A pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed. A developer solution used in developing the exposed resist film includes no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a first polymer and a radiation-sensitive acid generator. The first polymer includes a first structural unit having an acid-labile group and an alicyclic group. The alicyclic group is capable of avoiding dissociation from a molecular chain by an action of an acid.

Claims

12 · 1 independent · depth 3

12 granted claims

›1.independentA pattern-forming method comprising:ncoating a radiation-sensitive resin composition on a substrate to provide a resist film;exposing the resist film;…+11

›2.↳ 1The pattern-forming method according to claim 1, wherein A in the above formula (1) is a group derived from adamantane or norbornane by removing 2 to …d2

›3.↳ 1The pattern-forming method according to claim 1, wherein the radiation-sensitive resin composition further comprises a second polymer having a content…d2

›4.↳ 1The pattern-forming method according to claim 1 further comprising etching the developed resist film.d2

›5.↳ 1The pattern-forming method according to claim 1, wherein the ring represented by R3 and R4 together with the carbon atom to which R3 and R4 bond is a …d2+1

›7.↳ 1The pattern-forming method according to claim 1, wherein X in the formula (1) is a single bond, an oxyethylene group or an oxymethylene group.d2

›8.↳ 1The pattern-forming method according to claim 1, wherein an amount of the first structural unit in the first polymer is from 30 mol % to 60 mol % base…d2

›9.↳ 1The pattern-forming method according to claim 1, wherein the first polymer further comprises a second structural unit represented by a formula (2),d2+1

›11.↳ 1The pattern-forming method according to claim 1, wherein the first polymer further comprises a third structural unit having a lactone ring.d2+1

Classifications

7 codes

IPC · International Patent Classification

Section C — Chemistry; metallurgy

C08F220/28
C08F20/28

Section G — Physics

G03F7/32
G03F7/039
G03F7/11
G03F7/20
G03F7/004

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Daborah Chacko Davis

art unit 1722 · TC 1700

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Type	Document	Date
related publication	US 20130224661 A1	29 Aug 2013

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