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Inventor

Daiji Hara

Inventor
Kanagawa, JP

Overview

15→
Patents
1992–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 15 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium12%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds12%
C23CCoating metallic material12%
H01LSemiconductor devices10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
Y10TTechnical subjects covered by former us classification5%
B05DProcesses for applying fluent materials to surfaces, in general2%
C07CAcyclic or carbocyclic compounds2%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds2%
PatentTitleYear
11,073,956Conductive member, touch panel, and display device202111,070,740Camera device and IR light irradiating method20219,970,103Film deposition material, sealing film using the same and use thereof20189,663,541'Group 5 metal oxo-alkoxo complex, method for producing same, and method for manufacturing group 5 metal oxide film'20178,907,038'Typical metal containing polysiloxane composition, process for its production, and its uses'20148,513,448'Cyclic siloxane compound, a material for forming Si-containing film, and its use'20138,110,696'Cyclic siloxane compound, a material for forming Si-containing film, and its use'20127,935,425'Insulating film material containing organic silane or organic siloxane compound, method for producing same, and semiconductor device'20117,413,775'Insulating film material containing an organic silane compound, its production method and semiconductor device'20087,160,625'Insulating film material containing an organic silane compound, its production method and semiconductor device'20075,594,079'Method for producing a polyolefin'19975,489,634'Method for producing a stereospecific polyolefin'19965,244,989'Method for producing a stereospecific polyolefin'19935,229,476'Method for producing a stereospecific polyolefin'19935,112,927'Method for producing a stereoregular polyolefin'1992

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1992–2018Patents assigned to TOSOH CORP (12)· patent assignee history
1992–1997Based in Yokkaichi, JP· patent location history
2007–2008Based in Yamaguchi, JP· patent location history
2011–2021Based in Kanagawa, JP· patent location history
2012–2013Based in Yokohama, JP· patent location history
2013–2018Patents assigned to HARA DAIJI (3)· patent assignee history
2014–2018Patents assigned to SHIMIZU MASATO (2)· patent assignee history
2021Patents assigned to FUJIFILM CORP (1)· patent assignee history
2021Patents assigned to PANASONIC I PRO SENSING SOLUTIONS CO LTD (1)· patent assignee history
2021Based in Fukuoka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOSOH CORP121992–2018
HARA DAIJIself32013–2018
SHIMIZU MASATO22014–2018
FUJIFILM CORP12021
PANASONIC I PRO SENSING SOLUTIONS CO LTD12021
Locations
LocationPatentsSpan
Kanagawa, JP52011–2021
Yokkaichi, JP51992–1997
Yokohama, JP22012–2013
Yamaguchi, JP22007–2008
Fukuoka, JP12021