LexDanaLexDanabeta
Inventor

Kenzo Hanawa

Inventor
Ichihara, JP

Overview

42→
Patents
1988–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 42 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Hprimary
H10HInorganic light-emitting semiconductor devices having potential barriers10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution6%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy5%
Y10TTechnical subjects covered by former us classification5%
C23CCoating metallic material5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
B82YSpecific uses or applications of nanostructures4%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds4%
G11BInformation storage based on relative movement between record carrier and transducer4%
PatentTitleYear
11,043,680Electrode material including small diameter, carbon nanotubes bridging large diameter carbon nanotubes, redox flow battery electrode, redox flow battery, and method for producing electrode material202110,790,531Collector plate and redox flow battery202010,727,498Redox flow battery electrode, and redox flow battery202010,707,514Redox flow battery202010,680,248Electrode material, electrode of redox flow battery, and redox flow battery202010,422,021Method for producing vanadium compound, method for producing vanadium solution, and method for producing redox flow battery electrolyte201910,008,232Recording medium, method of manufacturing fullerene thin film, recording reproducing apparatus, information recording method, and information reading method20189,672,857'Lubricant for magnetic recording medium, magnetic recording medium, manufacturing method of magnetic recording medium, and magnetic recording and reproducing device'20179,349,403'Lubricant for magnetic recording medium, magnetic recording medium, manufacturing method of magnetic recording medium, and magnetic recording and reproducing device'20168,882,971'Sputtering apparatus and manufacturing method of semiconductor light-emitting element'20148,802,187'Solar cell and process for producing the same'20148,669,129'Method for producing group III nitride semiconductor light-emitting device, group III nitride semiconductor light-emitting device, and lamp'20148,557,092'Sputtering deposition apparatus and backing plate for use in sputtering deposition apparatus'20138,471,266'Group III nitride semiconductor multilayer structure and production method thereof'20138,445,302'Method for producing group III nitride semiconductor light-emitting device, group III nitride semiconductor light-emitting device, and lamp'20138,389,313'Deposition method of III group nitride compound semiconductor laminated structure'20138,378,369'Light emitting unit, light emitting module, and display device'20138,309,982'Group-III nitride semiconductor light-emitting device, method for manufacturing the same, and lamp'20128,227,284'Group-III nitride compound semiconductor light-emitting device, method of manufacturing group-III nitride compound semiconductor light-emitting device, and lamp'20128,211,727'Group III nitride semiconductor multilayer structure and production method thereof'20128,168,460'Method for manufacturing group III nitride compound semiconductor light-emitting device, group III nitride compound semiconductor light-emitting device, and lamp'20128,148,712'Group III nitride compound semiconductor stacked structure'20128,097,482'Method for manufacturing group III nitride semiconductor, method for manufacturing group III nitride semiconductor light-emitting device, group III nitride semiconductor light-emitting device, and lamp'20128,012,784'Method for producing group III nitride semiconductor light emitting device, group III nitride semiconductor light emitting device, and lamp'20117,935,980'Method of manufacturing a semiconductor light-emitting device'20117,737,434'Light-emitting diode illumination source'20107,585,690'Process for producing group III nitride compound semiconductor light emitting device, group III nitride compound semiconductor light emitting device and lamp'20096,926,977'Magnetic recording medium, production process thereof, and magnetic recording and reproducing apparatus'20056,727,010'Magnetic recording medium, production process thereof, magnetic recording and reproducing apparatus, and medium substrate'20046,673,134'Fine copper powder and process for producing the same'20046,395,332'Fine copper powder and process for producing the same'20026,334,905'Unleaded solder powder and production method therefor'20026,159,858'Slurry containing manganese oxide and a fabrication process of a semiconductor device using such a slurry'20006,083,476'Black ultrafine magnetite particles and process for preparing the same'20006,004,526'Process for preparing cathode active material for lithium secondary battery'19995,951,724'Fine particulate polishing agent, method for producing the same and method for producing semiconductor devices'19995,938,837'Cerium oxide ultrafine particles and method for preparing the same'19995,938,798'Cathodic active material composition for dry cells, method for preparing the same, and alkaline battery'19995,885,369'Solder powder, method for making the solder powder and solder paste using the solder powder'19995,766,279'Polishing agent, method for producing the same and method for polishing'19985,358,660'Magnetic particles for perpendicular magnetic recording'19944,776,885'Sintered composite materials with short metal fibers as matrix'1988

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1988–2020Based in Tokyo, JP· patent location history
1994–2021Patents assigned to SHOWA DENKO KK (24)· patent assignee history
1998–2004Patents assigned to MITSUI MINING & SMELTING CO (8)· patent assignee history
1998–1999Based in Saitama, JP· patent location history
1999–2000Based in Ageo, JP· patent location history
2000–2021Based in Ichihara, JP· patent location history
2002–2020Based in Chiba, JP· patent location history
2012–2014Patents assigned to HANAWA KENZO (13)· patent assignee history
2012–2014Patents assigned to SASAKI YASUMASA (11)· patent assignee history
2012–2014Patents assigned to MIKI HISAYUKI (9)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHOWA DENKO KK241994–2021
HANAWA KENZOself132012–2014
SASAKI YASUMASA112012–2014
MIKI HISAYUKI92012–2014
MITSUI MINING & SMELTING CO81998–2004
Locations
LocationPatentsSpan
Ichihara, JP212000–2021
Chiba, JP92002–2020
Saitama, JP51998–1999
Tokyo, JP41988–2020
Ageo, JP21999–2000