Inventor
Setsuo Nakajima
Inventor
Kanagawa, JP
Overview
Patents· 118 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices31%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation5%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution4%
H10KOrganic electric solid-state devices3%
Y02PClimate change mitigation technologies in the production or processing of goods3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
G09GArrangements or circuits for control of indicating devices using static means to present variable information2%
PatentTitleYear
9,721,733'Method for forming a dye-sensitized solar cell having a porous film of an inorganic substance on a base material by spraying dry fine particles of an inorganic substance on the base material'20179,640,630'Semiconductor device and method of manufacturing the semiconductor device'20179,099,355'Semiconductor device and method of fabricating the same'20159,041,875'Semiconductor device and method of manufacturing the semiconductor device'20158,654,270'Semiconductor device and method of manufacturing the semiconductor device'20148,563,979'Method for producing display device'20138,547,516'Display device and method of fabricating the same'20138,389,342'Method for manufacturing a semiconductor device'20138,188,478'Semiconductor device and method of fabricating the same'20128,023,055'Semiconductor device and method of manufacturing the semiconductor device'20118,012,782'Method for producing display device'20118,013,972'Display device and method of fabricating the same'20118,003,989'Thin film semiconductor device having a terminal portion'20117,973,312'Semiconductor device and method of fabricating the same'20117,903,229'Display device and method of fabricating the same'20117,886,688'Plasma processing apparatus'20117,886,689'Plasma processing apparatus'20117,862,677'Display device and method of manufacturing the same'20117,819,081'Plasma film forming system'20107,776,663'Semiconductor display devices'20107,759,181'Method of manufacturing a semiconductor device'20107,709,302'Method for manufacturing a semiconductor device'20107,705,354'Semiconductor device and method for fabricating the same'20107,675,060'Semiconductor device and method for producing it'20107,655,513'Method of manufacturing a semiconductor device'20107,635,866'Semiconductor device and its manufacturing method'20097,588,981'Semiconductor device and manufacturing method thereof'20097,485,898'Method of manufacturing semiconductor devices'20097,483,091'Semiconductor display devices'20097,453,088'Electro-optical device and manufacturing method thereof'20087,446,843'Display device and method of fabricating the same'20087,410,847'Semiconductor device having semiconductor circuit formed by semiconductor elements and method for manufacturing the same'20087,351,617'Semiconductor device and a method of manufacturing the same'20087,320,905'Semiconductor device provided with semiconductor circuit made of semiconductor element and method of fabricating the same'20087,291,523'Method of manufacturing a semiconductor device'20077,271,858'Method for producing display-device'20077,247,882'Display device'20077,244,962'Method of manufacturing semiconductor devices'20077,229,861'Method for producing semiconductor device'20077,217,952'Method of manufacturing a semiconductor device and semiconductor manufacturing apparatus'20077,217,605'Laser irradiation method and method of manufacturing a semiconductor device'20077,214,555'Method for producing display device'20077,202,499'Semiconductor device including two transistors and capacitive part'20077,192,817'Method for manufacturing a semiconductor device'20077,173,280'Electro-optical device and manufacturing method thereof'20077,141,462'Substrate of semiconductor device and fabrication method thereof as well as semiconductor device and fabrication method thereof'20067,129,522'Semiconductor device and its manufacturing method'20067,098,088'Semiconductor device having semiconductor circuit formed by semiconductor elements and method for manufacturing the same'20067,095,090'Photoelectric conversion device'20067,087,504'Method of manufacturing a semiconductor device by irradiating with a laser beam'20067,060,153'Display device and method of manufacturing the same'20067,050,138'Method of manufacturing a display device having a driver circuit attached to a display substrate'20067,037,779'Semiconductor device and manufacturing method thereof'20067,026,197'Method of fabricating semiconductor device'20067,015,083'Method of manufacturing a semiconductor device'20066,977,393'Electro-optical device and manufacturing method thereof'20056,960,787'Semiconductor device and method for manufacturing the same'20056,955,956'Method of manufacturing a semiconductor device'20056,893,503'Method of manufacturing a semiconductor device'20056,888,160'Semiconductor device and fabrication method thereof'20056,855,584'Method of manufacturing a semiconductor device'20056,838,324'Semiconductor device provided with semiconductor circuit made of semiconductor element and method of fabricating the same'20056,835,675'Laser-irradiation method and laser-irradiation device'20046,835,986'Liquid crystal display device and manufacturing method thereof'20046,815,273'Method of manufacturing semiconductor devices'20046,806,495'Semiconductor device