Inventor
Mitsunori Nakamori
Inventor
Nirasaki, JP
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1040%
B08BCleaning in general14%
H01LSemiconductor devices14%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
B01DSeparation2%
B24BMachines, devices, or processes for grinding or polishing2%
B29CShaping or joining of plastics2%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts2%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering2%
PatentTitleYear
10,867,814Liquid processing method, substrate processing apparatus, and storage medium202010,727,042Liquid processing method, substrate processing apparatus and recording medium202010,366,877Substrate processing method and substrate processing apparatus201910,325,771Substrate processing method and substrate processing apparatus201910,026,629Substrate liquid processing apparatus, substrate liquid processing method, and computer-readable storage medium storing substrate liquid processing program20189,953,840Substrate processing method and substrate processing system20189,095,953'Apparatus for polishing rear surface of substrate, system for polishing rear surface of substrate, method for polishing rear surface of substrate and recording medium having program for polishing rear surface of substrate'20158,978,671'Substrate processing method and substrate processing apparatus'20158,617,656'Liquid processing apparatus, liquid processing method, and storage medium'20138,043,469'Substrate processing method, substrate processing apparatus, and storage medium'20117,914,626'Liquid processing method and liquid processing apparatus'20117,767,006'Ozone processing apparatus and ozone processing method'20107,731,799'Substrate processing method, substrate processing apparatus and computer-readable memory medium'20107,693,597'Computer readable storage medium for controlling substrate processing apparatus'20106,979,655'Substrate processing method and substrate processing apparatus'20056,863,741'Cleaning processing method and cleaning processing apparatus'20056,589,338'Device for processing substrate'20036,348,157'Cleaning method'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002Based in Miyagi, JP· patent location history
2003–2020Patents assigned to TOKYO ELECTRON LTD (16)· patent assignee history
2003Based in Tosu, JP· patent location history
2005–2013Based in Nirasaki, JP· patent location history
2013–2015Patents assigned to NAKAMORI MITSUNORI (3)· patent assignee history
2013Patents assigned to FUJITA AKIRA (1)· patent assignee history
2015Patents assigned to ORII TAKEHIKO (2)· patent assignee history
2015Patents assigned to MARUYAMA HIROTAKA (1)· patent assignee history
2015–2020Based in Koshi, JP· patent location history
2018–2020Based in Kumamoto, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 16 | 2003–2020 |
| NAKAMORI MITSUNORIself | 3 | 2013–2015 |
| ORII TAKEHIKO | 2 | 2015 |
| FUJITA AKIRA | 1 | 2013 |
| MARUYAMA HIROTAKA | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nirasaki, JP | 8 | 2005–2013 |
| Kumamoto, JP | 5 | 2018–2020 |
| Koshi, JP | 3 | 2015–2020 |
| Tosu, JP | 1 | 2003 |
| Miyagi, JP | 1 | 2002 |