Inventor

John A. Notte, IV

Inventor

Gloucester, MA, US

Overview

2003–2019

Patent span

Electricity

Primary field (CPC H)

Patents· 56 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary

H01JElectric discharge tubes or discharge lamps54%

B82YSpecific uses or applications of nanostructures20%

G01NInvestigating or analysing materials by determining their chemical or physical properties8%

G21KHandling of particles or ionising radiation not otherwise provided for8%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h102%

B03CMagnetic or electrostatic separation of solid materials from solid materials or fluids1%

C23CCoating metallic material1%

F25DRefrigerators1%

G01BMeasuring length, thickness or similar linear dimensions1%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices1%

PatentTitleYear

10,410,828Charged particle beam system and methods2019 10,354,830Charged particle beam system2019 10,037,862Charged particle detecting device and charged particle beam system with same2018 9,640,364'Charged particle beam system and method of operating a charged particle beam system'2017 9,627,172'Charged particle beam system and method of operating a charged particle beam system'2017 9,536,699'Charged particle beam system and method of operating a charged particle beam system'2017 9,530,612'Charged particle beam system and method of operating a charged particle beam system'2016 9,530,611'Charged particle beam system and method of operating a charged particle beam system'2016 9,236,225'Ion sources, systems and methods'2016 9,218,935'Charged particle beam system and method of operating a charged particle beam system'2015 9,218,934'Charged particle beam system and method of operating a charged particle beam system'2015 9,159,527'Systems and methods for a gas field ionization source'2015 9,029,765'Ion sources, systems and methods'2015 9,012,867'Ion sources, systems and methods'2015 9,000,396'Charged particle detectors'2015 8,993,981'Charged particle source with light monitoring for tip temperature determination'2015 8,907,277'Reducing particle implantation'2014 8,766,210'Variable energy charged particle systems'2014 8,748,845'Ion sources, systems and methods'2014 8,669,525'Sample inspection methods, systems and components'2014 8,648,299'Isotope ion microscope methods and systems'2014 8,633,451'Ion sources, systems and methods'2014 8,563,954'Ion beam stabilization'2013 8,558,192'Gas delivery system with voltage gradient for an ion microscope'2013 8,461,557'Ion sources, systems and methods'2013 8,399,834'Isotope ion microscope methods and systems'2013 8,314,403'Gas field ion source with coated tip'2012 8,227,753'Multiple current charged particle methods'2012 8,124,941'Increasing current in charged particle sources and systems'2012 8,110,814'Ion sources, systems and methods'2012 8,093,563'Ion beam stabilization'2012 8,013,300'Sample decontamination'2011 7,804,068'Determining dopant information'2010 7,786,452'Ion sources, systems and methods'2010 7,786,451'Ion sources, systems and methods'2010 7,745,801'Ion sources, systems and methods'2010 7,601,953'Systems and methods for a gas field ion microscope'2009 7,557,359'Ion sources, systems and methods'2009 7,557,358'Ion sources, systems and methods'2009 7,557,361'Ion sources, systems and methods'2009 7,557,360'Ion sources, systems and methods'2009 7,554,097'Ion sources, systems and methods'2009 7,554,096'Ion sources, systems and methods'2009 7,521,693'Ion sources, systems and methods'2009 7,518,122'Ion sources, systems and methods'2009 7,511,279'Ion sources, systems and methods'2009 7,511,280'Ion sources, systems and methods'2009 7,504,639'Ion sources, systems and methods'2009 7,495,232'Ion sources, systems and methods'2009 7,488,952'Ion sources, systems and methods'2009 7,485,873'Ion sources, systems and methods'2009 7,348,556'Method of measuring three-dimensional surface roughness of a structure'2008 6,926,935'Proximity deposition'2005 6,891,167'Apparatus and method for applying feedback control to a magnetic lens'2005 6,812,462'Dual electron beam instrument for multi-perspective'2004 6,515,287'Sectored magnetic lens and method of use'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2005Based in Windham, NH, US· patent location history

2004–2019Based in Gloucester, MA, US· patent location history

2009–2012Patents assigned to ALIS CORP (19)· patent assignee history

2012–2014Patents assigned to NOTTE IV JOHN A (9)· patent assignee history

2012–2015Patents assigned to WARD BILLY W (7)· patent assignee history

2013–2019Patents assigned to CARL ZEISS MICROSCOPY LLC (25)· patent assignee history

2013–2015Patents assigned to NOTTE IV JOHN (7)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CARL ZEISS MICROSCOPY LLC	25	2013–2019
ALIS CORP	19	2009–2012
NOTTE IV JOHN Aself	9	2012–2014
NOTTE IV JOHNself	7	2013–2015
WARD BILLY W	7	2012–2015

Locations

Location	Patents	Span
Gloucester, Massachusetts, US	54	2004–2019
Windham, NH, US	2	2003–2005