Inventor
ANIRUDDHA PAL
Inventor
US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material15%
H01JElectric discharge tubes or discharge lamps15%
H01LSemiconductor devices15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
F16JPistons8%
LOC238%
Y02CCapture, storage, sequestration or disposal of greenhouse gases [ghg]8%
Y02PClimate change mitigation technologies in the production or processing of goods8%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
PatentTitleYear
12,431,338Composite structures for semiconductor process chambers2025D1027120Seal for an assembly in a vapor deposition chamber202411,574,831Method and apparatus for substrate transfer and radical confinement202311,359,722Multinode multi-use O-ring and method for forming a seal202211,177,136Abatement and strip process chamber in a dual loadlock configuration2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to APPLIED MATERIALS INC (5)· patent assignee history
2021–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 5 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 5 | 2021–2025 |