elements arranged side by side, and the plurality of mirror elements can be swivelled separately from each other.
›12.↳ 10The system in accordance with claim 10, wherein the device further comprises a grating, andnwherein the grating is between the correction light source…d2
The system in accordance with claim 10, wherein the device further comprises a grating, andnwherein the grating is between the correction light source and the mirror arrangement, and/or the grating is between the mirror arrangement and the optical element of the optical arrangement.
›13.↳ 10The system in accordance with claim 10, wherein:nthe mirror arrangement comprises a mirror array including a mirror surface; andone of the following h…d2
The system in accordance with claim 10, wherein:nthe mirror arrangement comprises a mirror array including a mirror surface; andone of the following holds:nthe mirror surface can be continuously rotated about an axis parallel to the mirror surface;the mirror surface can be swivelled in an oscillating manner;the mirror surface can be displaced that the correction light can be moved along a line on the surface of the optical element of the optical arrangement.
›14.↳ 10The system in accordance with claim 10, wherein the device further comprises a scanning device, the mirror arrangement is configured to move the corre…d2+1
The system in accordance with claim 10, wherein the device further comprises a scanning device, the mirror arrangement is configured to move the correction light on the surface of the optical element of the optical arrangement, and the scanning device is configured to move the correction light along a line on the surface of the optical element of the optical arrangement.
›15.↳ 14The system in accordance with claim 14, wherein the line of movement due to the scanning device is transverse or perpendicular to the movement due to …d3
The system in accordance with claim 14, wherein the line of movement due to the scanning device is transverse or perpendicular to the movement due to the mirror arrangement.
›16.↳ 10The system in accordance with claim 10, wherein the correction light is anamorphic correction light.d2
The system in accordance with claim 10, wherein the correction light is anamorphic correction light.
›17.↳ 10The system in accordance with claim 10, wherein the device further comprises a scanning device configured to achieve focus trackingd2
The system in accordance with claim 10, wherein the device further comprises a scanning device configured to achieve focus tracking
›18.↳ 10The system in accordance with claim 10, wherein focus tracking is provided separately in the light beam of the correction light.d2
The system in accordance with claim 10, wherein focus tracking is provided separately in the light beam of the correction light.
›19.↳ 10The system in accordance with claim 10, wherein the device further comprises an optical correction light arrangement in a path of the correction light…d2
The system in accordance with claim 10, wherein the device further comprises an optical correction light arrangement in a path of the correction light, the optical correction light arrangement comprising an optical element selected from the group consisting of lenses, mirrors and diffractive optical elements.
›20.↳ 10The system in accordance with claim 10, wherein the device further comprises a component selected from the group consisting of a regulator, an output …d2
The system in accordance with claim 10, wherein the device further comprises a component selected from the group consisting of a regulator, an output regulator and an acoustic-optical modulator, wherein the component is configured to exert open-loop and/or closed-loop control on the correction light depending on the location of the correction light beam on the surface of the optical element of the optical arrangement.
›21.↳ 10The system in accordance with claim 10, wherein the device further comprises a sensor and a control device, wherein:nthe control device is selected fr…d2
The system in accordance with claim 10, wherein the device further comprises a sensor and a control device, wherein:nthe control device is selected from the group consisting of an open-loop control device and a closed-loop control device; andbased on measurement by the sensor, the control device is configured to exert control over a working parameter selected from a group consisting of correction light irradiation duration, correction light irradiation locations, correction light intensity, and correction light source output.
›22.↳ 10The system in accordance with claim 10, wherein the correction light source is selected from the group consisting of an infrared light source, a light…d2
The system in accordance with claim 10, wherein the correction light source is selected from the group consisting of an infrared light source, a light source configured to generate light having a wavelength greater than or equal to 4 μm, and a CO2 laser.
›23.↳ 10The system of claim 10, wherein the device further comprises an optical correction light arrangement in a path of the correction light, the optical co…d2
The system of claim 10, wherein the device further comprises an optical correction light arrangement in a path of the correction light, the optical correction light arrangement comprising:ntwo optical elements selected from the group consisting of lenses, mirrors and diffractive optical elements; anda diaphragm.
›24.↳ 10The system of claim 10, wherein the device is configured so that, during use of the system, the correction light corrects imaging errors in the optica…d2
The system of claim 10, wherein the device is configured so that, during use of the system, the correction light corrects imaging errors in the optical arrangement.
›25.↳ 10The system of claim 10, wherein an angle at which the correction light strikes the first part of the surface of the optical element of the optical arr…d2+1
The system of claim 10, wherein an angle at which the correction light strikes the first part of the surface of the optical element of the optical arrangement is such that the correction light strikes no other optical elements in the optical arrangement.
›26.↳ 25The system of claim 25, wherein the device is configured so that, during use of system, the correction light provides lateral irradiation of the optic…d3
The system of claim 25, wherein the device is configured so that, during use of system, the correction light provides lateral irradiation of the optical element without impairment of the optical arrangement.
›27.↳ 10The system of claim 10, wherein the device is configured so that, during use of system, the correction light provides lateral irradiation of the optic…d2
The system of claim 10, wherein the device is configured so that, during use of system, the correction light provides lateral irradiation of the optical element without impairment of the optical arrangement.
