Inventor
Reiko Kimura
Inventor
Tokyo, JP
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices44%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
C07CAcyclic or carbocyclic compounds6%
H01LSemiconductor devices6%
PatentTitleYear
9,170,488'Resist pattern-forming method, and radiation-sensitive resin composition'20159,164,387'Pattern-forming method, and radiation-sensitive resin composition'20159,122,163'Pattern-forming method, and radiation-sensitive resin composition'20159,046,765'Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist film'20158,795,954'Resist pattern-forming method, and radiation-sensitive resin composition'20148,609,321'Radiation-sensitive resin composition, polymer and compound'20138,609,318'Radiation-sensitive resin composition, method for forming resist pattern and polymer'20138,609,319'Radiation-sensitive resin composition and resist film formed using the same'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2015Patents assigned to JSR CORP (7)· patent assignee history
2013Patents assigned to KIMURA REIKO (2)· patent assignee history
2013Patents assigned to NAKASHIMA HIROMITSU (2)· patent assignee history
2013Patents assigned to HORI MASAFUMI (1)· patent assignee history
2013Patents assigned to JSP CORP (1)· patent assignee history
2013–2015Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JSR CORP | 7 | 2013–2015 |
| KIMURA REIKOself | 2 | 2013 |
| NAKASHIMA HIROMITSU | 2 | 2013 |
| HORI MASAFUMI | 1 | 2013 |
| JSP CORP | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 8 | 2013–2015 |