Inventor
Hideo Todokoro
Inventor
Hinode, JP
Overview
Patents· 141 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps53%
G01NInvestigating or analysing materials by determining their chemical or physical properties14%
G01RMeasuring electric variables9%
G06TImage data processing or generation, in general7%
G01BMeasuring length, thickness or similar linear dimensions4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
G11BInformation storage based on relative movement between record carrier and transducer3%
B82YSpecific uses or applications of nanostructures3%
G02BOptical elements, systems or apparatus1%
G11CStatic stores0%
PatentTitleYear
10,903,037Charged particle beam device20218,835,844'Sample electrification measurement method and charged particle beam apparatus'20148,772,735'Charged particle beam apparatus, and method of controlling the same'20148,604,430'Method and an apparatus of an inspection system using an electron beam'20138,319,193'Charged particle beam apparatus, and method of controlling the same'20128,134,125'Method and apparatus of an inspection system using an electron beam'20127,982,188'Apparatus and method for wafer pattern inspection'20117,977,632'Scanning electron microscope'20117,956,324'Charged particle beam apparatus for forming a specimen image'20117,838,827'Monochromator and scanning electron microscope using the same'20107,825,377'Electron beam apparatus with aberration corrector'20107,805,023'Image evaluation method and microscope'20107,800,059'Method of forming a sample image and charged particle beam apparatus'20107,700,918'Sample electrification measurement method and charged particle beam apparatus'20107,683,319'Charge control apparatus and measurement apparatus equipped with the charge control apparatus'20107,642,514'Charged particle beam apparatus'20107,491,933'Electron beam apparatus'20097,442,923'Scanning electron microscope'20087,439,506'Method and an apparatus of an inspection system using an electron beam'20087,411,190'Inspection system, inspection method, and process management method'20087,408,172'Charged particle beam apparatus and charged particle beam irradiation method'20087,399,966'Scanning electron microscope'20087,394,066'Electron microscope and electron beam inspection system'20087,385,196'Method and scanning electron microscope for measuring width of material on sample'20087,375,323'Electron beam apparatus with aberration corrector'20087,372,028'Sample electrification measurement method and charged particle beam apparatus'20087,361,894'Method of forming a sample image and charged particle beam apparatus'20087,340,111'Image evaluation method and microscope'20087,329,868'Charged particle beam apparatus'20087,315,024'Monochromator and scanning electron microscope using the same'20087,294,835'Scanning electron microscope'20077,282,722'Charged particle beam apparatus and charged particle beam irradiation method'20077,236,651'Image evaluation method and microscope'20077,232,996'Method and an apparatus of an inspection system using an electron beam'20077,199,365'Electron beam apparatus with aberration corrector'20077,186,975'Scanning charged-particle microscope'20077,166,840'Method for determining depression/protrusion of sample and charged particle beam apparatus therefor'20077,164,126'Method of forming a sample image and charged particle beam apparatus'20077,109,485'Charged particle beam apparatus'20067,087,899'Sample electrification measurement method and charged particle beam apparatus'20067,075,076'Inspection system, inspection method, and process management method'20067,075,078'Scanning electron microscope'20067,049,591'Scanning electron microscope'20067,034,296'Method of forming a sample image and charged particle beam apparatus'20067,022,983'Monochromator and scanning electron microscope using the same'20067,022,986'Apparatus and method for wafer pattern inspection'20067,012,252'Method and an apparatus of an inspection system using an electron beam'20066,987,265'Method and an apparatus of an inspection system using an electron beam'20066,982,427'Electron beam apparatus with aberration corrector'20066,979,821'Scanning electron microscope'20056,956,212'Electron microscope observation system and observation method'20056,956,211'Charged particle beam apparatus and charged particle beam irradiation method'20056,946,656'Sample electrification measurement method and charged particle beam apparatus'20056,936,818'Charged particle beam apparatus'20056,885,001'Scanning electron microscope'20056,872,944'Scanning electron microscope'20056,872,943'Method for determining depression/protrusion of sample and charged particle beam apparatus therefor'20056,864,482'Electron beam apparatus'20056,847,038'Scanning electron microscope'20056,839,200'Combination perpendicular magnetic head having shield material formed at both ends of an upper pole of a write element'20056,822,232'Electronic microscope observation system and observation method'20046,791,084'Method and scanning electron microscope for measuring dimension of material on sample'20046,787,772'Scanning electron microscope'20046,667,476'Scanning electron microscope'20036,665,141'Magnetic head having track width defined by trench portions filled with magnetic shield material'20036,653,633'Charged particle beam apparatus'20036,646,262'Scanning electron microscope'20036,635,873'Scanning electron microscope with voltage applied to the sample'20036,555,819'Scanning electron microscope'20036,538,249'Image-formation apparatus using charged particle beams under various focus conditions'20036,538,844'Method of fabricating a magnetic head by focused ion beam etching'20036,512,227'Method and apparatus for inspecting patterns of a semiconductor device with an electron beam'20036,512,228'Scanning electron microscope'20036,452,178'Method and an apparatus