and method of fabricating the same'20046,803,601'Semiconductor device and process for production thereof'20046,794,681'Substrate of semiconductor device and fabrication method thereof as well as semiconductor device and fabrication method thereof'20046,791,112'Electro-optical device and manufacturing method thereof'20046,791,111'Semiconductor device'20046,780,687'Method of manufacturing a semiconductor device having a heat absorbing layer'20046,762,082'Semiconductor device and method of fabricating the same'20046,737,717'Thin-film transistor having lightly-doped drain structure'20046,727,124'Method of manufacturing a TFT using a catalytic element to promote crystallization of a semiconductor film and gettering the catalytic element'20046,720,576'Plasma processing method and photoelectric conversion device'20046,706,568'Method for manufacturing a semiconductor device with a crystallized semiconductor film leveled by radiating with laser beams'20046,700,134'Semiconductor device provided with semiconductor circuit consisting of semiconductor element and method of manufacturing the same'20046,664,144'Method of forming a semiconductor device using a group XV element for gettering by means of infrared light'20036,621,636'Laser irradiation apparatus and method of laser irradiation'20036,603,453'Semiconductor device and method for manufacturing the same'20036,599,790'Laser-irradiation method and laser-irradiation device'20036,600,197'Thin film transistor having a heat sink that exhibits a high degree of heat dissipation effect'20036,518,594'Semiconductor devices'20036,512,271'Semiconductor device'20036,501,094'Semiconductor device comprising a bottom gate type thin film transistor'20026,479,333'Method of manufacturing a semiconductor device'20026,479,329'Method for producing semiconductor device'20026,462,723'Semiconductor device and method for manufacturing the same'20026,455,359'Laser-irradiation method and laser-irradiation device'20026,420,758'Semiconductor device having an impurity region overlapping a gate electrode'20026,380,011'Semiconductor device and a method of manufacturing the same'20026,359,320'Thin-film transistor with lightly-doped drain'20026,291,837'Substrate of semiconductor device and fabrication method thereof as well as semiconductor device and fabrication method thereof'20016,261,881'Semiconductor device provided with semiconductor circuit consisting of semiconductor element and method of manufacturing the same'20016,246,070'Semiconductor device provided with semiconductor circuit made of semiconductor element and method of fabricating the same'20016,242,289'Method for producing semiconductor device'20016,242,290'Method of forming a TFT by adding a metal to a silicon film promoting crystallization, forming a mask, forming another silicon layer with group XV elements, and gettering the metal through opening in the mask'20016,229,531'Active matrix display device'20016,165,824'Method of manufacturing a semiconductor device'20006,118,502'Using a temporary substrate to attach components to a display substrate when fabricating a passive type display device'20006,108,056'Active matrix electro-optical device'20005,986,306'Thin film transistor having a heat sink that exhibits a high degree of heat dissipation effect'19995,982,348'Active matrix electro-optical device'19995,937,282'Method for producing semiconductor device'19995,891,264'Solar cell and method for producing electrode for solar cell'19995,847,410'Semiconductor electro-optical device'19985,834,327'Method for producing display device'19985,821,597'Photoelectric conversion device'19985,757,456'Display device and method of fabricating involving peeling circuits from one substrate and mounting on other'19985,712,191'Method for producing semiconductor device'19985,711,824'Solar cell'19985,627,404'Semiconductor device provided on an organic resin substrate'19975,458,695'Solar cell and process for fabricating the same'19955,453,134'Solar cell'19955,427,961'Semiconductor device and method for forming the same'19955,348,589'Solar cell and method of forming the same'19944,578,274'Process for preparing granular food products'19864,279,932'Edible laminar sheet material and method of preparation'1981Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2017Patents assigned to SEMICONDUCTOR ENERGY LAB (108)· patent assignee history
1994–2017Based in Kanagawa, JP· patent location history
1998–2006Patents assigned to TDK CORP (5)· patent assignee history
1999–2007Patents assigned to SHARP KK (8)· patent assignee history
2002–2008Based in Kanagwa, JP· patent location history
2003–2015Based in Atsugi, JP· patent location history
2007–2010Based in Sagamihara, JP· patent location history
2010–2017Patents assigned to SEKISUI CHEMICAL CO LTD (4)· patent assignee history
2010–2011Based in Hachioji, JP· patent location history
2012–2017Patents assigned to NAKAJIMA SETSUO (7)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEMICONDUCTOR ENERGY LAB | 108 | 1994–2017 |
| SHARP KK | 8 | 1999–2007 |
| NAKAJIMA SETSUOself | 7 | 2012–2017 |
| TDK CORP | 5 | 1998–2006 |
| SEKISUI CHEMICAL CO LTD | 4 | 2010–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 89 | 1994–2017 |
| Atsugi, JP | 18 | 2003–2015 |
| Hachioji, JP | 3 | 2010–2011 |
| Sagamihara, JP | 3 | 2007–2010 |
| Kanagwa, JP | 2 | 2002–2008 |