Inventor
Ananthkrishna Jupudi
Inventor
Singapore, SG
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
C23CCoating metallic material18%
H01LSemiconductor devices18%
H01JElectric discharge tubes or discharge lamps9%
H05BElectric heating5%
G01KMeasuring temperature4%
H10DInorganic electric semiconductor devices4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
LOC134%
B22FWorking metallic powder2%
PatentTitleYear
D0931241Lower shield for a substrate processing chamber202111,043,406Two piece shutter disk assembly with self-centering feature202110,971,383Fluorescence based thermometry for packaging applications2021D0913979Inner shield for a substrate processing chamber202110,950,475Method and apparatus for processing a substrate using non-contact temperature measurement202110,945,313Methods and apparatus for a microwave batch curing process202110,851,453Methods and apparatus for shutter disk assembly detection202010,677,830Methods and apparatus for detecting microwave fields in a cavity202010,629,430Variable frequency microwave (VFM) processes and applications in semiconductor thin film fabrications202010,600,664Fluorescence based thermometry for packaging applications202010,373,860Batch processing apparatus201910,115,573Apparatus for high compressive stress film deposition to improve kit life20189,960,035Variable frequency microwave (VFM) processes and applications in semiconductor thin film fabrications20189,960,023Methods and apparatus for nodule control in a titanium-tungsten target20189,548,200'Variable frequency microwave (VFM) processes and applications in semiconductor thin film fabrications'20179,340,866'Substrate support with radio frequency (RF) return path'20169,252,002'Two piece shutter disk assembly for a substrate process chamber'20168,895,450'Low resistivity tungsten PVD with enhanced ionization and RF power coupling'20148,558,299'Semiconductor device with gate electrode stack including low resistivity tungsten and method of forming'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2021Patents assigned to APPLIED MATERIALS INC (19)· patent assignee history
2013–2016Patents assigned to JUPUDI ANANTHKRISHNA (3)· patent assignee history
2013–2016Patents assigned to NGUYEN THANH X (2)· patent assignee history
2013Patents assigned to CAO YONG (1)· patent assignee history
2013–2018Based in Milpitas, CA, US· patent location history
2016Patents assigned to DINSMORE ROBERT (1)· patent assignee history
2018–2021Based in Singapore, SG· patent location history
2018Based in Milipitas, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 19 | 2013–2021 |
| JUPUDI ANANTHKRISHNAself | 3 | 2013–2016 |
| NGUYEN THANH X | 2 | 2013–2016 |
| CAO YONG | 1 | 2013 |
| DINSMORE ROBERT | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Singapore, SG | 12 | 2018–2021 |
| Milpitas, California, US | 6 | 2013–2018 |
| Milipitas, California, US | 1 | 2018 |