Inventor
Emile Sahouria
Inventor
Sunnyvale, CA, US
Overview
Patents· 26 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices44%
G06FElectric digital data processing33%
B82YSpecific uses or applications of nanostructures4%
H01JElectric discharge tubes or discharge lamps4%
H01LSemiconductor devices4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
Y02PClimate change mitigation technologies in the production or processing of goods4%
PatentTitleYear
9,996,651Mask creation with hierarchy management using cover cells20189,448,481'Generalization of shot definitions for mask and wafer writing tools'20169,292,643'Mask creation with hierarchy management using cover cells'20169,134,616'Generalization of shot definitions for mask and wafer writing tools'20158,930,856'Mask rule checking based on curvature'20158,826,196'Integration of optical proximity correction and mask data preparation'20148,815,473'Generalization of shot definitions for mask and wafer writing tools'20148,713,483'IC layout parsing for multiple masks'20148,640,059'Forming separation directives using a printing feasibility analysis'20148,635,562'Data flow branching in mask data preparation'20148,560,981'Segmenting integrated circuit layout design files using speculative parsing'20138,516,401'Mask model calibration technologies involving etch effect and exposure effect'20138,234,599'Use of graphs to decompose layout design data'20127,802,226'Data preparation for multiple mask printing'20107,716,624'Mask creation with hierarchy management using cover cells'20107,367,009'Convergence technique for model-based optical and process correction'20087,240,321'Selective promotion for resolution enhancement techniques'20077,069,534'Mask creation with hierarchy management using cover cells'20067,028,284'Convergence technique for model-based optical and process correction'20067,017,141'Integrated verification and manufacturability tool'20066,901,574'Data management method for mask writing'20056,668,367'Selective promotion for resolution enhancement techniques'20036,516,459'Integrated circuit design correction using fragment correspondence'20036,430,737'Convergence technique for model-based optical and process correction'20026,425,113'Integrated verification and manufacturability tool'20026,415,421'Integrated verification and manufacturability tool'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2018Patents assigned to MENTOR GRAPHICS CORP (16)· patent assignee history
2002–2016Based in San Jose, CA, US· patent location history
2006–2016Patents assigned to SAHOURIA EMILE Y (8)· patent assignee history
2006–2013Patents assigned to SAHOURIA EMILE (4)· patent assignee history
2006–2016Patents assigned to ZHANG WEIDONG (3)· patent assignee history
2006–2007Patents assigned to COBB NICOLAS B (2)· patent assignee history
2010–2018Based in Sunnyvale, CA, US· patent location history
2012Based in Sunyvale, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MENTOR GRAPHICS CORP | 16 | 2002–2018 |
| SAHOURIA EMILE Yself | 8 | 2006–2016 |
| SAHOURIA EMILEself | 4 | 2006–2013 |
| ZHANG WEIDONG | 3 | 2006–2016 |
| COBB NICOLAS B | 2 | 2006–2007 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sunnyvale, California, US | 13 | 2010–2018 |
| San Jose, California, US | 12 | 2002–2016 |
| Sunyvale, California, US | 1 | 2012 |