of an inspection system using an electron beam'20026,444,981'Scanning electron microscope'20026,348,690'Method and an apparatus of an inspection system using an electron beam'20026,310,341'Projecting type charged particle microscope and projecting type substrate inspection system'20016,307,707'Narrow track thin film head including magnetic poles machined by focused ion beam etching'20016,278,578'Narrow track thin film head having a focused ion beam etched air bearing surface'20016,114,695'Scanning electron microscope and method for dimension measuring by using the same'20006,111,723'Narrow track thin film magnetic head suitable for high density recording and reproducing operations and fabrication method thereof wherein an air bearing surface has at least one groove containing a non-magnetic electrically conductive layer'20006,084,238'Scanning electron microscope'20006,069,356'Scanning electron microscope'20006,051,834'Electron microscope'20006,043,491'Scanning electron microscope'20005,969,357'Scanning electron microscope and method for dimension measuring by using the same'19995,939,720'Scanning electron microscope'19995,929,439'Scanning microscope'19995,900,629'Scanning electron microscope'19995,877,498'Method and apparatus for X-ray analyses'19995,872,358'Scanning electron microscope'19995,866,905'Electron microscope'19995,866,904'Scanning electron microscope and method for dimension measuring by using the same'19995,850,326'Narrow track thin film magnetic head suitable for high density recording and reproducing operations and fabrication method thereof wherein an air bearing surface has at least one groove containing a non-magnetic electrically conductive layer'19985,608,218'Scanning electron microscope'19975,598,002'Electron beam apparatus'19975,594,246'Method and apparatus for x-ray analyses'19975,594,245'Scanning electron microscope and method for dimension measuring by using the same'19975,481,109'Surface analysis method and apparatus for carrying out the same'19965,475,218'Instrument and method for 3-dimensional atomic arrangement observation'19955,468,969'Method and apparatus for electron beam lithography'19955,463,221'Electron beam measuring apparatus'19955,424,541'Scanning electron microscope and method for controlling a scanning electron microscope'19955,412,210'Scanning electron microscope and method for production of semiconductor device by using the same'19955,412,209'Electron beam apparatus'19955,402,295'Magnetic recording head capable of defining narrow track width and magnetic recording apparatus using the same'19955,389,787'Scanning electron microscope'19955,387,799'Electron beam writing system'19955,387,793'Scanning electron microscope'19955,311,026'Charged particle beam lithography system and method therefor'19945,283,440'Electron beam writing system used in a cell projection method'19945,278,408'Instrument and method for 3-dimensional atomic arrangement observation'19945,276,325'Scanning microscope and a method of operating such a scanning microscope'19945,202,564'Scanning electron microscope and method and production of semi-conductor device by using the same'19935,162,240'Method and apparatus of fabricating electric circuit pattern on thick and thin film hybrid multilayer wiring substrate'19925,160,884'Charged particle beam device'19925,093,616'Voltage measurement method using electron beam'19925,068,605'Semiconductor integrated circuit device and method of testing the same'19914,922,097'Potential measurement device'19904,900,974'Ion source'19904,868,394'Charged particle detector'19894,855,673'Electron beam apparatus'19894,827,127'Apparatus using charged particle beam'19894,803,430'Magnetic/electric field measuring device by means of an electron beam'19894,774,460'Stroboscopic type potential measurement device'19884,772,847'Stroboscopic type potential measurement device'19884,751,384'Electron beam metrology system'19884,710,632'Ion microbeam apparatus'19874,687,931'Scanning electron microscope'19874,629,889'Potential analyzer'19864,626,690'Apparatus for chopping a charged particle beam'19864,581,534'Image display system for a stroboscopic scanning electron microscope'19864,554,455'Potential analyzer'19854,382,182'Method of displaying an image of phase contrast in a scanning transmission electron microscope'19834,379,250'Field emission cathode and method of fabricating the same'19834,355,232'Apparatus for measuring specimen potential in electron microscope'19824,295,072'Field emission electron gun with anode heater and plural exhausts'19814,274,035'Field emission electron gun'19814,099,055'Scanning transmission electron microscope'19784,041,316'Field emission electron gun with an evaporation source'19774,039,829'Stereoscopic measuring apparatus'1977Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1977–2014Patents assigned to HITACHI LTD (114)· patent assignee history
1977–2021Based in Tokyo, JP· patent location history
1981–2014Based in Hinode, JP· patent location history
1987–2013Based in Nishitama-gun, JP· patent location history
2004–2021Patents assigned to HITACHI HIGH TECH CORP (26)· patent assignee history
2006Based in Hirode, JP· patent location history
2008Based in Hlnode, JP· patent location history
2012–2014Patents assigned to TODOKORO HIDEO (5)· patent assignee history
2012–2013Patents assigned to FUKUHARA SATORU (2)· patent assignee history
2012–2013Patents assigned to ICHIHASHI MIKIO (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 114 | 1977–2014 |
| HITACHI HIGH TECH CORP | 26 | 2004–2021 |
| TODOKORO HIDEOself | 5 | 2012–2014 |
| FUKUHARA SATORU | 2 | 2012–2013 |
| ICHIHASHI MIKIO | 2 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hinode, JP | 54 | 1981–2014 |
| Tokyo, JP | 52 | 1977–2021 |
| Nishitama-gun, JP | 31 | 1987–2013 |
| Hlnode, JP | 1 | 2008 |
| Hirode, JP | 1 | 2006 |