USPatentGranted
S1

Top plate for reactor for manufacturing semiconductor

Granted 28 Feb 2012 · no office action yet

Application
29/389,562
filed 13 Apr 2011
Publication
Not published
not published
Patent· this page
US D654884
granted 28 Feb 2012

Life of the patent

2 dated events
⤢ drag to zoomApr 2011Jul 2011Oct 2011Jan 2012Apr 2012Prosecution
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Description

1 parts
›FIG. 1 is front perspective view of a…

FIG. 1 is front perspective view of a top plate for reactor for manufacturing semiconductor illustrating our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom view thereof;

FIG. 8 is a reference front view indicating the plane upon which a sectional view is taken; and,

FIG. 9 is a sectional view taken along line 9 - 9 - 9 of FIG. 8 .

the grant prints no section headings; every part label below is ours, taken from that part's own first words

Claims

1 · 1 independent · depth 1
1 granted claims

Classifications

1 codes
USPC · US Patent Classification
D13/182

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File wrapper

Pendency
0.9 y
321 days filing → grant
Office actions
0
none on record
Examiner
Selina Sikder
art unit 2912 · TC 2900
Citations: 6 back · 0 forward

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Chain of title

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Worldwide family

2 members · 2 offices
US1TW1
this patentIP5 & PCTother officessolid = grantedhover for detail · click to open
Members
2
DOCDB simple family 45694811
Offices
2
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Granted
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Non-English titles
1
shown as filed, never translated
›IP5 & PCT — 1 members
OfficePublicationKindPublishedFiledStatusTitle
USthis patentUS-D654884-SS128 Feb 201213 Apr 2011grantedTop plate for reactor for manufacturing semiconductor
›Other offices — 1 members
OfficePublicationKindPublishedFiledStatusTitle
TWTW-D146035-SS21 Mar 201214 Apr 2011published半導體製造用反應爐之上盤(一)zh

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