Inventor
Katsuyuki Hishiya
Inventor
Oshu, JP
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
LOC1323%
C23CCoating metallic material15%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
H01LSemiconductor devices10%
H01JElectric discharge tubes or discharge lamps8%
F27BFurnaces, kilns, ovens or retorts in general5%
H05HPlasma technique3%
PatentTitleYear
10,550,467Film formation apparatus202010,519,550Film formation apparatus20199,932,674Film deposition apparatus, film deposition method, and computer-readable recording medium20189,702,043'Substrate processing apparatus'20179,453,280'Film deposition apparatus, film deposition method and storage medium'20169,062,373'Film deposition apparatus'20159,048,273'Substrate conveying container opening/closing device, lid opening/closing device and semiconductor manufacturing apparatus'20158,414,242'Processing apparatus and processing method'20138,231,381'Processing system for process object and thermal processing method for process object'20128,181,769'Workpiece transfer mechanism, workpiece transfer method and workpiece processing system'2012D0655262'Side wall for reactor for manufacturing semiconductor'2012D0655257'Top plate for reactor for manufacturing semiconductor'2012D0655261'Gas-separating plate for reactor for manufacturing semiconductor'2012D0655260'Gas-separating plate for reactor for manufacturing semiconductor'2012D0655259'Top plate for reactor for manufacturing semiconductor'2012D0655258'Side wall for reactor for manufacturing semiconductor'2012D0654884'Top plate for reactor for manufacturing semiconductor'2012D0654883'Top plate for reactor for manufacturing semiconductor'2012D0654882'Gas-separating plate for reactor for manufacturing semiconductor'20127,922,485'Vertical type heat processing apparatus and vertical type heat processing method'20117,896,648'Vertical heat processing apparatus and heat processing method using the vertical heat processing apparatus'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011–2020Patents assigned to TOKYO ELECTRON LTD (21)· patent assignee history
2011–2019Based in Oshu, JP· patent location history
2012–2018Patents assigned to HISHIYA KATSUYUKI (16)· patent assignee history
2012Patents assigned to HONMA MANABU (9)· patent assignee history
2015–2018Patents assigned to KATO HITOSHI (3)· patent assignee history
2015–2018Patents assigned to USHIKUBO SHIGEHIRO (3)· patent assignee history
2015–2020Based in Iwate, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 21 | 2011–2020 |
| HISHIYA KATSUYUKIself | 16 | 2012–2018 |
| HONMA MANABU | 9 | 2012 |
| KATO HITOSHI | 3 | 2015–2018 |
| USHIKUBO SHIGEHIRO | 3 | 2015–2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Oshu, JP | 16 | 2011–2019 |
| Iwate, JP | 5 | 2015–2020 |