Inventor

Yuki Tanaka

Inventor
Tokyo, JP

Overview

62→
Patents
2001–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 62 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Kprimary
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients5%
G05DSystems for controlling or regulating non-electric variables5%
H01LSemiconductor devices5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
Y10TTechnical subjects covered by former us classification4%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
G02BOptical elements, systems or apparatus4%
C08LCompositions of macromolecular compounds3%
H10DInorganic electric semiconductor devices3%
B24BMachines, devices, or processes for grinding or polishing3%
PatentTitleYear
11,109,593Isoxazolin-5-one derivative and herbicide containing same as active ingredient202110,844,904Workpiece transport control system and motion guidance device202010,775,795Navigation system, navigation method, and recording medium202010,738,827Management system and motion guidance device202010,705,545Fluid control device and flow rate ratio control device202010,697,912Gas detection method and gas detector202010,679,984Semiconductor device and method for forming the semiconductor device202010,597,631Green algae mutant exhibiting resistance to intense light, and use thereof202010,578,774Retardation-increasing agent, cellulose-based resin composition using same, and film202010,474,924Information processing system, image processing apparatus, storage medium and information processing method201910,457,711Dermatophagoides farinae protein201910,442,413Brake control apparatus201910,447,053Terminal201910,410,978Semiconductor wafer and method for forming semiconductor201910,307,885Method for raising polishing pad and polishing method201910,302,476Flow rate control device201910,276,916Antenna device201910,210,008Control server, service providing system, and method of providing a virtual infrastructure201910,118,272Method for evaluating polishing pad and method for polishing wafer201810,020,373Semiconductor device20189,941,124Semiconductor device20189,823,667'Flow rate control apparatus, storage medium storing program for flow rate control apparatus and flow rate control method'20179,804,314'Stretched optical compensation film'20179,764,443'Method of producing carrier for use in double-side polishing apparatus and method of double-side polishing wafers'20179,732,226'Azo compound, ink containing azo compound, and display and electronic paper containing the ink'20179,708,498'Azo compound, ink containing azo compound, display including said ink and electronic paper'20179,698,217'Semiconductor device'20179,618,943'Fluid control system'20179,586,987'Primer set for isothermal amplication of a target nucleic acid sequence'20179,417,360'Stretched optical compensation film'20169,334,392'Cellulose resin composition'20169,304,030'Flow rate control device'20169,266,215'Method of double-side polishing wafer'20169,237,094'Communication system, control apparatus, path controlling method and program'20169,200,171'AZO compound and ink containing the compound'20159,197,555'Communication system, controller, node controlling method and program'20159,178,055'Semiconductor device'20159,136,369'Semiconductor device'20159,081,388'Flow rate control device'20159,070,008'Object recognition apparatus and dictionary data registration method'20159,044,830'Method for forming cavity, apparatus for forming cavity, method for manufacturing circuit board, and circuit board'20158,968,611'Process for solidification of phosphoric ester-based flame retardants'20158,562,398'Airflow diffuser (diffuser fan) and air conditioner'2013D0683075'Hand dryer'20138,372,774'Photocatalyst-coated body and photocatalytic coating liquid therefor'20138,356,623'Mass flow meter and mass flow controller'20138,331,120'Offset removal circuit, associative memory including the same, and offset voltage removal method'20128,265,795'Mass flow controller'20128,260,898'Mobile terminal mail system, mobile terminal mail control method, and mobile terminal mail control program'20128,216,959'Photocatalyst-coated body, coating composition for the same, and process for producing photocatalyst-coated body'20128,207,079'Photocatalyst-coated body and photocatalytic coating liquid therefor'20128,016,652'Airflow diffuser (diffuser fan) and air conditioner'20117,977,270'Photocatalyst-coated body and photocatalytic coating liquid therefor'20117,957,171'Associative memory and searching system using the same'20117,857,991'Dichroic dye composition, and liquid-crystal composition and liquid-crystal element including dichroic dye'2010D0627043'Air conditioner'2010D0621492'Air conditioner'20107,746,678'Amplifier circuit and associative memory'20107,465,761'Flame retardant composition with improved fluidity, flame retardant resin composition and molded products'20087,101,497'Photochromic material and color dose meter using the same'20066,419,859'Mold assembly for forming ophthalmic lens or lens blank and method of producing the same using the mold assembly'20026,224,467'Method of producing ocular lens and holders for holding lens blank during cutting thereof'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2019Patents assigned to TANAKA YUKI (17)· patent assignee history
2008–2020Patents assigned to ADEKA CORP (6)· patent assignee history
2008–2020Based in Saitama, JP· patent location history
2010–2021Based in Kanagawa, JP· patent location history
2012–2020Patents assigned to HORIBA STEC CO LTD (8)· patent assignee history
2012–2019Patents assigned to NEC CORP (4)· patent assignee history
2012–2020Based in Tokyo, JP· patent location history
2012–2020Based in Kyoto, JP· patent location history
2015–2020Patents assigned to SANKEN ELECTRIC CO LTD (6)· patent assignee history
2015–2020Based in Niiza, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TANAKA YUKIself172006–2019
HORIBA STEC CO LTD82012–2020
ADEKA CORP62008–2020
SANKEN ELECTRIC CO LTD62015–2020
NEC CORP42012–2019
Locations
LocationPatentsSpan
Tokyo, JP122012–2020
Kanagawa, JP102010–2021
Kyoto, JP92012–2020
Saitama, JP92008–2020
Niiza, JP42015–2020