USPatentGranted
S1

Lower shield for a substrate processing chamber

Granted 21 Sep 2021 · no office action yet

Current assignee: Applied Materials Israel · originally Applied Materials, Inc.

Law firm: Law firm · Log in to unlock

Attorney: Attorney · Log in to unlock

Inventors: Yueh Sheng Ow, Kelvin Boh, Sarath Babu, Junqi Wei +3 · Examiner: Michael C Stout · AU 2924 · TC 2900

Application
29/703,658
filed 28 Aug 2019
Publication
Not published
not published
Patent· this page
US D931241
granted 21 Sep 2021

Life of the patent

10 dated events
⤢ drag to zoom20202022202420262028203020322034203620382040ProsecutionOwnershipTerm & fees
ProsecutionOwnershipTerm & feeshover for detail · click to open

Description

1 parts
›FIG. 1 is a top isometric view of…

FIG. 1 is a top isometric view of a lower shield for a substrate processing chamber, according to the novel design.

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a front elevation view thereof.

FIG. 5 is a back elevation view thereof.

FIG. 6 is a right side elevation view thereof.

FIG. 7 is a left side elevation view thereof; and,

FIG. 8 is a cross-section view taken along line 8 - 8 in FIG. 2 .

The dashed lines in FIGS. 1-8 are for the purpose of showing environmental structure, and form no part of the claimed design.

the grant prints no section headings; every part label below is ours, taken from that part's own first words

Claims

1 · 1 independent · depth 1
1 granted claims

Classifications

1 codes
USPC · US Patent Classification
D13/182

Claim changes

Soon
Coming soonHow the claims changed between publication and grant

See which claims were amended, added or cancelled during examination, with every added and removed word marked.

AmendedAddedCancelledUnchanged

The published claims of this patent are not paired with the granted ones in what we hold.

File wrapper

⤢ drag to zoomJul 2019Oct 2019Jan 2020Apr 2020Jul 2020Oct 2020Jan 2021Apr 2021Jul 2021Oct 2021USPTOApplicantRestriction requirementNotice of allowance
USPTOApplicanthover for detail · click to open
Pendency
2.1 y
755 days filing → grant
Office actions
0
after a restriction
Examiner
Michael C Stout
art unit 2924 · TC 2900
Citations: 28 back · 0 forward

See the full prosecution history — every USPTO and applicant action on this file, in order.

Log in to unlock

Chain of title

⤢ drag to zoom20202022202420262028203020322034203620382040Owner 4liens, releases & corrections
Titlehover for detail · click to open

See the full assignment history — every owner this patent has passed through, with recordation dates and reel/frame numbers.

Log in to unlock

Term & fees

See the term timeline — pendency span, in-force span, the maintenance fees paid and both computed expiry dates.

Log in to unlock

Worldwide family

6 members · 3 offices
US2JP2TW2
this patentIP5 & PCTother officessolid = grantedhover for detail · click to open
Members
6
DOCDB simple family 75378497
Offices
3
US · JP
Granted
4 of 6
grant date present
Non-English titles
2
shown as filed, never translated
›IP5 & PCT — 4 members
OfficePublicationKindPublishedFiledStatusTitle
USthis patentUS-D931241-SS121 Sep 202128 Aug 2019grantedLower shield for a substrate processing chamber
USUS-D971167-SS129 Nov 202210 Apr 2021grantedLower shield for a substrate processing chamber
JPJP-1683052-SS12 Apr 202127 Feb 2020grantedno title held
JPJP-1684624-SS10 May 202127 Feb 2020grantedno title held
›Other offices — 2 members
OfficePublicationKindPublishedFiledStatusTitle
TWTW-D211387-SS11 May 202120 Feb 2020published用於基板處理腔室的下屏蔽件zh
TWTW-D211584-SS11 May 202120 Feb 2020published用於基板處理腔室的下屏蔽件zh

Validity challenges

See the validity challenges on record — reexaminations, IPRs and PGRs, with their institution decisions and outcomes.

Log in to unlock

Citations

See every patent this one cites and every patent that cites it back — publication, assignee, and how each one was found.

Log in to unlock