Inventor
Yoshikazu Furusawa
Inventor
Nirasaki, JP
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
C23CCoating metallic material17%
H01LSemiconductor devices14%
H10DInorganic electric semiconductor devices9%
C30BSingle-crystal growth6%
LOC136%
B01DSeparation3%
H05BElectric heating3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
Y02CCapture, storage, sequestration or disposal of greenhouse gases [ghg]3%
PatentTitleYear
10,619,247Substrate processing apparatus, injector, and substrate processing method202010,573,518Film forming method and vertical thermal processing apparatus20209,758,865'Silicon film forming method, thin film forming method and cross-sectional shape control method'20179,540,743'Amorphous silicon crystallizing method, crystallized silicon film forming method, semiconductor device manufacturing method and film forming apparatus'20179,478,423'Method of vapor-diffusing impurities'20169,171,722'Method of vapor-diffusing impurities'20158,906,792'Impurity diffusion method, substrate processing apparatus, and method of manufacturing semiconductor device'20148,518,488'Method for using apparatus configured to form germanium-containing film'20137,648,895'Vertical CVD apparatus for forming silicon-germanium film'2010D0588079'Heat dissipation deterrence link for semiconductor manufacture'2009D0588078'Heat dissipation deterrence link for semiconductor manufacture'20097,273,818'Film formation method and apparatus for semiconductor process'20077,208,428'Method and apparatus for treating article to be treated'20077,064,084'Oxide film forming method'20065,547,580'Purification method of crude product'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996Patents assigned to EISAI KAGAKU KK (1)· patent assignee history
1996Based in Ibaraki, JP· patent location history
2006–2020Patents assigned to TOKYO ELECTRON LTD (13)· patent assignee history
2006–2020Based in Nirasaki, JP· patent location history
2007–2010Based in Tokyo, JP· patent location history
2013Patents assigned to FURUSAWA YOSHIKAZU (1)· patent assignee history
2013Patents assigned to OKADA MITSUHIRO (1)· patent assignee history
2015–2016Based in Niraski, JP· patent location history
2020Based in Yamanashi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 13 | 2006–2020 |
| EISAI KAGAKU KK | 1 | 1996 |
| FURUSAWA YOSHIKAZUself | 1 | 2013 |
| OKADA MITSUHIRO | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nirasaki, JP | 7 | 2006–2020 |
| Tokyo, JP | 4 | 2007–2010 |
| Niraski, JP | 2 | 2015–2016 |
| Yamanashi, JP | 1 | 2020 |
| Ibaraki, JP | 1 | 1996 |