Scanning electron microscope and method and production of semi-conductor device by using the same

A scanning electron microscope, comprising: means for irradiating a primary electron beam to an object to be inspected, the primary electron beam having energy sufficient to produce reflection electrons, reflected from within a depression in the object, that penetrate through the object so as to escape from the surface of the object, or that generate secondary electrons in the surface of the object while penetrating through the object; and means for detecting the escaped reflection electrons or the secondary electrons.

A scanning electron microscope, comprising: means for irradiating a primary electron beam to an object to be inspected, the primary electron beam having sufficient energy to transmit through the object to be inspected, and the transmitted beam causing secondary electrons to be emitted from the undersurface of the object; and means for detecting the transmitted beam or the secondary electrons.

A method for production of a semiconductor device, comprising the steps of: etching a semiconductor device to form a depression; irradiating a primary electron beam to the device, the primary electron beam having energy sufficient to produce reflection electrons, reflected from within the depression in the device, that penetrate through the device so as to escape from the surface of the device, or that generate secondary electrons in the surface of the device by the reflection electrons while penetrating through the device; and detecting the reflection electrons or the secondary electrons.

A semiconductor fabrication apparatus, comprising: a first chamber in which an object has its surface manufactured; a second chamber in which the object is inspected; means for irradiating a primary electron beam to the object to be inspected, the primary electron beam having energy sufficient to produce reflection electrons, reflected from within a depression in the object, that penetrate through the object so as to escape from the surface of the object, or that generate secondary electrons in the surface of the object while penetrating through the object; means for connecting the first chamber and the second chamber; and means for transporting the object from the first chamber to the second chamber.